公开(公告)号：US2195789A

公开(公告)日：1940-04-02

申请号：US27024839

申请日：1939-04-26

Applicant: SOC OF CHEMICAL IND

Inventor： MAX SCHMID

CPC classification number: C07C309/40

公开(公告)号：US1924166A

公开(公告)日：1933-08-29

申请号：US43758930

申请日：1930-03-20

Applicant: NAT ANILINE & CHEM CO INC

Inventor： ROGERS DONALD G

IPC: C07C309/40

CPC classification number: C07C309/40

公开(公告)号：US09696629B2

公开(公告)日：2017-07-04

申请号：US14971087

申请日：2015-12-16

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Irvinder Kaur ,  Cong Liu ,  Kevin Rowell

IPC: G03F7/11 ,  G03F7/42 ,  G03F7/004 ,  C07C309/01 ,  C07C309/28 ,  C07C309/33 ,  C07C309/39 ,  C07C309/40 ,  G03F7/039 ,  G03F7/38 ,  G03F7/20 ,  G03F7/40

CPC classification number: G03F7/42 ,  C07C309/01 ,  C07C309/28 ,  C07C309/33 ,  C07C309/39 ,  C07C309/40 ,  G03F7/004 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/38 ,  G03F7/405

Abstract: Photoresist pattern trimming compositions are provided. The compositions comprise: a matrix polymer, an aromatic sulfonic acid and a solvent, wherein the aromatic sulfonic acid comprises one or more fluorinated alcohol group. Also provided are methods of trimming a photoresist pattern using the trimming compositions. The compositions and methods find particular applicability in the manufacture of semiconductor devices.

公开(公告)号：US20090181319A1

公开(公告)日：2009-07-16

申请号：US12015041

申请日：2008-01-16

Applicant: Wenjie Li ,  Sen Liu ,  Wu-Song Huang ,  Pushkara R. Varanasi ,  Irene Popova

Inventor： Wenjie Li ,  Sen Liu ,  Wu-Song Huang ,  Pushkara R. Varanasi ,  Irene Popova

IPC: G03F7/004 ,  G03F7/26 ,  C07C317/14

CPC classification number: C07C309/59 ,  C07C25/18 ,  C07C309/40 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/0397

Abstract: Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists. The photoacid generators are characterized by the presence of a fluorine-free aromatic sulfonate anionic component having one or more electron withdrawing groups. The photoacid generators preferably contain a fluorine-free onium cationic component, more preferably a sulfonium cationic component. The photoresist compositions preferably contain an acid sensitive imaging polymer having a lactone functionality. The compositions are especially useful for forming material patterns using 193 nm (ArF) imaging radiation.

Abstract translation: 含有无氟光致酸发生剂的无氟光致酸发生剂和光致抗蚀剂组合物可用作具有PFOS / PFAS光致酸产生剂的光致抗蚀剂的替代品。 光酸产生剂的特征在于存在具有一个或多个吸电子基团的无氟芳族磺酸盐阴离子组分。 光酸产生剂优选含有无氟鎓阳离子成分，更优选含有阳离子锍组分。 光致抗蚀剂组合物优选含有具有内酯官能度的酸敏感成像聚合物。 组合物对于使用193nm（ArF）成像辐射形成材料图案特别有用。

公开(公告)号：US6160169A

公开(公告)日：2000-12-12

申请号：US206340

申请日：1998-12-07

Applicant: Rudolf Bermes ,  Armin Haag ,  Hellmut Kast ,  Peter Krotzsch

Inventor： Rudolf Bermes ,  Armin Haag ,  Hellmut Kast ,  Peter Krotzsch

IPC: C07C209/68 ,  C07C211/07 ,  C07C303/06 ,  C07C303/32 ,  C07C303/44 ,  C07C309/00 ,  C07C309/40 ,  C09B23/14

CPC classification number: C07C209/68 ,  C07C303/06 ,  C07C303/32 ,  C07C303/44 ,  C09B23/148 ,  C07C211/07 ,  C07C309/40

Abstract: A process for preparing amine salts of 4-nitrotoluene-2-sulfonic acid by sulfonation of nitrotoluene with oleum, subsequent dilution of the reaction mixture with water and extraction with lipophilic amines, wherein the acidic aqueous solution of the sulfonation product is partially neutralized with mineral bases. The compounds prepared according to the invention are particularly suitable for preparing dyes.

Abstract translation: 通过用发烟硫酸硝化硝基甲苯磺化制备4-硝基甲苯-2-磺酸的胺盐的方法，随后用水稀释反应混合物并用亲脂胺萃取，其中磺化产物的酸性水溶液用矿物质部分中和 基地 根据本发明制备的化合物特别适用于制备染料。

公开(公告)号：US4482742A

公开(公告)日：1984-11-13

申请号：US466498

申请日：1983-04-12

Applicant: Keizaburo Yamaguchi ,  Kenichi Sugimoto ,  Yoshimitsu Tanabe

Inventor： Keizaburo Yamaguchi ,  Kenichi Sugimoto ,  Yoshimitsu Tanabe

IPC: C07C309/40 ,  C07C85/00 ,  C07C85/11 ,  C07C85/24

CPC classification number: C07C309/40

Abstract: 3,3'-diamino diphenylsulfones are prepared by catalytically reducing and dehalogenating, in the presence of a reduction catalyst and a dehydrohalogenation agent, a diphenylsulfone compound of the general formula ##STR1## in which X is a halogen atom and Y is hydrogen or a halogen atom.

Abstract translation: 3,3'-二氨基二苯基砜通过在还原催化剂和脱卤化氢剂的存在下，通式为“IMAGE”的二苯砜化合物，其中X为卤素原子，Y为氢或 卤素原子。

公开(公告)号：US3607877A

公开(公告)日：1971-09-21

申请号：US3607877D

申请日：1968-10-31

Applicant: DOW CHEMICAL CO

Inventor： DOMENICO PENELOPE B

IPC: C07B43/02 ,  C07C201/04 ,  C07C201/10 ,  C07C205/06 ,  C07C205/10 ,  C07C205/12 ,  C07C205/57 ,  C07D213/61 ,  C07D213/71 ,  C07D213/79 ,  C07D213/84 ,  C07D31/40

CPC classification number: C07D213/79 ,  C07B43/02 ,  C07C201/10 ,  C07C303/22 ,  C07C319/20 ,  C07D213/61 ,  C07D213/71 ,  C07D213/84 ,  C07C205/06 ,  C07C205/11 ,  C07C205/12 ,  C07C205/57 ,  C07C309/40 ,  C07C323/09

Abstract: A process is disclosed for converting aromatic thiols to the corresponding nitroso- or nitro-substituted compounds by treating the thiol compounds with an excess of nitric acid having a HNO3 concentration of 90 to 100 percent. Representative starting compounds are benzenethiols and pyridinethiols which, in addition to the thiol group, are substituted with one or more electronwith-drawing groups such, for example, as chloro, nitro or cyano, among others. The nitroso and nitro compounds produced during the reaction have utility as pesticides and are variously effective as herbicides and in the control of fungi and nematodes as well as of parasites infecting warmblooded animals.

公开(公告)号：US2191820A

公开(公告)日：1940-02-27

申请号：US23807638

申请日：1938-10-31

Applicant: MONTEDISON SPA

Inventor： FILIPPO BERETTA

IPC: C07C303/22 ,  C07C309/40

CPC classification number: C07C303/22 ,  C07C309/40

公开(公告)号：US1859583A

公开(公告)日：1932-05-24

申请号：US8814826

申请日：1926-02-13

Applicant: NAT ANILINE & CHEM CO INC

Inventor： CROWELL JOYCE H

IPC: C07C309/40

CPC classification number: C07C309/40

公开(公告)号：US1756537A

公开(公告)日：1930-04-29

申请号：US8814926

申请日：1926-02-13

Applicant: NAT ANILINE & CHEM CO INC

Inventor： COTTON WILLIAM J

IPC: C07C303/44 ,  C07C309/40 ,  C07F3/00

CPC classification number: C07C303/44 ,  C07F3/003 ,  C07C309/40