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公开(公告)号：US20230257314A1
公开(公告)日：2023-08-17
申请号：US17980287
申请日：2022-11-03
Inventor： Sung min LEE , Yoon Suk OH , Hyeong Jun KIM , Gyusang OH
CPC classification number: C04B41/522 , C04B35/10 , C04B41/5045 , C04B41/5055 , C04B41/4543 , C04B41/4558 , C04B41/0072 , C04B41/87 , C23C4/11 , C04B2235/3217 , C04B2235/9669
Abstract: The present invention provides a plasma-resistant ceramic member, which includes a substrate and a ceramic coating layer formed on the substrate, in which the ceramic coating layer includes a lower layer consisting of an oxide formed on the substrate, and a surface layer in which an oxide composition component constituting the surface of the ceramic coating layer is surface-modified with a composition containing one or more anions selected from the group consisting of F− and Cl−, wherein the surface layer is a layer in which a raw material containing one or more anions selected from the group consisting of F− and Cl− is vaporized by heating and adsorbed to the surface of the ceramic coating layer, and thus modified with a composition containing one or more anions selected from the group consisting of F− and Cl−, and a method of manufacturing the same. According to the present invention, the plasma-resistant property, durability, and etching process stability of the ceramic member may be improved with low costs.
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公开(公告)号：US20240043338A1
公开(公告)日：2024-02-08
申请号：US18268879
申请日：2021-12-02
Inventor： Sung Min LEE , Yoon Suk OH , Hyeong Jun KIM , Gyusang OH
CPC classification number: C04B35/44 , C04B41/81 , C04B35/48 , C04B2235/963
Abstract: The present invention provides a plasma-resistant ceramic substrate including a bulk of an oxide composition; and a surface layer in which an oxide composition component constituting the bulk was modified to a composition including one or more anions selected from the group consisting of F− and Cl−, wherein the surface layer is a layer in which a raw material containing one or more anions selected from the group consisting of F− and Cl− is vaporized by heating and adsorbed on the surface of the ceramic substrate to be modified to a composition including one or more anions selected from the group consisting of F− and Cl−, and a method of manufacturing the same. According to the present invention, the plasma resistance and durability of the ceramic substrate can be improved at low cost.
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公开(公告)号：US20230215701A1
公开(公告)日：2023-07-06
申请号：US17978778
申请日：2022-11-01
Inventor： Sung min LEE , Yoon Suk OH
CPC classification number: H01J37/32477 , H01J37/1474 , C23C14/30 , C23C14/243 , C23C14/0694 , C23C14/505 , C23C14/26 , C23C14/083 , H01J2237/182 , H01J37/06
Abstract: The present invention relates to a method of forming a plasma resistant oxyfluoride coating layer, including: mounting a substrate on a substrate holder provided in a chamber; causing an electron beam scanned from an electron gun to be incident on an oxide evaporation source accommodated in a first crucible, and heating, melting, and vaporizing the oxide evaporation source as the electron beam is incident on the oxide evaporation source; vaporizing a fluoride accommodated in a second crucible; and advancing an evaporation gas generated from the oxide evaporation source and a fluorine-containing gas generated from the fluoride toward the substrate, and reacting the evaporation gas generated from the oxide evaporation source and the fluorine-containing gas generated from the fluoride to deposit an oxyfluoride on the substrate. According to the present invention, it is possible to form a dense and stable oxyfluoride coating layer having excellent plasma resistance, suppressed generation of contaminant particles, and no cracks.
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4.发明申请公开(公告)号：US20190161843A1
公开(公告)日：2019-05-30
申请号：US16200938
申请日：2018-11-27
Inventor： Seong Won KIM , Sung Min LEE , Yoon Suk OH , Hyung Tae KIM
Abstract: The present disclosure relates to a method for preparing a ceramic thermal barrier coating layer including (a) preparing a first suspension in which first oxide particles for thermal barrier coating are dispersed and a second suspension in which second oxide particles for thermal barrier coating are dispersed, respectively; (b) forming a first coating layer on a base material by suspension plasma spraying (SPS) using the first suspension; (c) forming a buffer layer on the first coating layer by the suspension plasma spraying using a mixed suspension of the first suspension and the second suspension; and (d) forming a second coating layer on the buffer layer by the suspension plasma spraying using the second suspension.
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