公开(公告)号：US10236159B2

公开(公告)日：2019-03-19

申请号：US15448308

申请日：2017-03-02

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Satoshi Tomimatsu ,  Makoto Sato ,  Atsushi Uemoto ,  Tatsuya Asahata ,  Yo Yamamoto

IPC: H01J37/20 ,  H01J37/302

Abstract: A charged particle beam includes: a computer that controls a needle actuating mechanism so as to approach a needle to a sample piece using a template formed from an absorbed current image obtained by irradiating the needle with a charged particle beam and a tip coordinate of the needle acquired from a secondary electron image obtained by irradiating the needle with the charged particle beam.

公开(公告)号：US09620333B2

公开(公告)日：2017-04-11

申请号：US14833563

申请日：2015-08-24

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Satoshi Tomimatsu ,  Makoto Sato ,  Atsushi Uemoto ,  Tatsuya Asahata ,  Yo Yamamoto

IPC: H01J37/26 ,  H01J37/302 ,  H01J37/20

CPC classification number: H01J37/3023 ,  H01J37/20 ,  H01J2237/208 ,  H01J2237/31745

Abstract: A charged particle beam apparatus automatically prepares a sample piece from a sample and includes a charged particle beam irradiation optical system that irradiates a charged particle beam to a sample placed on a movable sample stage. A sample piece transferring unit holds and transfers a sample piece separated and extracted from the sample, and a holder support holds a sample piece holder to which the sample piece is transferred. A computer controls a position of an object based on a template prepared from an image of the object acquired by irradition with the charged particle beam and position information acquired from the image of the object. The sample piece transferring unit includes a needle that transfers the sample piece separated and extrated from the sample, and a needle actuting mechanism that actuates the needle. The computer controls the needle actuating mechanism so as to approach the needle to the sample piece using the template formed from an absorbed current image acquired by irradiating the needle with the charged particle beam.

公开(公告)号：US09336987B2

公开(公告)日：2016-05-10

申请号：US14526172

申请日：2014-10-28

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Shota Torikawa ,  Tatsuya Asahata ,  Makoto Sato ,  Atsushi Uemoto

IPC: H01J37/304 ,  H01J37/317

CPC classification number: H01J37/3045 ,  H01J2237/30438 ,  H01J2237/3045 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: A charged particle beam apparatus including a column irradiating a sample with a charged particle beam, a detector detecting a secondary particle emitted from the sample, an image data generating section generating image data indicating two-dimensional distribution of an amount of the secondary particle detected by the detector, and a controller that respectively sets first and second position adjustment irradiation frames for first and second beam condition on a surface of the sample in the image data, form a first and second irradiation traces by respectively irradiating the first and second position adjustment irradiation frames with the charged particle beams of the first and second beam conditions, correct a position of the second processing irradiation frame, based on a position displacement amount between a predetermined position of the first irradiation trace and a predetermined position of the second irradiation trace.

Abstract translation: 一种带电粒子束装置，包括用带电粒子束照射样品的柱，检测从样品发射的二次粒子的检测器，图像数据生成部，生成表示由二次粒子的量的二维分布的二维分布的图像数据， 所述检测器和控制器分别在所述图像数据的样品的表面上分别设置用于第一和第二光束条件的第一和第二位置调整照射帧，通过分别照射所述第一和第二位置调整照射来形成第一和第二照射迹线 具有第一和第二光束条件的带电粒子束的帧，基于第一照射迹线的预定位置和第二照射迹线的预定位置之间的位置偏移量来校正第二处理照射帧的位置。

公开(公告)号：US11835438B2

公开(公告)日：2023-12-05

申请号：US17373932

申请日：2021-07-13

Applicant: Hitachi High-Tech Science Corporation

Inventor： Atsushi Uemoto ,  Tatsuya Asahata ,  Makoto Sato ,  Yo Yamamoto

IPC: G01N1/44 ,  G01N1/28 ,  H01J37/31 ,  H01J37/317

CPC classification number: G01N1/44 ,  G01N1/28 ,  H01J37/31 ,  H01J37/317

Abstract: An automatic sample preparation apparatus that automatically prepares a sample piece from a sample and includes a focused ion beam irradiation optical system, an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam, a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample, a detector configured to detect secondary charged particles emitted from an irradiation object, and a computer configured to recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and drive the sample piece transfer device, wherein the image data includes a reference mark.

公开(公告)号：US11094503B2

公开(公告)日：2021-08-17

申请号：US16790450

申请日：2020-02-13

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Masato Suzuki ,  Ikuko Nakatani ,  Satoshi Tomimatsu ,  Makoto Sato

IPC: H01J37/00 ,  H01J37/30

Abstract: Provided are a thin film sample creation method and a charged particle beam apparatus capable of preventing a thin film sample piece from being damaged. The method includes a process of processing a sample by irradiating a surface of the sample with a focused ion beam (FIB) from a second direction that crosses a normal line to the surface of the sample to create a thin film sample piece and a connection portion positioned at and connected to one side of the thin film sample piece, a process of rotating the sample around the normal line, a process of connecting the thin film sample piece to a needle for holding the thin film sample piece, and a process of separating the thin film sample piece from the sample by irradiating the connection portion with a focused ion beam from a third direction that crosses the normal line.

公开(公告)号：US10658147B2

公开(公告)日：2020-05-19

申请号：US15468290

申请日：2017-03-24

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Makoto Sato ,  Satoshi Tomimatsu ,  Atsushi Uemoto ,  Tatsuya Asahata

IPC: H01J37/02 ,  H01J37/20

Abstract: A charged particle beam apparatus which automatically prepares a sample piece from a sample, includes: a charged particle beam irradiation optical system configured to perform irradiation of a charged particle beam; a sample stage configured to move, the sample being placed on the sample stage; a sample piece relocation unit configured to hold and transport the sample piece which is separated and picked up from the sample; a holder fixing stage which holds a sample piece holder to which the sample piece is relocated; and a computer which performs positional control in relation to a target object based on a template and positional information which is obtained from an image of the target object, the template being generated based on an absorption current image of the target object which is acquired using the irradiation of the charged particle beam.

公开(公告)号：US20190157037A1

公开(公告)日：2019-05-23

申请号：US16192723

申请日：2018-11-15

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Satoshi TOMIMATSU ,  Tatsuya Asahata ,  Makoto Sato ,  Masato Suzuki

IPC: H01J37/28 ,  G02B27/09 ,  G01N23/225

Abstract: (Task) To repeatedly perform an operation of extracting a sample piece formed by processing a sample with an ion beam and of transferring the extracted sample piece to a sample piece holder.(Problem Solving Means) A charged particle beam apparatus includes a computer that sets a shaping processing region including a bottom portion of s ample piece in a thickness direction of the sample piece corresponding to a depth direction at the time of processing a sample after a needle holds the sample piece, and controls a focused ion beam irradiation optical system to irradiate the shaping processing region with a focused ion beam to thereby shape the sample piece.

公开(公告)号：US10088401B2

公开(公告)日：2018-10-02

申请号：US15317030

申请日：2015-06-29

Applicant: Hitachi High-Tech Science Corporation

Inventor： Atsushi Uemoto ,  Tatsuya Asahata ,  Makoto Sato ,  Yo Yamamoto

IPC: H01J37/31 ,  G01N1/44 ,  H01J37/317

Abstract: A charged particle beam device (10a) includes a computer (21) which controls multiple charged particle beam irradiation optical systems, the needle (18), and a gas supply portion (17) to transfer a sample piece Q to a predetermined position of the sample piece holder P, based on at least images of a sample piece holder (P), a needle (18), and the sample piece (Q) previously acquired by multiple charged particle beams.

公开(公告)号：US09741535B2

公开(公告)日：2017-08-22

申请号：US14859726

申请日：2015-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Shota Torikawa ,  Tatsuya Asahata ,  Atsushi Uemoto ,  Makoto Sato

IPC: H01J37/304

CPC classification number: H01J37/3045 ,  H01J2237/317

Abstract: A charged particle beam apparatus includes a stage for fixing a sample, a driving mechanism for driving the stage, a focused ion beam column, an electron beam column, a detector that detects a secondary charged particle emitted from the sample irradiated with a charged particle beam, a gas supplying device that supplies gas for forming a deposition film on a surface of the sample, and a control device that generates image data indicating the position distribution of the secondary charged particle detected by the detector. The control device irradiates the sample with the electron beam prior to irradiating the sample with a focused ion beam, recognizes an alignment mark provided in the sample in the image data by the electron beam, and performs positioning of an irradiation region of the sample using the alignment mark.

公开(公告)号：US09269539B2

公开(公告)日：2016-02-23

申请号：US14665410

申请日：2015-03-23

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya Asahata ,  Hidekazu Suzuki ,  Makoto Sato

IPC: H01J37/00 ,  H01J37/317 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/317 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/221 ,  H01J2237/2448 ,  H01J2237/30466 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A focused ion beam apparatus includes: a focused ion beam tube configured to irradiate a focused ion beam onto a sample; a detector configured to detect secondary particles generated from the sample due to the irradiation and to output detection information regarding detected secondary particles; an image forming unit configured to form an observation image of the sample based on the detection information; a storage unit configured to store positional relation between a first processing area set on an observation image of a first sample and a cross-section surface of the first sample; and a processing area setting unit configured to automatically set a second processing area on an observation image of a second sample based on the positional relation stored in the storage unit and a position of a cross-section surface of the second sample on the observation image of the second sample.

Abstract translation: 聚焦离子束装置包括：聚焦离子束管，被配置为将聚焦的离子束照射到样品上; 检测器，其被配置为检测由于所述照射而从所述样品产生的二次粒子，并输出关于检测到的二次粒子的检测信息; 图像形成单元，被配置为基于所述检测信息形成所述样本的观察图像; 存储单元，被配置为存储设置在第一样本的观察图像上的第一处理区域和第一样本的截面之间的位置关系; 以及处理区域设定单元，被配置为基于存储在存储单元中的位置关系和第二样本的横截表面的位置来自动设置第二样本的观察图像上的第二处理区域， 第二个样本。