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公开(公告)号:US20170275778A1
公开(公告)日:2017-09-28
申请号:US15429164
申请日:2017-02-10
Inventor: ISAO TASHIRO , HIDENAO KATAOKA , YOSHIO OKAYAMA , NOBUYUKI YOKOYAMA , YOSHIFUMI TAKASU
CPC classification number: C30B29/22 , C01F17/0025
Abstract: A RAMO4 substrate containing an RAMO4 base material part containing a single crystal represented by the general formula RAMO4 (wherein R represents one or a plurality of trivalent elements selected from a group of elements including: Sc, In, Y, and a lanthanoid element, A represents one or a plurality of trivalent elements selected from a group of elements including: Fe(III), Ga, and Al, and M represents one or a plurality of divalent elements selected from a group of elements including: Mg, Mn, Fe(II), Co, Cu, Zn, and Cd), the RAMO4 base material part having a beveled portion at an edge portion thereof.
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公开(公告)号:US20170260648A1
公开(公告)日:2017-09-14
申请号:US15411792
申请日:2017-01-20
Inventor: YOSHIO OKAYAMA , MASAKI NOBUOKA
CPC classification number: C30B19/12 , C30B19/02 , C30B19/062 , C30B29/403
Abstract: A method for producing a Group III nitride crystal includes: preparing a protective layer on a region except for an epitaxial growth surface of an RAMO4 substrate containing a single crystal represented by the general formula RAMO4 (wherein R represents one or a plurality of a trivaient element selected from a group of elements including: Sc, In, Y, and a lanthanoid element, A represents one or a plurality of a trivalent element selected from a group of elements including: Fe(III), Ga, and Al, and M represents one or a plurality of a divalent element selected from a group of elements including: Mg, Mn, Fe(II), Co, Cu, Zn, and Cd); and forming a Group III nitride crystal on the epitaxial growth surface of the RAMO4 substrate by a flux method.
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公开(公告)号:US20170239773A1
公开(公告)日:2017-08-24
申请号:US15424244
申请日:2017-02-03
Inventor: YOSHIFUMI TAKASU , YOSHIO OKAYAMA , AKIHIKO ISHIBASHI , ISAO TASHIRO , AKIO UETA , MASAKI NOBUOKA , NAOYA RYOKI
Abstract: A RAMO4 substrate includes a single crystal represented by a formula of RAMO4 (in the formula, R indicates one or a plurality of trivalent elements selected from a group consisting of Sc, In, Y, and a lanthanoid element, A indicates one or a plurality of trivalent elements selected from a group consisting of Fe(III), Ga, and Al, and M indicates one or a plurality of bivalent elements selected from a group consisting of Mg, Mn, Fe(II), Co, Cu, Zn, and Cd). An epitaxially-grown surface is provided on one surface of the RAMO4 substrate, a satin-finish surface is provided on another surface. The satin-finish surface has surface roughness which is larger than that of the epitaxially-grown surface.
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