公开(公告)号：US20030089858A1

公开(公告)日：2003-05-15

申请号：US09986485

申请日：2001-11-09

Inventor： Masanao Hotta ,  Yasuhiko Kojima ,  Takaomi Ito ,  Katsumi Yokota ,  Tetsuyuki Okabayashi ,  Akio Otani ,  Susumu Ono

IPC: H01J037/147

CPC classification number: H01J37/1472 ,  H01J2237/3175

Abstract: In an electron beam lithography system, an outputted main signal is applied directly to deflection plates, whereas an outputted auxiliary signal is applied to the deflection plate through a capacitive coupling for thereby writing a wide strip-like pattern accurately at a high speed. According to the present invention, in the electron beam lithography system, a deflection signal is divided into a main signal having a low frequency and a large amplitude and an auxiliary signal having a high frequency and a small amplitude. The main signal is applied directly to deflection plates, and the auxiliary signal is applied to the deflection plate through a capacitor. In the case of writing a straight line having a certain width, and a solid graphic pattern, because the electron beam is deflected in a given direction and a given width by the use of the auxiliary signal in synchronism with one sweeping cycle based on the main signal, a line whose width is as wide as many times of the electron beam diameter can be written, and a graphic pattern having a certain width can be written at a high speed.

Abstract translation: 在电子束光刻系统中，将输出的主信号直接施加到偏转板，而输出的辅助信号通过电容耦合施加到偏转板，从而以高速精确地写入宽的条状图案。 根据本发明，在电子束光刻系统中，偏转信号被分割成具有低频和大幅度的主信号以及具有高频和小振幅的辅助信号。 主信号直接施加到偏转板，辅助信号通过电容器施加到偏转板上。 在写入具有一定宽度的直线和固体图形的情况下，因为电子束通过使用辅助信号以给定方向偏转并且给定的宽度与基于主要的一个扫描周期同步地 信号，可以写入宽度为电子束直径的多倍的线，并且可以高速写入具有一定宽度的图形。

公开(公告)号：US20030025085A1

公开(公告)日：2003-02-06

申请号：US10197309

申请日：2002-07-16

Applicant: Nikon Corporation

Inventor： Katsushi Nakano

IPC: H01J037/147

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01F5/003 ,  H01F7/20 ,  H01F7/202 ,  H01F2041/0711 ,  H01J37/147 ,  H01J37/1475 ,  H01J37/3174 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1526 ,  H01J2237/1534 ,  Y10T29/4902

Abstract: Deflectors are disclosed that are suitable for use in various charged-particle-beam (CPB) optical systems as used, for example, in CPB microlithography systems. The deflectors produce a strong magnetic beam-deflecting field when energized with a relatively small electrical current. The beam-deflecting field thus produced is stable with respect to temperature changes, is little affected by eddy currents, and exhibits low aberration caused by manufacturing tolerances of the coil and core. In an exemplary method for manufacturing such a deflector, a magnetic-tape laminate is used as the core. Also, high-precision positioning of the coil and the magnetic-tape laminate is performed using photolithography and electrocasting. Positioning of the magnetic-tape laminate can be performed using a resist pattern formed by photolithography.

Abstract translation: 公开了适用于例如在CPB微光刻系统中使用的各种带电粒子束（CPB）光学系统的偏转器。 当相对较小的电流通电时，偏转器产生强磁场偏转场。 由此产生的光束偏转场相对于温度变化是稳定的，几乎不受涡流的影响，并且表现出由线圈和芯的制造公差引起的低像差。 在制造这种偏转器的示例性方法中，使用磁带层压体作为核心。 此外，使用光刻和电铸来进行线圈和磁带层压体的高精度定位。 可以使用通过光刻形成的抗蚀剂图案来进行磁带层压体的定位。

公开(公告)号：US20040227105A1

公开(公告)日：2004-11-18

申请号：US10461702

申请日：2003-06-13

Inventor： Victor M. Benveniste ,  Robert D. Rathmell ,  Yongzhang Huang

IPC: H01J037/317 ,  H01J037/147

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/147 ,  H01J2237/057

Abstract: A magnetic deflector for an ion beam is disclosed and comprises first and second coils. The coils are positioned above and below the beam, respectively, and extend along a width of the beam. Current passes through the coils to generate a magnetic field therebetween that is generally perpendicular to a direction of travel of the beam along substantially the entire width thereof. In another aspect of the invention, a method of deflecting a beam prior to implantation into a workpiece is disclosed. The method includes determining one or more properties associated with the beam and selectively activating one of a magnetic deflection module and an electrostatic deflection module based on the determination.

Abstract translation: 公开了用于离子束的磁偏转器，并且包括第一和第二线圈。 线圈分别位于梁的上方和下方，并沿着梁的宽度延伸。 电流通过线圈以产生它们之间的磁场，其大致垂直于梁的大致整个宽度的行进方向。 在本发明的另一方面，公开了一种在植入植入工件之前偏转光束的方法。 该方法包括确定与光束相关联的一个或多个属性，并且基于该确定选择性地激活磁偏转模块和静电偏转模块中的一个。

公开(公告)号：US20040104353A1

公开(公告)日：2004-06-03

申请号：US10428869

申请日：2003-05-02

Inventor： C. Neil Berglund

IPC: H01J037/147

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/31761 ,  H01J2237/31762 ,  H01J2237/31766

Abstract: A beam blanker array includes a base plate, a plurality of conductor pads, and a ground plate. The conductor pads are arranged in a one-dimensional array on the base plate. The ground plate is coupled to the base plate over the plurality of conductor pads with a gap between the base plate and the ground plate. Each of the plurality of conductor pads forms a beam blanker across the gap with the ground plate.

Abstract translation: 光束消隐器阵列包括基板，多个导体焊盘和接地板。 导体焊盘在基板上以一维阵列布置。 接地板在基板和接地板之间具有间隙地连接在多个导体焊盘上的基板上。 多个导体焊盘中的每一个形成与接地板跨越间隙的光束消除器。

公开(公告)号：US20040056207A1

公开(公告)日：2004-03-25

申请号：US10247104

申请日：2002-09-19

Applicant: Applied Materials Israel Ltd

Inventor： Igor Petrov ,  Igor Krivts ,  Zvika Rosenberg ,  Pavel Adamec

IPC: H01J037/10 ,  H01J037/147

CPC classification number: H01J37/1475

Abstract: A deflection system is presented for use in a lens arrangement of a charged particle beam column for inspecting a sample. The system comprises a magnetic deflector operable to create a magnetic field, and a pole piece assembly at least partly accommodated within the magnetic field. The pole piece assembly has a portion made of a soft magnetic material and is formed with an opening for a charged particle beam propagation therethrough. The deflection system allows for conducting the magnetic field created by the magnetic deflector through the pole piece assembly towards the opening in the pole piece assembly. This enables to increase the magnetic field value in the vicinity of the sample at the optical axis of the lens arrangement at a given electric current through the excitation coils of the magnetic deflector, without a need to increase a working distance.

公开(公告)号：US20030230726A1

公开(公告)日：2003-12-18

申请号：US10365800

申请日：2003-02-13

Inventor： Wytze E. Van der Veer ,  Matthew F. Appel ,  Thorsten Benter

IPC: H01J037/147 ,  H01J049/40

CPC classification number: H01J49/405 ,  H01J9/14 ,  H01J37/08 ,  H01J37/12 ,  H01J37/147 ,  H01J49/06

Abstract: A technique employing volume conductive electrodes for the generation of linear or non-linear electric fields is provided for devices used in charged ion optics. A hollow cylinder of a conductive polymer, which is loaded with conductive carbon particles or inherently conductive, and which is used to improve the performance of a dual stage gridless reflectron. Instrumental resolution measurements comparing a conventional discrete ring reflectron with a hybrid polymeric/discrete ring validate the design.

Abstract translation: 对于在带电离子光学器件中使用的器件，提供了用于产生线性或非线性电场的体积导电电极的技术。 导电聚合物的中空圆柱体，其负载有导电碳颗粒或固有导电性，并且用于提高双级无栅反射器的性能。 比较常规离散环形反射镜与混合聚合物/离散环的仪器分辨率测量验证了设计。

公开(公告)号：US20030155520A1

公开(公告)日：2003-08-21

申请号：US10072214

申请日：2002-02-07

Inventor： James E. Young

IPC: H01J037/147

CPC classification number: H01J49/06 ,  H01J9/14 ,  H01J37/147

Abstract: An ion optic device is dimensionally stable over variations in temperature when constructed with a ceramic or glass-ceramic substrate. A conductive or resistive coating is applied on surfaces of the substrate that are required to be particularly conductive or resistive for the function of the ion optic device.

Abstract translation: 当用陶瓷或玻璃陶瓷衬底构建时，离子光学器件在温度变化上尺寸稳定。 导电或电阻涂层施加在衬底的表面上，对于离子光学器件的功能而言，该表面需要特别导电或电阻。

公开(公告)号：US20030102430A1

公开(公告)日：2003-06-05

申请号：US10306596

申请日：2002-11-27

Inventor： Kouji Kimura ,  Hirotami Koike

IPC: H01J037/28 ,  H01J037/147

CPC classification number: H01J37/1478 ,  H01J2237/1534 ,  H01J2237/28

Abstract: A scanning electron microscope system with an electrostatic magnetic field complex objective lens, comprising at least two or more deflection means for tilting a primary electron beam and for projecting the primary electron beam onto a specimen, wherein one of the deflection means is arranged near the objective lens so as to generate a deflection field and also to serve as a compensation field for compensating abaxial aberration at the same time, and abaxial aberration of the primary electron beam deflected by the deflection means is compensated.

Abstract translation: 一种具有静电磁场复数物镜的扫描电子显微镜系统，包括至少两个或更多个偏转装置，用于使一次电子束倾斜并将一次电子束投射到样本上，其中一个偏转装置设置在物镜附近 以产生偏转场，并且还用作同时补偿背面像差的补偿场，补偿由偏转装置偏转的一次电子束的背面像差。

公开(公告)号：US20030075686A1

公开(公告)日：2003-04-24

申请号：US10182226

申请日：2002-09-26

Inventor： Pavel Adamec

IPC: H01J037/147

CPC classification number: H01J37/153 ,  H01J37/147 ,  H01J2237/04737 ,  H01J2237/04924

Abstract: The invention provides an improved column for a charged particle beam device. The column comprises deflectors for scanning the beam over the specimen, for aligning the beam with regard to the objective and for compensating aberrations caused by the objective. Thereby, the total number of electrode arrangements and/or coil arrangements that are used for the deflectors and that are independently controllable, is 8 or less.

Abstract translation: 本发明提供了一种用于带电粒子束装置的改进的柱。 该列包括用于扫描样品上的束的偏转器，用于使光束相对于物镜对准并且用于补偿由物镜引起的像差。 因此，用于偏转器并且可独立控制的电极布置和/或线圈布置的总数为8个或更小。

公开(公告)号：US20030001110A1

公开(公告)日：2003-01-02

申请号：US10071443

申请日：2002-02-06

Inventor： Harald Enge ,  Donald W. Berrian

IPC: H01J037/147 ,  H01J037/317

CPC classification number: H01J37/3171 ,  H01J37/1474 ,  H01J37/3007

Abstract: A system for amplifying a scan of an ion beam is provided. Examples of the system include a magnetic scanner and a beam amplifier in combination. The magnetic scanner is configured to scan the ion beam in a single plane. The beam amplifier is configured to receive the ion beam from the magnetic scanner, amplify a divergence of the ion beam, and focus the ion beam in the single plane.

Abstract translation: 提供了用于放大离子束扫描的系统。 该系统的示例包括磁扫描器和光束放大器组合。 磁扫描器被配置为在单个平面中扫描离子束。 光束放大器被配置为从磁扫描器接收离子束，放大离子束的发散，并将离子束聚焦在单个平面中。