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1.
公开(公告)号:US20170274427A1
公开(公告)日:2017-09-28
申请号:US15253577
申请日:2016-08-31
发明人: Hideaki SAKURAI , Kyo OTSUBO , Kenji MASUI , Tetsuo TAKEMOTO , Minako INUKAI , Masato NAKA
CPC分类号: B08B7/0014 , B08B3/10 , B08B7/0092 , G03F7/0002 , H01L21/02063 , H01L21/67051 , H01L21/67057
摘要: A substrate cleaning method includes: steps (a) to (d). In step (a), a liquid is supplied onto a nanoimprint template substrate that has a patterned surface with foreign particles to form a liquid film on the patterned surface. In step (b), the liquid film is solidified to form a solidified film including the foreign particles. In step (c), the substrate is reversed. In step (d), the solidified film is melted to remove the foreign particles.
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公开(公告)号:US20160343543A1
公开(公告)日:2016-11-24
申请号:US15225491
申请日:2016-08-01
发明人: Tetsuo TAKEMOTO
IPC分类号: H01J37/32
CPC分类号: H01J37/3211 , H01J37/32082 , H01J37/32568 , H01J37/32715 , H01J37/32834 , H01J2237/3341
摘要: According to one embodiment, an apparatus for manufacturing a template includes a vacuum chamber, an electrode and an adjustor. The vacuum chamber includes an inlet and an exhaust port of a reactive gas. The vacuum chamber is capable of maintaining an atmosphere depressurized below atmospheric pressure. The electrode is provided in an interior of the vacuum chamber. A high frequency voltage is applied to the electrode. A substrate is placed on the electrode. The substrate has a back surface on a side of the electrode. A recess is provided in the back surface. The adjustor is inserted into the recess. The adjustor is insulative.
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