Patterning process
    14.
    发明授权
    Patterning process 有权
    图案化过程

    公开(公告)号:US09568821B2

    公开(公告)日:2017-02-14

    申请号:US14622306

    申请日:2015-02-13

    CPC classification number: G03F7/0046 G03F7/095 G03F7/2002 G03F7/325

    Abstract: There is provided a patterning process that forms a negative pattern by developing using an organic solvent, using a resist top coat composition that not only reduces the effect from the environment on a resist film and effectively blocks OOB light, but also reduces the film loss of a resist pattern and the bridging between patterns, enhances the sensitivity of the resist film, and suppresses the emission of an outgas from the resist film. The patterning process includes the steps of forming a resist top coat on a photoresist film formed on a substrate, with the resist top coat using as a top base material a polymer having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group, in which m is 1 or 2, and p is 0

    Abstract translation: 提供通过使用有机溶剂显影形成负图案的图案化工艺,使用抗蚀剂面漆组合物,其不仅降低了抗蚀剂膜上的环境的影响并且有效地阻挡OOB光,而且还降低了膜损失 抗蚀剂图案和图案之间的桥接,增强了抗蚀剂膜的灵敏度,并且抑制了从抗蚀剂膜发出的气体。 图案化工艺包括以下步骤:在形成在基底上的光致抗蚀剂膜上形成抗蚀剂外涂层,其中抗蚀剂外涂层使用作为顶部基材的具有苯乙烯重复单元p的聚合物,其具有1,1,1,3 3,3-六氟-2-丙醇基,其中m为1或2,p为0

    Lithography apparatus having effective thermal electron enhancement unit and method of forming pattern using the same
    19.
    发明授权
    Lithography apparatus having effective thermal electron enhancement unit and method of forming pattern using the same 有权
    具有有效的热电子增强单元的平版印刷设备和使用其形成图案的方法

    公开(公告)号:US09482953B2

    公开(公告)日:2016-11-01

    申请号:US14177278

    申请日:2014-02-11

    CPC classification number: G03F7/2022 G03F7/0002

    Abstract: A lithography apparatus and a method of using the same, the apparatus including a stage for accommodating a substrate that has a photoresist film thereon; a main unit on the stage, the main unit being configured to irradiate a projection beam to the photoresist film; and an electric field unit adjacent to the stage, the electric field unit being configured to apply an electric field to the photoresist film, wherein the electric field unit is configured to be turned on at a same time as or before irradiation of the projection beam, and is configured to be turned off at a same time as or after termination of the projection beam.

    Abstract translation: 一种光刻设备及其使用方法,该设备包括:用于容纳其上具有光致抗蚀剂膜的基板的台; 主体单元,被配置为向光致抗蚀剂膜照射投影光束; 以及与所述载物台相邻的电场单元,所述电场单元被配置为向所述光致抗蚀剂膜施加电场,其中所述电场单元被配置为在所述投影束的照射之前或之前被接通, 并且被配置为在投影光束的终止之后的同时或者在其终止之后被关闭。

    METHOD OF SEARCHING FOR PLAYBACK LOCATION OF MULTIMEDIA APPLICATION AND ELECTRONIC DEVICE THEREOF
    20.
    发明申请
    METHOD OF SEARCHING FOR PLAYBACK LOCATION OF MULTIMEDIA APPLICATION AND ELECTRONIC DEVICE THEREOF 审中-公开
    搜索多媒体应用程序的播放位置的方法及其电子设备

    公开(公告)号:US20140052746A1

    公开(公告)日:2014-02-20

    申请号:US13966078

    申请日:2013-08-13

    CPC classification number: G06F16/43 G06F3/0485 G11B27/105 G11B27/34

    Abstract: An electronic device implements a method of searching for a location of a multimedia application of an electronic device. The method includes displaying a location search bar to search for a playback location of the multiple application, detecting a drag in a direction orthogonal to the location search bar, and displaying the location search bar corresponding to a duration in which the drag is detected in a full duration of the location search bar by changing a shape of the location search bar.

    Abstract translation: 电子设备实现了搜索电子设备的多媒体应用的位置的方法。 所述方法包括显示位置搜索条以搜索所述多个应用的​​播放位置,检测与所述位置搜索条正交的方向上的拖动,以及显示与在所述多个应用中检测到所述拖动的持续时间相对应的位置搜索条 通过更改位置搜索栏的形状,定位搜索栏的完整持续时间。

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