公开(公告)号：US07671706B2

公开(公告)日：2010-03-02

申请号：US11697025

申请日：2007-04-05

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： H01P1/20

CPC分类号： H03H7/09 ,  H03H7/1708 ,  H03H7/1725 ,  H03H7/1775 ,  H03H7/1791 ,  H03H2001/0085

摘要： In a multilayer bandpass filter, capacitances are produced between a ground electrode provided in a ground electrode formation layer and capacitor electrodes provided in a capacitor electrode formation layer. A plurality of inductor electrodes are defined by via-electrodes and line electrodes such that loop planes of inductor electrodes at least partially overlap each other when seen in a direction in which the inductor electrodes are arranged. The direction of the loop of the inductor electrode of the LC parallel resonator located (at a first stage) at an input end is set to be opposite to the direction of the loop of the inductor electrodes of the LC parallel resonator (at a second stage) adjacent to the inductor electrode of the LC parallel resonator located at the input end. Similarly, the direction of the loop of the inductor electrode of the LC parallel resonator located (at a fifth stage) at an output end is set to be opposite to the direction of the loop of the inductor electrodes of the LC parallel resonator (at a fourth stage) adjacent to the inductor electrode of the LC parallel resonator located at the output end.

摘要翻译： 在多层带通滤波器中，在设置在接地电极形成层中的接地电极和设置在电容器电极形成层中的电容器电极之间产生电容。 多个电感器电极由通孔电极和线电极限定，使得当电感器电极布置方向看时，电感器电极的环面至少部分地彼此重叠。 位于输入端（处于第一级）的LC并联谐振器的电感器电极的环路的方向被设置为与LC并联谐振器的电感器电极的环路的方向相反（在第二级 ），位于输入端的LC并联谐振器的电感电极。 类似地，位于（在第五级）输出端的LC并联谐振器的电感器电极的环路的方向被设置为与LC并联谐振器的电感器电极的环路的方向相反（在 第四级）与位于输出端的LC并联谐振器的电感器电极相邻。

公开(公告)号：US06897963B1

公开(公告)日：2005-05-24

申请号：US09593800

申请日：2000-06-15

申请人： Tetsuo Taniguchi ,  Saburo Kamiya

发明人： Tetsuo Taniguchi ,  Saburo Kamiya

IPC分类号： G03F7/20 ,  H01L21/00 ,  H01L21/68 ,  G01B9/02

CPC分类号： G03F7/70775 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/70741

摘要： A stage device suitable for exposure apparatus used to produce semiconductor devices, is movable in an area wider than the measurement area of interferometer for position measurement, and is capable of measuring the position with high precision. When a movable stage moves from the position where the laser beams from laser interferometers are not applied into the measurement area of the laser interferometer, the position of reference mark is measured by a wafer alignment sensor, and the measurement value measured by the laser interferometer is corrected based on the results of the measurement by the wafer alignment sensor. When another movable stage enters the measurement area of the laser interferometer, the position of the reference mark is similarly measured by a wafer alignment sensor, and the measurement value measured by the laser interferometer is corrected based on the results of the measurement by the wafer alignment sensor.

摘要翻译： 适用于制造半导体装置的曝光装置的舞台装置，可以在比用于位置测量的干涉仪的测量区域宽的区域中移动，能够高精度地测量位置。 当可移动台从激光干涉仪的激光束不被施加到激光干涉仪的测量区域的位置移动时，通过晶片对准传感器测量参考标记的位置，并且由激光干涉仪测量的测量值为 基于晶片对准传感器的测量结果进行校正。 当另一可移动台进入激光干涉仪的测量区域时，基准标记的位置由晶圆对准传感器类似地测量，并且由激光干涉仪测得的测量值基于晶片对准的测量结果来校正 传感器。

公开(公告)号：US06417745B1

公开(公告)日：2002-07-09

申请号：US09557360

申请日：2000-04-25

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： H03H701

CPC分类号： H03H7/1775 ,  H03H7/0115 ,  H03H7/1733 ,  H03H2001/0085

摘要： An LC filter has a ratio of the inductance of an inductor to the capacitance of a capacitor, defining an input-side parallel LC resonant circuit, which is different from a ratio of the inductance of an inductor to the capacitance of a capacitor, defining an output-side parallel LC resonant circuit. The inductor of the input-side parallel LC resonant circuit includes inductor patterns. The inductor of the output-side parallel LC resonant circuit includes different inductor patterns. The capacitor of the input-side circuit includes capacitor patterns. The capacitor of the output-side circuit includes different capacitor patterns.

摘要翻译： LC滤波器具有电感器的电感与电容器的电容的比率，限定了输入侧并联LC谐振电路，其不同于电感器的电感与电容器的电容的比率，其定义为 输出侧并联LC谐振电路。 输入侧并联LC谐振电路的电感器包括电感器图案。 输出侧并联LC谐振电路的电感器包括不同的电感器图形。 输入侧电路的电容器包括电容器图案。 输出侧电路的电容器包括不同的电容器图案。

公开(公告)号：US06312859B1

公开(公告)日：2001-11-06

申请号：US09263803

申请日：1999-03-08

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03F900

CPC分类号： G03F9/7003 ,  G03F7/70258 ,  G03F7/70825 ,  G03F7/70883

摘要： An imagery characteristic is corrected by changing the position and/or orientation of a reticle or lens elements of a projection lens system. Correction of the imagery characteristic, however, causes displacement of the projected pattern image of the reticle. The relation between the driving amount of the lens elements and reticle and the lateral displacement of the center of the pattern image of the reticle is stored as a table in advance. When the lens elements and/or the reticle are driven, lateral displacement of the pattern image can be obtained by accessing the table. Alternatively, the lateral displacement can be determined using a base-line amount corresponding to a distance between a detection center of a substrate position detector and a center of the projected image. Once the pattern image displacement is determined, the substrate can be accurately positioned. In another arrangement, a mask alignment method prevents positional shift of a projected image of a mask pattern even if the projection magnification of the projection optical system is changed.

摘要翻译： 通过改变投影透镜系统的掩模版或透镜元件的位置和/或取向来校正图像特性。 然而，图像特征的校正导致标线的投影图案图像的位移。 透镜元件和掩模版的驱动量与标线图案的图案图像的中心的横向位移之间的关系作为表预先存储。 当透镜元件和/或光罩被驱动时，可以通过访问桌子来获得图案图像的横向位移。 或者，可以使用对应于基板位置检测器的检测中心与投影图像的中心之间的距离的基线量来确定横向位移。 一旦确定了图案图像位移，就可以准确地定位基板。 在另一种布置中，即使投影光学系统的投影倍率改变，掩模对准方法也可以防止掩模图案的投影图像的位置偏移。

公开(公告)号：US5841520A

公开(公告)日：1998-11-24

申请号：US691377

申请日：1996-08-02

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G01N21/86

CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F7/70358 ,  G03F7/70725 ,  G03F9/70

摘要： A scanning type exposure apparatus comprises a mask stage RST for scanning a mask R across an illumination area on the mask R, a projection optical system PL for projecting an image of a pattern on the mask R onto a photosensitive substrate W, and a substrate stage WST for scanning the photosensitive substrate W across an exposure area. The apparatus comprises an image pickup unit 53 having its light-receiving section 1 provided on the substrate stage WST, for photoelectrically detecting an image of a mark pattern on the mask R, and a combining unit 4 for combining signals outputted from the image pickup unit 53 during a period in which the light-receiving section is scanned across the exposure area in synchronization with scanning for the mark pattern across the illumination area. Image formation characteristics or a position of the image of the mark pattern is determined on the basis of an output of the combining unit 4, which may be corrected before actual exposure. Correction is also performed by using synchronization errors. It is also possible to use an edge scan type sensor in place of the image pickup unit 53.

摘要翻译： 扫描型曝光装置包括用于在掩模R上的照明区域上扫描掩模R的掩模载台RST，用于将掩模R上的图案的图像投影到感光基板W上的投影光学系统PL，以及基板台 用于在曝光区域扫描感光基片W的WST。 该装置包括：图像拾取单元53，其具有设置在基板台WST上的光接收部分1，用于光电检测掩模R上的标记图案的图像;以及组合单元4，用于组合从图像拾取单元 在扫描横跨照明区域的标记图案的同时，在光接收部分跨过曝光区域扫描的期间53。 基于可以在实际曝光之前校正的组合单元4的输出来确定图像形成特征或标记图案的图像的位置。 使用同步错误也可进行校正。 也可以使用边缘扫描型传感器代替图像拾取单元53。

公开(公告)号：US5721608A

公开(公告)日：1998-02-24

申请号：US582019

申请日：1996-01-02

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03F7/207 ,  B60R16/02 ,  B60R16/027 ,  B60R21/01 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03B27/42

CPC分类号： G03F7/70358 ,  B60R16/027 ,  B60R21/017 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70891

摘要： A projection exposure apparatus has an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with light from a light source, a projection optical system for forming an image of the pattern of the mask on a photosensitive substrate, a mask stage for holding the mask and moving the mask within a plane perpendicular to the optical axis of the projection optical system, a substrate stage for moving the photosensitive substrate within a plane conjugate to the plane with respect to the projection optical system, and imaging characteristic correction device for correcting an imaging characteristic of the projection optical system. The apparatus synchronously moves the mask and the photosensitive substrate along the optical axis of the projection optical system so as to expose the entire pattern surface of the mask. The apparatus includes an incident light intensity input device for inputting the intensity of the illumination light, which is incident on the projection optical system through the mask, in accordance with the position of the mask, and an imaging characteristic calculation device for calculating a variation in imaging characteristic of the projection optical system on the basis of information from the incident light intensity input device. The imaging characteristic correction device is controlled on the basis of a result obtained by the imaging characteristic calculation device.

摘要翻译： 投影曝光装置具有照明光学系统，用于照射来自光源的光，其上形成有预定图案的掩模，用于在感光基板上形成掩模图案的图像的投影光学系统，掩模 用于保持掩模并在与投影光学系统的光轴垂直的平面内移动掩模的阶段，用于在与投影光学系统共面于该平面的平面内移动感光基板的基板台，以及成像特性校正 用于校正投影光学系统的成像特性的装置。 该装置沿着投影光学系统的光轴同步移动掩模和感光基片，以露出掩模的整个图案表面。 该装置包括：入射光强度输入装置，用于根据掩模的位置输入入射在投影光学系统上的照明光的强度;以及成像特征计算装置，用于计算变化 基于来自入射光强度输入装置的信息，投影光学系统的成像特性。 基于由成像特征计算装置获得的结果来控制成像特性校正装置。

公开(公告)号：US5650840A

公开(公告)日：1997-07-22

申请号：US527216

申请日：1995-09-12

申请人： Tetsuo Taniguchi

发明人： Tetsuo Taniguchi

IPC分类号： G03B13/36 ,  G02B7/28 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G03B27/52

CPC分类号： G03F9/70

摘要： A method of detecting a focus position of a projection optical system at a high throughput and with high accuracy. A sensor pattern (SP) which is provided on a wafer stage (WS) as a light-receiving part of a photoelectric sensor (PES) is moved in the direction of an optical axis (AX) of a projection optical system (PL), and at the same time, it is moved in a direction (X) perpendicular to the optical axis (AX). While doing so, a reticle pattern (RP) which is provided on a reticle (R) is illuminated by illuminating light (IL) for exposure, and an image of the reticle pattern (RP) is formed on the sensor pattern (SP) through the projection optical system (PL). Light passing through the sensor pattern (SP) is received by the photoelectric sensor (PES), and a focus position is detected on the basis of the intensity of the transmitted light.

摘要翻译： 一种以高吞吐量和高精度检测投影光学系统的聚焦位置的方法。 设置在作为光电传感器（PES）的受光部的晶片台（WS）上的传感器图案（SP）沿着投影光学系统（PL）的光轴（AX）的方向移动， 并且同时沿垂直于光轴（AX）的方向（X）移动。 在这样做的同时，通过用于曝光的照明光（IL）照射设置在掩模版（R）上的掩模版图案（RP），并且在传感器图案（SP）上形成标线图案（RP）的图像，通过 投影光学系统（PL）。 通过传感器图案（SP）的光被光电传感器（PES）接收，并且基于透射光的强度来检测聚焦位置。

公开(公告)号：US5404118A

公开(公告)日：1995-04-04

申请号：US96716

申请日：1993-07-23

申请人： Hisatake Okamura ,  Teruhisa Tsuru ,  Tetsuo Taniguchi ,  Ken Tonegawa

发明人： Hisatake Okamura ,  Teruhisa Tsuru ,  Tetsuo Taniguchi ,  Ken Tonegawa

IPC分类号： H01P1/203 ,  H03H7/01 ,  H03H7/00 ,  H01P7/00

CPC分类号： H01P1/20345 ,  H01P1/20381 ,  H03H7/0123 ,  H03H7/1758 ,  H03H7/1775 ,  H03H2001/0085

摘要： Coil electrodes having a U-shape and shield electrodes having a plane shape are formed on plural dielectric layers. The coil electrodes are connected via through holes which are formed through the dielectric layers, and a spiral electrode is formed. An earth terminal and an input/output terminal are drawn out from the coil electrode to the end portion of the dielectric layer. The shield electrodes are formed on both of the coil electrodes. The dielectric layers are laminated, and the shield electrode and the earth terminal are connected by an external electrode. An external electrode connected to the input/output terminal is formed. A band-pass filter is made by forming plural spiral electrodes and magnetically coupling the spiral electrodes.

摘要翻译： 在多个电介质层上形成具有U形的线圈电极和具有平面形状的屏蔽电极。 线圈电极通过通过电介质层形成的通孔连接，形成螺旋电极。 接地端子和输入/输出端子从线圈电极拉出到电介质层的端部。 屏蔽电极形成在两个线圈电极上。 电介质层被层压，屏蔽电极和接地端子通过外部电极连接。 形成连接到输入/输出端子的外部电极。 通过形成多个螺旋电极并磁耦合螺旋电极来制造带通滤波器。

公开(公告)号：US5400000A

公开(公告)日：1995-03-21

申请号：US112652

申请日：1993-08-26

申请人： Hisatake Okamura ,  Masahiro Kasahara ,  Kenji Ajioka ,  Tetsuo Taniguchi

发明人： Hisatake Okamura ,  Masahiro Kasahara ,  Kenji Ajioka ,  Tetsuo Taniguchi

IPC分类号： H01P1/203 ,  H01P7/08 ,  H03H5/00 ,  H03H7/01 ,  H03H7/00

CPC分类号： H01P1/20381 ,  H01P7/084 ,  H03H5/003 ,  H03H7/0115 ,  H03H2001/0085

摘要： Two coil electrode patterns are formed on one surface of a plate containing a dielectric material. These coil electrode patterns are formed in a loop shape, and disposed in a magnetically connected state with each other. Input/output terminal patterns and earth terminal patterns are drawn out from the coil electrode patterns toward edges on different sides of the plate. The input/output terminal pattern and the earth terminal pattern of one coil electrode pattern are disposed at a selected distance from each other so as to provide a predetermined impedance. An earth electrode pattern is formed opposite the coil electrode patterns with the plate between them. Earth terminal patterns are connected to the earth electrode pattern. The earth terminal patterns of the earth electrode pattern are connected to the earth terminal patterns of the coil electrode patterns. A trimming electrode may be formed for adjusting the passing band frequency of the band-pass filter optionally.

摘要翻译： 在包含介电材料的板的一个表面上形成两个线圈电极图案。 这些线圈电极图案形成为环状，并且彼此以磁性连接状态配置。 输入/输出端子图案和接地端子图案从线圈电极图案向板的不同侧边缘拉出。 一个线圈电极图案的输入/输出端子图案和接地端子图案被设置在彼此选定的距离处，以便提供预定的阻抗。 与线圈电极图案相对地形成接地电极图案，板之间。 接地端子图案连接到接地电极图案。 接地电极图案的接地端子图案连接到线圈电极图案的接地端子图案。 可以形成修整电极，用于可选地调节带通滤波器的通带频率。

公开(公告)号：US5177752A

公开(公告)日：1993-01-05

申请号：US794619

申请日：1991-11-15

申请人： Jun Ohya ,  Tetsuo Taniguchi

发明人： Jun Ohya ,  Tetsuo Taniguchi

IPC分类号： H01S5/06 ,  H01S5/0625

CPC分类号： H01S5/0601 ,  H01S5/0625

摘要： Ultrashort optical pulses of a high peak output are generated by gain-switching of a semiconductor laser possessing a current non-injection region with short current pulses. By coupling this semiconductor laser to a wavelength conversion element, a second harmonic wave is generated, and ultrashort optical pulses of a short wavelength and a high peak output are generated.

摘要翻译： 通过具有短电流脉冲的具有电流非注入区域的半导体激光器的增益切换来产生高峰值输出的超短脉冲光脉冲。 通过将该半导体激光器耦合到波长转换元件，产生二次谐波，并且产生短波长和高峰值输出的超短光脉冲。