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公开(公告)号：US09080971B2
公开(公告)日：2015-07-14
申请号：US14516540
申请日：2014-10-16
Applicant: KLA-Tencor Corporation
Inventor： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
CPC classification number: G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
Abstract translation: 提供了各种计量系统和方法。 一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到 在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。 测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。 此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。
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公开(公告)号：US20190107727A1
公开(公告)日：2019-04-11
申请号：US16138092
申请日：2018-09-21
Applicant: KLA-Tencor Corporation
Inventor： Dmitry Gorelik , Andrew V. Hill , Ohad Bachar , Amnon Manassen , Daria Negri
Abstract: A beamsplitter includes a substrate formed from a material transparent to wavelengths of light at least above a selected cutoff wavelength and reflective structures distributed across a surface of the substrate. The reflective structures split incident light having wavelengths above the selected cutoff wavelength into a reflected beam formed from portions of the incident light reflected from the reflective structures and a transmitted beam formed from portions of the incident light transmitted through the substrate. A splitting ratio of a power of the reflected beam to a power of the transmitted beam is based on a ratio of surface area of the reflective surfaces to an area of the incident light on the substrate. Separation distances between neighboring reflective structures are smaller than the cutoff wavelength such that diffracted power of the incident light having wavelengths above the selected cutoff wavelength is maintained below a selected tolerance.
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公开(公告)号：US09341769B2
公开(公告)日：2016-05-17
申请号：US13945352
申请日：2013-07-18
Applicant: KLA-Tencor Corporation
Inventor： Amnon Manassen , Andrew V. Hill , Ohad Bachar , Avi Abramov , Daria Negri
CPC classification number: G01B11/02 , F21V5/02 , F21V5/04 , F21V9/40 , F21V14/08 , G01N21/55 , G02B5/18 , G02B5/205 , G02B6/0005 , G02B6/02 , G02B6/3512 , G02B6/4215 , G02B26/008 , G02B26/023 , G02B26/04 , G02B26/0816 , G02B27/1026 , G02B27/141 , G02B27/146
Abstract: The disclosure is directed to a system and method of controlling spectral attributes of illumination. According to various embodiments, a portion of illumination including an excluded selection of illumination spectra is blocked, while another portion of the illumination including a transmitted selection of illumination spectra is directed along an illumination path. In some embodiments, optical metrology is performed utilizing the spectrally controlled illumination to enhance measurement capability. For instance, the spectral attributes of illumination utilized to analyze different portions of a sample, such as different semiconductor layers, may be selected according to certain measurement characteristics associated with the analyzed portions of the sample.
Abstract translation: 本公开涉及一种控制照明的光谱属性的系统和方法。 根据各种实施例，包括排除的照明光谱选择的照明部分被阻挡，而包括发射的照明光谱选择的照明的另一部分沿着照明路径被引导。 在一些实施例中，利用光谱控制的照明来执行光学测量以增强测量能力。 例如，可以根据与样本的分析部分相关联的某些测量特性来选择用于分析样本的不同部分（例如不同半导体层）的照明的光谱属性。
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14.发明申请METROLOGY IMAGING TARGETS HAVING REFLECTION-SYMMETRIC PAIRS OF REFLECTION-ASYMMETRIC STRUCTURES 审中-公开具有反射 - 非对称结构的反射对称对称的计量成像目标公开(公告)号：US20160084758A1
公开(公告)日：2016-03-24
申请号：US14928514
申请日：2015-10-30
Applicant: KLA-Tencor Corporation
Inventor： Amnon Manassen , Yuri Paskover , Barry Loevsky , Daria Negri
CPC classification number: G01N21/4785 , G03F7/70683 , G06F17/5072
Abstract: Metrology targets, design files, and design and production methods thereof are provided. Metrology targets comprising at least one reflection-symmetric pair of reflection-asymmetric structures are disclosed. The structures may or may not be periodic, may comprise a plurality of unevenly-spaced target elements, which may or may not be segmented. The asymmetry may be with respect to target element segmentation or structural dimensions. Also, target design files and metrology measurements of the various metrology targets are disclosed.
Abstract translation: 提供了计量目标，设计文件及其设计和制作方法。 公开了包括至少一个反射对称对的反射不对称结构的计量目标。 结构可以是或可以不是周期性的，可以包括多个不均匀间隔的目标元件，其可以被分割或者不被分割。 不对称性可能与目标元素分割或结构尺寸有关。 此外，还公开了各种度量目标的目标设计文件和度量测量。
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Patent Agency Ranking
公开(公告)号：US20150036142A1
公开(公告)日：2015-02-05
申请号：US14516540
申请日：2014-10-16
Applicant: KLA-Tencor Corporation
Inventor： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC: G01N21/47 , G01N21/956 , G01N21/95 , G01B11/02
CPC classification number: G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
Abstract translation: 提供了各种计量系统和方法。 一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到 在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。 测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。 此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。
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公开(公告)号：US11852590B1
公开(公告)日：2023-12-26
申请号：US16552107
申请日：2019-08-27
Applicant: KLA-Tencor Corporation
Inventor： Amnon Manassen , Daria Negri , Andrew V. Hill , Ohad Bachar , Vladimir Levinski , Yuri Paskover
CPC classification number: G01N21/8806 , G01B11/272 , G01N21/33 , G01N21/3563 , G01N21/8422 , G01N21/9505 , G01B2210/56 , G01N2021/8438 , G01N2201/06113
Abstract: A metrology system may include an imaging sub-system including one or more lenses and a detector to image a sample, where the sample includes metrology target elements on two or more sample layers. The metrology system may further include a controller to determine layer-specific imaging configurations of the imaging sub-system to image the metrology target elements on the two or more sample layers within a selected image quality tolerance, where each layer-specific imaging configuration includes a selected configuration of one or more components of the imaging sub-system. The controller may further receive, from the imaging sub-system, one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller may further provide a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers.
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公开(公告)号：US10976562B2
公开(公告)日：2021-04-13
申请号：US16138092
申请日：2018-09-21
Applicant: KLA-Tencor Corporation
Inventor： Dmitry Gorelik , Andrew V. Hill , Ohad Bachar , Amnon Manassen , Daria Negri
Abstract: A beamsplitter includes a substrate formed from a material transparent to wavelengths of light at least above a selected cutoff wavelength and reflective structures distributed across a surface of the substrate. The reflective structures split incident light having wavelengths above the selected cutoff wavelength into a reflected beam formed from portions of the incident light reflected from the reflective structures and a transmitted beam formed from portions of the incident light transmitted through the substrate. A splitting ratio of a power of the reflected beam to a power of the transmitted beam is based on a ratio of surface area of the reflective surfaces to an area of the incident light on the substrate. Separation distances between neighboring reflective structures are smaller than the cutoff wavelength such that diffracted power of the incident light having wavelengths above the selected cutoff wavelength is maintained below a selected tolerance.
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公开(公告)号：US10444161B2
公开(公告)日：2019-10-15
申请号：US15608766
申请日：2017-05-30
Applicant: KLA-Tencor Corporation
Inventor： Amnon Manassen , Daria Negri , Andrew V. Hill , Ohad Bachar , Vladimir Levinski , Yuri Paskover
Abstract: A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumination device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers.
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公开(公告)号：US08873054B2
公开(公告)日：2014-10-28
申请号：US13865104
申请日：2013-04-17
Applicant: KLA-Tencor Corporation
Inventor： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC: G01J4/00 , G01B11/14 , G01B11/04 , G01B11/00 , G01N21/47 , G01B11/02 , G03F7/20 , G01B11/06 , G01N21/21 , G01N21/956
CPC classification number: G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
Abstract translation: 提供了各种计量系统和方法。 一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到 在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。 测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。 此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。
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