Abstract:
An imaging sensor system includes a single photon avalanche diode (SPAD) imaging array including N pixels formed in a first semiconductor layer of a first wafer. Substantially an entire thickness of the first semiconductor layer of each pixel is fully depleted such that a multiplication region included in each pixel near a front side is configured to be illuminated with photons through a back side and through the substantially entire thickness of the fully depleted first semiconductor layer. Deep n type isolation regions are disposed in the first semiconductor layer between the pixels to isolate the pixels. N digital counters are formed in a second semiconductor layer of a second wafer that is bonded to the first wafer. Each of the N digital counters is coupled to the SPAD imaging array and coupled to count output pulses generated by a respective one of the pixels.
Abstract:
A photomultiplier pixel cell includes a photon detector coupled to detect an incident photon. A quenching circuit is coupled to quench an avalanche current in the photon detector. An enable circuit is coupled to the photon detector to enable and disable the photon detector in response to an enable signal. A buffer circuit is coupled to the photon detector to generate a digital output signal having a pulse width interval in response to the avalanche current triggered in the photon detector. A first one of a plurality of inputs of a digital-to-analog converter is coupled to the buffer circuit to receive a digital output signal. The digital-to-analog converter is coupled to generate an analog output signal having a magnitude that is responsive to a total number of digital output signals received concurrently within the pulse width interval at each one of the plurality of inputs of the digital-to-analog converter.
Abstract:
A time-of-flight (TOF) sensor includes a light source structured to emit light and a plurality of avalanche photodiodes. The TOF sensor also includes a plurality of pulse generators, where individual pulse generators are coupled to individual avalanche photodiodes in the plurality of avalanche photodiodes. Control circuitry is coupled to the light source, the plurality of avalanche photodiodes, and the plurality of pulse generators, to perform operations. Operations may include emitting the light from the light source, and receiving the light reflected from an object with the plurality of avalanche photodiodes. In response to receiving the light with the plurality of avalanche photodiodes, a plurality of pulses may be output from the individual pulse generators corresponding to the individual photodiodes that received the light. And, in response to outputting the plurality of pulses, a timing signal may be output when the plurality of pulses overlap temporally.
Abstract:
Image sensors with precharge boost are disclosed herein. An example image sensor may include pixels that each include a photodiode to receive image light and produce image charge in response, a floating diffusion to receive the image charge, a transfer gate to couple the photodiode to the floating diffusion in response to a transfer control signal, a reset gate to couple a reset voltage to the floating diffusion in response to a reset control signal, and a boost capacitor coupled between the floating diffusion and a boost voltage source, wherein, during a precharge operation, the boost voltage is provided to the boost capacitor for a portion of time the transfer gate is enabled and while the reset gate is disabled.
Abstract:
Image sensors with precharge boost are disclosed herein. An example image sensor may include pixels that each include a photodiode to receive image light and produce image charge in response, a floating diffusion to receive the image charge, a transfer gate to couple the photodiode to the floating diffusion in response to a transfer control signal, a reset gate to couple a reset voltage to the floating diffusion in response to a reset control signal, and a boost capacitor coupled between the floating diffusion and a boost voltage source, wherein, during a precharge operation, the boost voltage is provided to the boost capacitor for a portion of time the transfer gate is enabled and while the reset gate is disabled.
Abstract:
An imaging sensor system includes a pixel array having a plurality of pixel cells disposed in a first semiconductor layer, where each one of the plurality of pixel cells has a single photon avalanche diode (SPAD) disposed proximate to a front side of a first semiconductor layer. Each of the plurality of pixel cells includes a guard ring disposed in the first semiconductor layer in a guard ring region proximate to the SPAD, and also includes a guard ring region reflecting structure disposed in the guard ring region proximate to the guard ring and proximate to the front side of the first semiconductor layer. The imaging sensor system also includes control circuitry coupled to the pixel array to control operation of the pixel array, and readout circuitry coupled to the pixel array to readout image data from the plurality of pixel cells.
Abstract:
An image sensor includes a pixel array having plurality of pixel cells arranged into a plurality of rows and a plurality of columns of pixel cells in a first semiconductor die. A plurality of pixel support circuits are arranged in a second semiconductor die that is stacked and coupled together with the first semiconductor die. A plurality of interconnect lines are coupled between the first and second semiconductor dies, and each one of the plurality of pixel cells is coupled to a corresponding one of the plurality of pixel support circuits through a corresponding one plurality of interconnect lines. A plurality of shield bumps are disposed proximate to corners of the pixel cells in the pixel array and between the first and second semiconductor dies such that each one of the plurality of shield bumps is disposed between adjacent interconnect lines along a diagonal of the pixel array.
Abstract:
A method of image sensor fabrication includes forming a second semiconductor layer on a back side of a first semiconductor layer. The method also includes forming one or more groups of pixels disposed in a front side of the first semiconductor layer. The one or more groups of pixels include a first portion of pixels separated from the second semiconductor layer by a spacer region, and a second portion of pixels, where a first doped region of the second portion of pixels is in contact with the second semiconductor layer. Pinning wells are also formed and separate individual pixels in the one or more groups of pixels, and the pinning wells extend through the first semiconductor layer. Deep pinning wells are also formed and separate the one or more groups of pixels.
Abstract:
A method of fabricating an avalanche photodiode pixel includes growing a second doped semiconductor layer on a first doped semiconductor layer having a first doping concentration. The second doped semiconductor layer is grown with a second doping concentration and is of an opposite majority charge carrier type as the first doped semiconductor layer. A doped contact region having a third doping concentration is formed in the second doped semiconductor layer between the doped contact region and the first doped semiconductor layer. The doped contact region is of a same majority charge carrier type as the second doped semiconductor layer. The third doping concentration is greater than the second doping concentration. A guard ring region is formed in the second doped semiconductor layer, is of an opposite majority charge carrier type as the second doped semiconductor layer, and extends through the second doped semiconductor layer surrounding the doped contact region.
Abstract:
A photon detection device includes a first wafer having an array of photon detection cells partitioned into a plurality of photon detection blocks arranged in the first wafer. A second wafer having a plurality of block readout circuits arranged thereon is also included. An interconnect wafer is disposed between the first wafer and the second wafer. The interconnect wafer includes a plurality of conductors having substantially equal lengths. Each one of the plurality of conductors is coupled between a corresponding one of the plurality of photon detection blocks in the first wafer and a corresponding one of the plurality of block readout circuits such that signal propagation delays between each one of the plurality of photon detection blocks and each one of the plurality of block readout circuits are substantially equal.