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1.发明申请公开(公告)号：US20170278673A1
公开(公告)日：2017-09-28
申请号：US15468657
申请日：2017-03-24
IPC分类号： H01J37/302 , H01J37/317
CPC分类号： H01J37/3026 , H01J37/20 , H01J37/3045 , H01J37/3056 , H01J37/3171 , H01J2237/20207 , H01J2237/20214 , H01J2237/31745
摘要： There is provided a control device for controlling a charged particle beam apparatus, wherein the beam apparatus comprises a workpiece stage having at least two turning axes which are not parallel to each other and an irradiation unit, and the control device comprises an angle calculation unit that based on a direction of a first processing in which a processed surface having a normal line not parallel to any of the turning axes is generated in the workpiece by the irradiation unit and a direction of a second processing to be processed by the irradiation unit from a direction different from the direction of the first processing with respect to the processed surface to be generated by the first processing, calculates turning angles about the turning axes that changes the direction of the stage from the direction of the first processing to the direction of the second processing.
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公开(公告)号：US10832890B2
公开(公告)日：2020-11-10
申请号：US16364898
申请日：2019-03-26
发明人： Masato Suzuki , Satoshi Tomimatsu , Makoto Sato , Tatsuya Asahata
IPC分类号： H01J37/305 , H01J37/20
摘要： To automatically repeat an operation of isolating a sample piece, which is formed by processing a sample with an ion beam, and transferring the sample piece to a sample piece holder, a charged particle beam device includes a computer configured to perform control so that, without rotating a needle with which the sample piece is fixed to the sample piece holder, a deposition film deposited on the needle is irradiated with a charged particle beam from a charged particle beam irradiation optical system.
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公开(公告)号：US10692688B2
公开(公告)日：2020-06-23
申请号：US15871767
申请日：2018-01-15
发明人： Satoshi Tomimatsu , Makoto Sato , Masato Suzuki
摘要： A charged particle beam apparatus automatically prepares a sample piece from a sample. The apparatus includes a charged particle beam irradiation optical system that emits a charged particle beam. A sample stage with a sample placed thereon is movable relative to the charged particle beam irradiation optical system. A sample piece transferring device holds and transports a sample piece separated and extracted from the sample, and a holder fixing base holds a sample piece holder to which the sample piece is to be transferred. An electrical conduction sensor detects electrical conduction between the sample piece transferring device and an object, and a computer sets a time management mode when electrical conduction between the sample piece transferring device and the sample piece is not detected when the sample piece transferring device and the sample piece are connected to each other.
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公开(公告)号：US11094503B2
公开(公告)日：2021-08-17
申请号：US16790450
申请日：2020-02-13
发明人： Masato Suzuki , Ikuko Nakatani , Satoshi Tomimatsu , Makoto Sato
摘要： Provided are a thin film sample creation method and a charged particle beam apparatus capable of preventing a thin film sample piece from being damaged. The method includes a process of processing a sample by irradiating a surface of the sample with a focused ion beam (FIB) from a second direction that crosses a normal line to the surface of the sample to create a thin film sample piece and a connection portion positioned at and connected to one side of the thin film sample piece, a process of rotating the sample around the normal line, a process of connecting the thin film sample piece to a needle for holding the thin film sample piece, and a process of separating the thin film sample piece from the sample by irradiating the connection portion with a focused ion beam from a third direction that crosses the normal line.
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公开(公告)号：US10658147B2
公开(公告)日：2020-05-19
申请号：US15468290
申请日：2017-03-24
摘要： A charged particle beam apparatus which automatically prepares a sample piece from a sample, includes: a charged particle beam irradiation optical system configured to perform irradiation of a charged particle beam; a sample stage configured to move, the sample being placed on the sample stage; a sample piece relocation unit configured to hold and transport the sample piece which is separated and picked up from the sample; a holder fixing stage which holds a sample piece holder to which the sample piece is relocated; and a computer which performs positional control in relation to a target object based on a template and positional information which is obtained from an image of the target object, the template being generated based on an absorption current image of the target object which is acquired using the irradiation of the charged particle beam.
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6.发明授权公开(公告)号：US09934940B2
公开(公告)日：2018-04-03
申请号：US15468657
申请日：2017-03-24
IPC分类号： H01J37/00 , H01J37/302 , H01J37/317
CPC分类号： H01J37/3026 , H01J37/20 , H01J37/3045 , H01J37/3056 , H01J37/3171 , H01J2237/20207 , H01J2237/20214 , H01J2237/31745
摘要： There is provided a control device for controlling a charged particle beam apparatus, wherein the beam apparatus comprises a workpiece stage having at least two turning axes which are not parallel to each other and an irradiation unit, and the control device comprises an angle calculation unit that based on a direction of a first processing in which a processed surface having a normal line not parallel to any of the turning axes is generated in the workpiece by the irradiation unit and a direction of a second processing to be processed by the irradiation unit from a direction different from the direction of the first processing with respect to the processed surface to be generated by the first processing, calculates turning angles about the turning axes that changes the direction of the stage from the direction of the first processing to the direction of the second processing.
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公开(公告)号：US10236159B2
公开(公告)日：2019-03-19
申请号：US15448308
申请日：2017-03-02
发明人： Satoshi Tomimatsu , Makoto Sato , Atsushi Uemoto , Tatsuya Asahata , Yo Yamamoto
IPC分类号： H01J37/20 , H01J37/302
摘要： A charged particle beam includes: a computer that controls a needle actuating mechanism so as to approach a needle to a sample piece using a template formed from an absorbed current image obtained by irradiating the needle with a charged particle beam and a tip coordinate of the needle acquired from a secondary electron image obtained by irradiating the needle with the charged particle beam.
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公开(公告)号：US09620333B2
公开(公告)日：2017-04-11
申请号：US14833563
申请日：2015-08-24
发明人： Satoshi Tomimatsu , Makoto Sato , Atsushi Uemoto , Tatsuya Asahata , Yo Yamamoto
IPC分类号： H01J37/26 , H01J37/302 , H01J37/20
CPC分类号： H01J37/3023 , H01J37/20 , H01J2237/208 , H01J2237/31745
摘要： A charged particle beam apparatus automatically prepares a sample piece from a sample and includes a charged particle beam irradiation optical system that irradiates a charged particle beam to a sample placed on a movable sample stage. A sample piece transferring unit holds and transfers a sample piece separated and extracted from the sample, and a holder support holds a sample piece holder to which the sample piece is transferred. A computer controls a position of an object based on a template prepared from an image of the object acquired by irradition with the charged particle beam and position information acquired from the image of the object. The sample piece transferring unit includes a needle that transfers the sample piece separated and extrated from the sample, and a needle actuting mechanism that actuates the needle. The computer controls the needle actuating mechanism so as to approach the needle to the sample piece using the template formed from an absorbed current image acquired by irradiating the needle with the charged particle beam.
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