公开(公告)号：US20180093307A1

公开(公告)日：2018-04-05

申请号：US15566958

申请日：2016-04-13

申请人： IDE TECHNOLOGIES LTD

发明人： Tomer EFRAT ,  Itamar HITE

IPC分类号： B08B17/04 ,  B08B7/00 ,  F28G9/00 ,  F28G13/00 ,  F28F19/02 ,  B01D1/00

CPC分类号： B08B17/04 ,  B01D1/0082 ,  B08B7/0014 ,  C02F1/042 ,  F28F19/02 ,  F28G9/00 ,  F28G13/00 ,  F28G13/005

摘要： A method of cleaning an evaporator that includes at least one heat transfer element for the evaporation of water, comprising forming a sacrificial layer of a first material on a surface of the heat transfer element (1); evaporating water that includes a second material to deposit the second material on top of the sacrificial layer (2, 3); and cleaning the evaporator by removing both the sacrificial layer formed on the heat transfer element and the second layer formed on top of the sacrificial layer; wherein the first material is more easily removed from the heat transfer element than the second material (4).

公开(公告)号：US20170274427A1

公开(公告)日：2017-09-28

申请号：US15253577

申请日：2016-08-31

申请人： KABUSHIKI KAISHA TOSHIBA

发明人： Hideaki SAKURAI ,  Kyo OTSUBO ,  Kenji MASUI ,  Tetsuo TAKEMOTO ,  Minako INUKAI ,  Masato NAKA

IPC分类号： B08B7/00 ,  G03F7/00

CPC分类号： B08B7/0014 ,  B08B3/10 ,  B08B7/0092 ,  G03F7/0002 ,  H01L21/02063 ,  H01L21/67051 ,  H01L21/67057

摘要： A substrate cleaning method includes: steps (a) to (d). In step (a), a liquid is supplied onto a nanoimprint template substrate that has a patterned surface with foreign particles to form a liquid film on the patterned surface. In step (b), the liquid film is solidified to form a solidified film including the foreign particles. In step (c), the substrate is reversed. In step (d), the solidified film is melted to remove the foreign particles.

公开(公告)号：US20160365241A1

公开(公告)日：2016-12-15

申请号：US15118914

申请日：2015-01-09

申请人： EV GROUP E. THALLNER GMBH

发明人： Andreas FEHKUHRER

IPC分类号： H01L21/02 ,  B08B5/00 ,  B08B3/08 ,  B08B3/12 ,  H01L21/768 ,  B08B7/00

CPC分类号： H01L21/02057 ,  B08B3/08 ,  B08B3/12 ,  B08B5/00 ,  B08B7/0014 ,  B08B7/0035 ,  H01L21/76898

摘要： A method for temporary coating of cavities, which at least partially run through a semiconductor substrate and are provided for a permanent coating and/or equipping, with a temporarily applied coating material before processing steps for processing at least one surface of the semiconductor substrate. In addition, a method for removing a temporary coating of cavities of a semiconductor substrate, whereby the coating is applied according to a previously-mentioned method and whereby, in particular immediately afterwards, a permanent coating and/or equipping of the cavities is carried out.

摘要翻译： 一种用于在处理用于处理半导体衬底的至少一个表面的步骤的处理步骤之前，至少部分地穿过半导体衬底并提供用于永久涂覆和/或装备临时涂覆的涂层材料的空腔的方法。 此外，一种用于去除半导体衬底的空腔的临时涂层的方法，由此根据前述方法施加涂层，并且由此特别是紧接着之后进行空腔的永久性涂布和/或装备 。

公开(公告)号：US20160303003A1

公开(公告)日：2016-10-20

申请号：US15130759

申请日：2016-04-15

申请人： ATTICUS INDUSTRIES INC

发明人： Alan Troy HALE ,  Lane Kristine HALE ,  Jakob BREDSGUARD ,  Dalin WINTERS

IPC分类号： A61K8/04 ,  A45D19/00 ,  B08B7/04 ,  B01J20/24 ,  B01J20/04 ,  B01J20/10 ,  A61Q19/10 ,  A61Q5/02 ,  A61K8/73 ,  A61K8/19 ,  A61K8/25 ,  A61K8/97 ,  A61K8/67 ,  C09K3/30 ,  B05B11/00

CPC分类号： A61K8/046 ,  A45D2019/0058 ,  A61K8/0279 ,  A61K8/19 ,  A61K8/25 ,  A61K8/732 ,  A61K8/97 ,  A61Q5/02 ,  A61Q19/10 ,  B01J20/043 ,  B01J20/10 ,  B01J20/24 ,  B05B11/00 ,  B08B7/0014 ,  C09K3/30

摘要： Processes and devices are disclosed for removing sand from a surface, such as skin, using a spray device containing a formula comprising moisture-absorbing powder, propellant, and solvent. The formula is sprayed on a sandy surface using the spray device, and the sandy surface is then wiped to remove sand therefrom.

摘要翻译： 公开的方法和装置用于使用包含吸湿粉末，推进剂和溶剂的配方的喷雾装置从表面例如皮肤去除沙子。 使用喷雾装置将配方喷洒在沙质表面上，然后擦拭砂表面以从中除去沙子。

公开(公告)号：US20160279679A1

公开(公告)日：2016-09-29

申请号：US15067762

申请日：2016-03-11

申请人： SCREEN Holdings Co., Ltd.

发明人： Hiroaki KITAGAWA ,  Katsuhiko MIYA

IPC分类号： B08B3/10 ,  H01L21/67 ,  B08B7/00 ,  H01L21/02

CPC分类号： B08B3/10 ,  B08B7/0014 ,  B08B7/0064 ,  B08B7/0092 ,  H01L21/02041 ,  H01L21/02052 ,  H01L21/67028 ,  H01L21/6704 ,  H01L21/67109

摘要： A solidified body forming step includes: a first step of landing a processing surface of a cooling member on a liquid film to solidify the liquid to be solidified located in an area sandwiched between an upper surface and the processing surface; and a second step of releasing the processing surface from the solidified area solidified in the first step. The processing surface has a lower temperature than a freezing point of the liquid to be solidified. Adhesion between the solidified area and the processing surface is smaller than that between the solidified area and the upper surface.

摘要翻译： 固化体形成步骤包括：将冷却构件的处理面落在液膜上的第一步骤，使待固化的待固化液体位于夹在上表面与处理表面之间的区域中; 以及在第一步骤中固化的固化区域释放处理表面的第二步骤。 加工表面的温度低于待固化液体的凝固点。 凝固区域和加工面之间的粘合力小于固化区域和上表面之间的粘合力。

公开(公告)号：US09159593B2

公开(公告)日：2015-10-13

申请号：US12485733

申请日：2009-06-16

申请人： Mark Naoshi Kawaguchi ,  David Mui ,  Mark Wilcoxson

发明人： Mark Naoshi Kawaguchi ,  David Mui ,  Mark Wilcoxson

IPC分类号： B08B3/10 ,  H01L21/67 ,  H01L21/02 ,  B08B7/00 ,  C11D11/00 ,  C11D17/04

CPC分类号： H01L21/67051 ,  B08B3/10 ,  B08B7/0014 ,  C11D11/0047 ,  C11D11/0058 ,  C11D17/049 ,  H01L21/02052 ,  H01L21/02057

摘要： Apparatus and methods for removing particle contaminants from a solid surface includes providing a layer of a viscoelastic material on the solid surface. The viscoelastic material is applied as a thin film and exhibits substantial liquid-like characteristics. The viscoelastic material at least partially binds with the particle contaminants. A high velocity liquid is applied to the viscoelastic material, such that the viscoelastic material exhibits solid-like behavior. The viscoelastic material is thus dislodged from the solid surface along with the particle contaminants, thereby cleaning the solid surface of the particle contaminants.

摘要翻译： 从固体表面去除颗粒污染物的装置和方法包括在固体表面上提供一层粘弹性材料。 粘弹性材料被用作薄膜并显示出显着的液体样特征。 粘弹性材料至少部分地与颗粒污染物结合。 将高速液体施加到粘弹性材料上，使得粘弹性材料表现出类固体状态。 因此粘弹性材料与颗粒污染物一起从固体表面脱落，从而清洁颗粒污染物的固体表面。

公开(公告)号：US20150128995A1

公开(公告)日：2015-05-14

申请号：US14539206

申请日：2014-11-12

申请人： TOKYO ELECTRON LIMITED

发明人： Miyako KANEKO ,  Keiji Tanouchi ,  Takehiko Orii ,  Itaru Kanno

IPC分类号： H01L21/02 ,  H01L21/677 ,  B08B3/04 ,  H01L21/67

CPC分类号： H01L21/02063 ,  B08B7/0014 ,  C11D11/0047 ,  H01L21/67051

摘要： A method for cleaning a substrate, includes supplying to a substrate having a hydrophilic surface a film-forming processing liquid which includes a volatile component and forms a film on the substrate, vaporizing the volatile component in the film-forming processing liquid such that the film-forming processing liquid solidifies or cures on the substrate and forms a processing film on the hydrophilic surface of the substrate, and supplying to the substrate having the processing film a strip-processing liquid for stripping the processing film from the substrate.

摘要翻译： 一种清洗基板的方法，包括向具有亲水表面的基板供给包含挥发性成分的成膜处理液，并在基板上形成膜，使成膜处理液中的挥发成分蒸发，使得膜 在衬底的亲水表面上固化或固化在衬底上并在衬底的亲水表面上形成处理膜，并且向具有处理膜的衬底提供用于从衬底剥离处理膜的剥离处理液。

公开(公告)号：US20150020852A1

公开(公告)日：2015-01-22

申请号：US14332909

申请日：2014-07-16

申请人： DAINIPPON SCREEN MFG. CO., LTD.

发明人： Masahiko KATO ,  Katsuhiko MIYA ,  Hiroyuki YASHIKI ,  Yoshiki IMURO

IPC分类号： B08B3/10

CPC分类号： B08B3/10 ,  B08B7/0014 ,  H01L21/6715

摘要： A substrate processing apparatus comprises: an air flow generator which generates a down flow by gas flowing from top to bottom around a substrate W held horizontally; a liquid film former which forms a liquid film by supplying a liquid on an upper surface of the substrate; a cooling gas discharge nozzle which discharges cooling gas of a temperature lower than a freezing point of the liquid to the liquid film and thereby freezes the liquid film; and a remover which removes a frozen film formed by freezing the liquid film from the substrate. The air flow generator reduces a flow velocity of the down flow when the cooling gas is discharged to the liquid film from the cooling gas discharge nozzle than when the liquid is supplied to the substrate from the liquid film former.

摘要翻译： 一种基板处理装置，包括：气流发生器，其通过从顶部向下流动的气体围绕保持水平的基板W产生下降流; 液体成膜剂，其通过在所述基材的上表面上供给液体而形成液膜; 冷却气体排出喷嘴，其将低于液体的凝固点的冷却气体排出到液膜，从而使液膜冻结; 以及去除通过从基板冷冻液膜形成的冷冻膜的去除剂。 当从液体成膜剂向液体供给液体时，冷却气体从冷却气体排出喷嘴排出到液体膜时，气流发生器降低向下流动的流速。

公开(公告)号：US20140251860A1

公开(公告)日：2014-09-11

申请号：US14352680

申请日：2012-10-01

申请人： Joker AG

发明人： Meinrad Flury

IPC分类号： C11D3/20 ,  B65D85/00

CPC分类号： C11D3/20 ,  A01K13/001 ,  B08B7/0014 ,  B65D85/70 ,  C11D3/48 ,  C11D7/268 ,  C11D17/049

摘要： A means is suggested for cleaning domestic animal paws, by means of which solid particles can be removed from the domestic animal paws. This consists of a highly viscous modelling mass with a viscosity of 50 000-150 000 mPa·s, preferably of 80-120 mPa·s. This compound is formed from natural polygalactomannans and also 75-95% by weight of bound water and contains a disinfecting solution from the group of saturated monovalent alcohols. Preferably, the compound additionally contains lubricating, anti-inflammatory, disinfecting, antiseptic and regenerative agents. The compound is created such that contaminations can be kneaded into the compound by means of a few kneading movements. For use, the compound (3) is introduced into a container (1) which has a flat recess for accommodating the domestic animal paw cleaning means. The compound is protected from drying out by means of a lid (4), preferably made of a soft plastic, which covers the recess in a positive-fitting manner.

摘要翻译： 建议一种清洁家畜动物爪的手段，通过这种手段可以将固体颗粒从家畜爪中取出。 这包括粘度高达50 000-150 000 mPa·s，优选80-120 mPa·s的高粘度建模质量。 该化合物由天然聚半乳甘露聚糖和75-95重量％的结合水形成，并含有一组饱和一元醇的消毒溶液。 优选地，化合物另外含有润滑，消炎，消毒，防腐和再生剂。 产生化合物，使得可以通过少量捏合运动将污染物混合到化合物中。 为了使用，化合物（3）被引入容器（1），容器（1）具有用于容纳家畜爪子清洁装置的平坦凹部。 防止化合物通过优选由软塑料制成的盖子（4）干燥，该盖子以正配合的方式覆盖凹槽。

公开(公告)号：US07942976B2

公开(公告)日：2011-05-17

申请号：US11866457

申请日：2007-10-03

申请人： Katsuhiko Miya ,  Akira Izumi

发明人： Katsuhiko Miya ,  Akira Izumi

IPC分类号： H01L21/304 ,  B08B3/00

CPC分类号： H01L21/02057 ,  B08B7/0014 ,  H01L21/0209 ,  H01L21/67051 ,  Y10S134/902

摘要： A rinsing liquid supplier includes a temperature adjuster. The temperature adjuster cools DIW to a temperature lower than room temperature. This temperature adjuster cools down DIW to a temperature not more than 10 degrees centigrade for instance, and cooling down to an even lower temperature of 5 degrees centigrade or below is more preferable. Meanwhile, the temperature adjuster maintains DIW at not less than 0 degrees centigrade, which prevents freezing of the DIW. The cooled DIW supplied to a rinsing liquid pipe is discharged from the rinsing liquid discharge nozzle toward the top surface of the substrate, to thereby form a liquid film. Further, the cooled DIW is discharged toward the rear surface of the substrate from the liquid discharge nozzle via the liquid supply pipe, to thereby form the liquid film on the rear surface. Since the liquid films are already cooled, they are frozen in a short time when the cooling gas is discharged toward the top surface and the rear surface of the substrate.

摘要翻译： 冲洗液供应商包括温度调节器。 温度调节器将DIW冷却至低于室温的温度。 该温度调节器例如将DIW冷却至不高于10摄氏度的温度，并且更优选冷却至更低的5摄氏度或更低的温度。 同时，温度调节器将DIW维持在不低于摄氏0度，防止DIW冻结。 供给到冲洗液管的冷却的DIW从冲洗液体排出喷嘴朝向基板的上表面排出，从而形成液膜。 此外，冷却的DIW经由液体供给管从液体排出喷嘴朝向基板的后表面排出，从而在后表面上形成液膜。 由于液膜已经被冷却，所以当冷却气体朝向基板的顶表面和后表面排出时，它们在短时间内被冷冻。