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公开(公告)号：US20240297476A1
公开(公告)日：2024-09-05
申请号：US18647199
申请日：2024-04-26
发明人： Chun-Lin Louis Chang , Henry Tong Yee Shian , Alan Tu , Han-Lung Chang , Tzung-Chi Fu , Bo-Tsun Liu , Li-Jui Chen , Po-Chung Cheng
IPC分类号： H01S3/104 , H01S3/00 , H01S3/04 , H01S3/041 , H01S3/10 , H01S3/1123 , H01S3/223 , H01S3/23 , H05G2/00
CPC分类号： H01S3/104 , H01S3/1001 , H01S3/2316 , H05G2/008 , H01S3/005 , H01S3/0407 , H01S3/041 , H01S3/10038 , H01S3/10069 , H01S3/1123 , H01S3/2232
摘要： The present disclosure provides a method for aligning a master oscillator power amplifier (MOPA) system. The method includes ramping up a pumping power input into a laser amplifier chain of the MOPA system until the pumping power input reaches an operational pumping power input level; adjusting a seed laser power output of a seed laser of the MOPA system until the seed laser power output is at a first level below an operational seed laser power output level; and performing a first optical alignment process to the MOPA system while the pumping power input is at the operational pumping power input level, the seed laser power output is at the first level, and the MOPA system reaches a steady operational thermal state.
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公开(公告)号：US11997778B2
公开(公告)日：2024-05-28
申请号：US18064156
申请日：2022-12-09
发明人： Shih-Yu Tu , Han-Lung Chang , Hsiao-Lun Chang , Li-Jui Chen , Po-Chung Cheng
IPC分类号： H05G2/00
摘要： A method includes following steps. A photoresist-coated substrate is received to an extreme ultraviolet (EUV) tool. An EUV radiation is directed from a radiation source onto the photoresist-coated substrate, wherein the EUV radiation is generated by an excitation laser hitting a plurality of target droplets ejected from a first droplet generator. The first droplet generator is replaced with a second droplet generator at a temperature not lower than about 150° C.
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公开(公告)号：US20230208092A1
公开(公告)日：2023-06-29
申请号：US18171609
申请日：2023-02-20
发明人： Chun-Lin Louis Chang , Henry Tong Yee Shian , Alan Tu , Han-Lung Chang , Tzung-Chi Fu , Bo-Tsun Liu , Li-Jui Chen , Po-Chung Cheng
CPC分类号： H01S3/1001 , H05G2/008 , H01S3/104 , H01S3/2316 , H01S3/0407
摘要： The present disclosure provides a method for aligning a master oscillator power amplifier (MOPA) system. The method includes ramping up a pumping power input into a laser amplifier chain of the MOPA system until the pumping power input reaches an operational pumping power input level; adjusting a seed laser power output of a seed laser of the MOPA system until the seed laser power output is at a first level below an operational seed laser power output level; and performing a first optical alignment process to the MOPA system while the pumping power input is at the operational pumping power input level, the seed laser power output is at the first level, and the MOPA system reaches a steady operational thermal state.
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公开(公告)号：US11134558B2
公开(公告)日：2021-09-28
申请号：US16508596
申请日：2019-07-11
发明人： Shih-Yu Tu , Yu-Kuang Sun , Shao-Hua Wang , Han-Lung Chang , Hsiao-Lun Chang , Li-Jui Chen , Po-Chung Cheng , Cheng-Hao Lai , Hsin-Feng Chen , Wei-Shin Cheng , Ming-Hsun Tsai , Yen-Hsun Chen
IPC分类号： H05G2/00
摘要： A droplet generator assembly includes a storage tank, a refill system, a droplet generator, and a temperature control system. The storage tank is configured to store a target material. The refill system is connected to the storage tank. The droplet generator includes a reservoir and a nozzle connected to the reservoir, in which the droplet generator is connected to the refill system, and the refill system is configured to deliver the target material to the reservoir. The temperature control system is adjacent to the refill system or the reservoir.
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公开(公告)号：US11032897B2
公开(公告)日：2021-06-08
申请号：US16548731
申请日：2019-08-22
发明人： Shih-Yu Tu , Han-Lung Chang , Hsiao-Lun Chang , Li-Jui Chen , Po-Chung Cheng
IPC分类号： H05G2/00
摘要： A method includes ejecting a metal droplet from a reservoir of a droplet generator toward a zone of excitation in front of a collector, emitting an excitation laser toward the zone of excitation, such that the metal droplet is heated by the excitation laser to generate extreme ultraviolet (EUV) radiation, halting the emission of the excitation laser, depressurizing the reservoir of the droplet generator, cooling down the droplet generator to a temperature not lower than about 150° C., and refilling the reservoir of the droplet generator with a solid metal material at the temperature not lower than about 150° C.
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6.发明授权公开(公告)号：US11340531B2
公开(公告)日：2022-05-24
申请号：US16926489
申请日：2020-07-10
发明人： Ting-Ya Cheng , Han-Lung Chang , Shi-Han Shann , Li-Jui Chen , Yen-Shuo Su
摘要： A method of controlling an extreme ultraviolet (EUV) lithography system is disclosed. The method includes irradiating a target droplet with EUV radiation, detecting EUV radiation reflected by the target droplet, determining aberration of the detected EUV radiation, determining a Zernike polynomial corresponding to the aberration, and performing a corrective action to reduce a shift in Zernike coefficients of the Zernike polynomial.
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公开(公告)号：US11086225B2
公开(公告)日：2021-08-10
申请号：US16887245
申请日：2020-05-29
发明人： Wei-Shin Cheng , Hsin-Feng Chen , Cheng-Hao Lai , Shao-Hua Wang , Han-Lung Chang , Li-Jui Chen , Po-Chung Cheng
摘要： A method includes providing a plurality of fuel droplets into an EUV source vessel by a fuel droplet generator, in which the fuel droplet generator has a first portion inside the EUV source vessel and a second portion outside the EUV source vessel; generating a plurality of output signals respectively from a plurality of oscillation sensors on the fuel droplet generator; determining whether the output signals are acceptable; and determining whether an unwanted oscillation originates from the first portion of the fuel droplet generator or the second portion of the fuel droplet generator when the output signals is determined as unacceptable.
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公开(公告)号：US20210235572A1
公开(公告)日：2021-07-29
申请号：US17228157
申请日：2021-04-12
发明人： Chun-Lin Louis Chang , Jen-Hao Yeh , Han-Lung Chang , Tzung-Chi Fu , Bo-Tsun Liu , Li-Jui Chen , Po-Chung Cheng
摘要： A system includes a laser source operable to provide a laser beam, a laser amplifier having a gain medium operable to provide energy to the laser beam when the laser beam passes through the laser amplifier, and a residual gain monitor operable to provide a probe beam and operable to derive a residual gain of the laser amplifier from the probe beam when the probe beam passes through the laser amplifier while being offset from the laser beam in time or in path.
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9.发明授权公开(公告)号：US11067906B2
公开(公告)日：2021-07-20
申请号：US16805836
申请日：2020-03-02
发明人： Shih-Yu Tu , Po-Chung Cheng , Hsiao-Lun Chang , Li-Jui Chen , Han-Lung Chang
摘要： A droplet catcher system of an EUV lithography apparatus is provided. The droplet catcher system includes a catcher body, a heat transfer part, a heat exchanger, and a controller. The catcher body has an outer surface. The heat transfer part is directly attached to the outer surface of the catcher body. The heat exchanger is thermally coupled to the heat transfer part. The controller is electrically coupled to the heat exchanger.
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公开(公告)号：US10509324B2
公开(公告)日：2019-12-17
申请号：US16449645
申请日：2019-06-24
发明人： Hsin-Feng Chen , Han-Lung Chang , Li-Jui Chen , Bo-Tsun Liu
摘要： A method for generating a radiation light in a lithography exposure system is provided. The method includes connecting a first nozzle assembly coupled to a support to an outlet of a storage member that receives a target fuel inside. The method further includes guiding the target fuel flowing through the first nozzle assembly and supplying a droplet of the target fuel into an excitation zone via the first nozzle assembly. The method also includes moving the support to connect a second nozzle assembly coupled to the support with the outlet. In addition, the method includes guiding the target fuel flowing through the second nozzle assembly and supplying a droplet of the target fuel into the excitation zone via the second nozzle assembly. The method further includes irradiating the droplet of the target fuel in the excitation zone with a laser pulse.
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