公开(公告)号：US20150270101A1

公开(公告)日：2015-09-24

申请号：US14657613

申请日：2015-03-13

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Osamu IIZUKA

IPC: H01J37/304 ,  H01J37/305 ,  H01J37/20 ,  G21K5/02

CPC classification number: H01J37/3174 ,  H01J2237/30455 ,  H01J2237/30483 ,  H01J2237/31776 ,  H01J2237/31793

Abstract: A writing apparatus includes a writing unit to include a deflector for deflecting a charged particle beam and write a pattern on a target object by the charged particle beam, a decision unit to decide a representative position of a deflection result range in which the charged particle beam was deflected with respect to a writing direction by the deflector, and a correction unit to correct drift of the charged particle beam by using a drift amount at the representative position of the deflection result range.

Abstract translation: 一种写入装置，包括一个写入单元，包括用于偏转带电粒子束的偏转器，并通过带电粒子束将图案写入目标物体;决定单元，用于决定偏转结果范围的代表位置，其中带电粒子束 相对于偏转器的写入方向偏转，以及校正单元，通过使用偏转结果范围的代表性位置处的漂移量来校正带电粒子束的漂移。

公开(公告)号：US20250054727A1

公开(公告)日：2025-02-13

申请号：US18760092

申请日：2024-07-01

Applicant: NuFlare Technology, Inc.

Inventor： Tsubasa NANAO ,  Osamu IIZUKA

IPC: H01J37/304 ,  H01J37/147 ,  H01J37/317

Abstract: In one embodiment, a beam position measurement method includes scanning a mark with a charged particle beam in each of conditions, the mark being provided on a stage on which a substrate is placed, and measuring a beam irradiation position based on electrons reflected from the mark, scanning the mark in a reference condition, measuring a beam irradiation position based on electrons reflected from the mark, and calculating a drift amount based on an obtained result of measurement of the beam irradiation position in the reference condition, and correcting the beam irradiation position measured in each of the conditions, using the drift amount.

公开(公告)号：US20200328060A1

公开(公告)日：2020-10-15

申请号：US16825035

申请日：2020-03-20

Applicant: NuFlare Technology, Inc.

Inventor： Osamu IIZUKA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/302 ,  H01J37/24 ,  H01J37/147

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes a measurement unit measuring a first beam shape of a multi-beam based on a beam current of each beam of the multi-beam or an intensity of charged particles reflected from a reflection mark provided on a stage, an amounts of adjustment calculator calculating amounts of adjustment of a reduction ratio and a rotation angle of the multi-beam based on the first beam shape, a correction map generation unit generating a first correction map in which an amount of displacement is defined that is obtained for each beam of the multi-beam based on a difference between a beam shape based on the amounts of adjustment and the first beam shape, a writing data processor generating shot data in which an amount of irradiation with each beam of the multi-beam is defined by converting writing data in which information regarding a graphic pattern to be written is defined, and correcting the amount of irradiation with each beam defined in the shot data based on the first correction map, and a controller controlling the reduction ratio and rotation angle of the multi-beam based on the amounts of adjustment.

公开(公告)号：US20190035603A1

公开(公告)日：2019-01-31

申请号：US16042380

申请日：2018-07-23

Applicant: NuFlare Technology, Inc.

Inventor： Osamu IIZUKA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/20

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes a plurality of reflective marks disposed on a stage, an inspection aperture member configured to allow one beam to pass therethrough, a first detector detecting a beam current of a beam passed through the inspection aperture member, a second detector detecting charged particles reflected from the reflective marks, a first beam shape calculator generating a beam image based on the beam currents detected by the first detector and calculating a reference beam shape, and a second beam shape calculator calculating a beam shape based on changes in intensity of the reflected charged particles and a position of the stage. The reference beam shape is calculated before writing. During writing, the beam shape based on reflected charged particles is calculated, and variation of the beam shape is added to the reference beam shape.

公开(公告)号：US20170169993A1

公开(公告)日：2017-06-15

申请号：US15354186

申请日：2016-11-17

Applicant: NuFlare Technology, Inc.

Inventor： Osamu IIZUKA

IPC: H01J37/30 ,  H01J37/20 ,  H01J37/244 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/3005 ,  H01J37/045 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/2448 ,  H01J2237/30433

Abstract: A multi charged particle beam apparatus includes a forming aperture array substrate, where there are formed a plurality of first openings and a plurality of second openings on the periphery of the whole plurality of first openings, each being larger than each of the plurality of first openings, to form multi-beams by the plurality of first openings, and to be able to form a plurality of calibration beams by the plurality of second openings, a shutter to select, one by one, one of the plurality of calibration beams formed by passing through the plurality of second openings, in accordance with a slide position, and a detector to detect a secondary electron including a reflected electron generated by scanning a mark by deflecting the selected calibration beam, in the state of all the multi-beams controlled to be OFF.