Abstract:
Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to 193-nm incident light.
Abstract:
A server for providing selected content to networked display devices is presented. The server includes a memory configured to store instructions. At least one processor is configured to execute the instructions to: receive television programming data and automatic content recognition data from a networked display device, and selectively link the networked display device to a viewing group based on the television programming data and automatic content recognition data. An advertisement engine is configured to provide an advertisement to the networked display device. The advertisement is selected based on the viewing group linked to the networked display device.
Abstract:
In a method of forming a pattern, a lower coating layer and a photoresist layer are sequentially formed on an object layer. An exposure process may be performed such that the photoresist layer is divided into an exposed portion and a non-exposed portion. A portion of the lower coating layer overlapping or contacting the exposed portion is at least partially transformed into a polarity conversion portion that has a polarity substantially identical to that of the exposed portion. The non-exposed portion of the photoresist layer is selectively removed.
Abstract:
There is provided a patterning process that forms a negative pattern by developing using an organic solvent, using a resist top coat composition that not only reduces the effect from the environment on a resist film and effectively blocks OOB light, but also reduces the film loss of a resist pattern and the bridging between patterns, enhances the sensitivity of the resist film, and suppresses the emission of an outgas from the resist film. The patterning process includes the steps of forming a resist top coat on a photoresist film formed on a substrate, with the resist top coat using as a top base material a polymer having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group, in which m is 1 or 2, and p is 0
Abstract:
A resist top coat composition includes a polymer including a base resin having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group and a repeating unit q of acenaphthylene having chemical formula 1. R is hydrogen, hydroxyl. R1 is hydrogen, hydroxyl, linear or branched C1-C10-alkyl, cycloalkyl, acyloxy, alkoxycarbonyl, carboxyl, —OC(═O)R2. R2 is linear or branched C1-C10-alkyl, cycloalkyl or fluorinated alkyl. m is 1 or 2. p and q are positive numbers satisfying the expressions 0
Abstract:
A semiconductor device includes a plurality of channels, source/drain layers, and a gate structure. The channels are sequentially stacked on a substrate and are spaced apart from each other in a first direction perpendicular to a top surface of the substrate. The source/drain layers are connected to the channels and are at opposite sides of the channels in a second direction parallel to the top surface of the substrate. The gate structure encloses the channels. The channels have different lengths in the second direction and different thicknesses in the first direction.
Abstract:
According to various example embodiments, a method for sharing a content group of an electronic device may include transmitting, to a server, information for a request to share a content group; receiving an input selecting at least one contact with which the content group is to be shared; transmitting information on the at least one contact to the server; and changing the content group to a shared state when information on the acceptance of sharing the content group from at least one external electronic device corresponding to the at least one contact is received from the server, wherein the content group is capable of being updated by the electronic device or the at least one external electronic device.
Abstract:
A server for providing selected content to networked display devices is presented. The server includes a memory configured to store instructions. At least one processor is configured to execute the instructions to: receive television programming data and automatic content recognition data from a networked display device, and selectively link the networked display device to a viewing group based on the television programming data and automatic content recognition data. An advertisement engine is configured to provide an advertisement to the networked display device. The advertisement is selected based on the viewing group linked to the networked display device.
Abstract:
A lithography apparatus and a method of using the same, the apparatus including a stage for accommodating a substrate that has a photoresist film thereon; a main unit on the stage, the main unit being configured to irradiate a projection beam to the photoresist film; and an electric field unit adjacent to the stage, the electric field unit being configured to apply an electric field to the photoresist film, wherein the electric field unit is configured to be turned on at a same time as or before irradiation of the projection beam, and is configured to be turned off at a same time as or after termination of the projection beam.
Abstract:
An electronic device implements a method of searching for a location of a multimedia application of an electronic device. The method includes displaying a location search bar to search for a playback location of the multiple application, detecting a drag in a direction orthogonal to the location search bar, and displaying the location search bar corresponding to a duration in which the drag is detected in a full duration of the location search bar by changing a shape of the location search bar.