公开(公告)号：US10684561B2

公开(公告)日：2020-06-16

申请号：US16516452

申请日：2019-07-19

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Hao-Yu Lan ,  Po-Chung Cheng ,  Ching-Juinn Huang ,  Tzung-Chi Fu ,  Tsung-Yen Lee

IPC: G03F9/00

Abstract: A method includes the following operations. A reference image of a mask having a plurality of mapping marks is acquired. A lithography exposing process is performed by a scanner with the mask to a photoresist layer which is formed on a substrate. Performing the lithography exposing process includes mapping a real-time image of the mask with the reference image of the mask.

公开(公告)号：US10366973B2

公开(公告)日：2019-07-30

申请号：US15797842

申请日：2017-10-30

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Hung-Wen Cho ,  Fu-Jye Liang ,  Chun-Kuang Chen ,  Chih-Tsung Shih ,  Li-Jui Chen ,  Po-Chung Cheng ,  Chin-Hsiang Lin

IPC: H01L27/02 ,  G06F17/50

Abstract: A layout modification method for fabricating an integrated circuit is provided. The layout modification method includes calculating uniformity of critical dimension of a patterned layer with a layout for an exposure manufacturing process to produce a semiconductor device. The patterned layer is divided into a first portion and a second portion which is adjacent to the first portion, and a width of the second portion equals to a penumbra size of the exposure manufacturing process. The layout modification method further includes retrieving an adjusting parameter for modifying the layout of the semiconductor device; determining a compensation amount based on the adjusting parameter and the uniformity of critical dimension; and compensating the critical dimension of the second portion of the patterned layer by utilizing the compensation amount to generate a modified layout.

公开(公告)号：US20190166680A1

公开(公告)日：2019-05-30

申请号：US15905951

申请日：2018-02-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chun-Chia Hsu ,  Chieh Hsieh ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Po-Chung Cheng ,  Tzung-Chi Fu ,  Bo-Tsun Liu

IPC: H05G2/00

Abstract: An EUV radiation source module includes a target droplet generator configured to generate target droplets; a first laser source configured to generate first laser pulses that heat the target droplets to produce target plumes; a second laser source configured to generate second laser pulses that heat the target plumes to produce plasma emitting EUV radiation; third and fourth laser sources configured to generate first and second laser beams, respectively, that are directed onto a travel path of the target plumes, wherein the first and second laser beams are substantially parallel; and a monitor configured to receive the first and second laser beams reflected by the target plumes.

公开(公告)号：US10204867B1

公开(公告)日：2019-02-12

申请号：US15692151

申请日：2017-08-31

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Long-Yi Chen ,  Jia-Hong Chu ,  Hsin-Chin Lin ,  Hsiang-Yu Su ,  Yun-Heng Tseng ,  Kai-Hsiung Chen ,  Yu-Ching Wang ,  Po-Chung Cheng ,  Kuei-Shun Chen ,  Chi-Kang CHang

IPC: H01L23/544 ,  H01L21/66 ,  G03F7/20

Abstract: A metrology target of a semiconductor device is provided. The metrology target includes a substrate including first and second layers. The first layer includes a first grating, a second grating, and a first dummy structure. The first dummy structure is at least formed between the first grating and the second grating. The second layer is formed over the first layer and includes a third grating and a fourth grating. The first, second, third and fourth gratings are formed based on the first spatial period. The third grating and fourth grating are placed to overlap the first grating and second grating, respectively. The first grating and the third grating are formed with a first positional offset which is along a first direction. The second grating and the fourth grating are formed with a second positional offset which is along a second direction which is opposite to the first direction.

公开(公告)号：US11675280B2

公开(公告)日：2023-06-13

申请号：US17459357

申请日：2021-08-27

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Hao-Yu Lan ,  Po-Chung Cheng ,  Ching-Juinn Huang ,  Tzung-Chi Fu ,  Tsung-Yen Lee

IPC: G03F9/00

CPC classification number: G03F9/7019

Abstract: A system is disclosed. The system includes a cleaning device and a scanner device. The cleaning device is configured to clean a mask. The scanner device is coupled to the cleaning device and is configured to receive the mask, a reference image and a real-time image that is captured at the mask. The reference image includes at least one first mark image having a plurality of mapping marks on the mask. The real-time image includes at least one second mark image having the plurality of mapping marks on the mask. The scanner device is configured to map the at least one second mark image in the real-time image with the at least one first image in the reference image, when a lithography exposing process is performed. A method is also disclosed herein.

公开(公告)号：US11150561B2

公开(公告)日：2021-10-19

申请号：US16927131

申请日：2020-07-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Hung-Wen Cho ,  Fu-Jye Liang ,  Chun-Kuang Chen ,  Chih-Tsung Shih ,  Li-Jui Chen ,  Po-Chung Cheng ,  Chin-Hsiang Lin

IPC: G03F7/20 ,  G03F7/22 ,  G03F1/22 ,  G03F1/44 ,  G03F1/36 ,  G06T7/00

Abstract: A method for collecting information in image-error compensation is provided. The method includes providing a reticle having a first image structure and a second image structure; moving a light shading member to control a first exposure field; projecting a light over the first exposure field; recording an image of the first image structure after the light is projected; moving the light shading member to control a second exposure field; projecting the light over the second exposure field; and recording an image of the second image structure after the light is projected.

公开(公告)号：US11121018B2

公开(公告)日：2021-09-14

申请号：US16926935

申请日：2020-07-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chueh-Chi Kuo ,  Tsung-Yen Lee ,  Chia-Hsin Chou ,  Tzung-Chi Fu ,  Li-Jui Chen ,  Po-Chung Cheng ,  Che-Chang Hsu

IPC: G03F1/24 ,  H01L21/683 ,  G03F7/20

Abstract: A reticle holding tool is provided. The reticle holding tool includes a housing, a reticle chuck, and a gas delivery assembly. The housing includes an opening, a top housing member, and a lateral housing member extending from the top housing member and terminating at a lower edge which is located on a predetermined plane. The reticle chuck is positioned in the housing and has an effective surface configured to secure a reticle. The effective surface is located between the predetermined plane and the top housing member. The reticle chuck is movable between two boundary lines that are perpendicular to the effective surface. A width of the opening is greater than a distance between the two boundary lines. The gas delivery assembly is positioned within the housing and configured to supply gas into the housing.

公开(公告)号：US11106146B2

公开(公告)日：2021-08-31

申请号：US16901506

申请日：2020-06-15

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Hao-Yu Lan ,  Po-Chung Cheng ,  Ching-Juinn Huang ,  Tzung-Chi Fu ,  Tsung-Yen Lee

IPC: G03F9/00

Abstract: A system is disclosed. The system includes a cleaning device and a scanner device. The cleaning device is configured to clean a mask. The scanner device is coupled to the cleaning device and is configured to receive the mask, a reference image and a real-time image that is captured at the mask. The reference image includes at least one first mark image having a plurality of mapping marks on the mask. The real-time image includes at least one second mark image having the plurality of mapping marks on the mask. The scanner device is configured to map the at least one second mark image in the real-time image with the at least one first image in the reference image, when a lithography exposing process is performed. A method is also disclosed herein.

公开(公告)号：US11086225B2

公开(公告)日：2021-08-10

申请号：US16887245

申请日：2020-05-29

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Wei-Shin Cheng ,  Hsin-Feng Chen ,  Cheng-Hao Lai ,  Shao-Hua Wang ,  Han-Lung Chang ,  Li-Jui Chen ,  Po-Chung Cheng

IPC: G03F1/58 ,  G03F1/24 ,  G03F1/52 ,  G03F7/20

Abstract: A method includes providing a plurality of fuel droplets into an EUV source vessel by a fuel droplet generator, in which the fuel droplet generator has a first portion inside the EUV source vessel and a second portion outside the EUV source vessel; generating a plurality of output signals respectively from a plurality of oscillation sensors on the fuel droplet generator; determining whether the output signals are acceptable; and determining whether an unwanted oscillation originates from the first portion of the fuel droplet generator or the second portion of the fuel droplet generator when the output signals is determined as unacceptable.

公开(公告)号：US20210235572A1

公开(公告)日：2021-07-29

申请号：US17228157

申请日：2021-04-12

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chun-Lin Louis Chang ,  Jen-Hao Yeh ,  Han-Lung Chang ,  Tzung-Chi Fu ,  Bo-Tsun Liu ,  Li-Jui Chen ,  Po-Chung Cheng

IPC: H05G2/00 ,  G21K1/06 ,  H01S3/13 ,  H01S3/104

Abstract: A system includes a laser source operable to provide a laser beam, a laser amplifier having a gain medium operable to provide energy to the laser beam when the laser beam passes through the laser amplifier, and a residual gain monitor operable to provide a probe beam and operable to derive a residual gain of the laser amplifier from the probe beam when the probe beam passes through the laser amplifier while being offset from the laser beam in time or in path.