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公开(公告)号：US12057288B2
公开(公告)日：2024-08-06
申请号：US17642165
申请日：2019-10-04
发明人： Momoyo Enyama , Makoto Sakakibara , Hajime Kawano
IPC分类号： H01J37/10 , H01J37/147 , H01J37/153 , H01J37/20 , H01J37/244 , H01J37/28
CPC分类号： H01J37/20 , H01J37/10 , H01J37/1474 , H01J37/153 , H01J37/244 , H01J37/28 , H01J2237/1536 , H01J2237/2448 , H01J2237/2806
摘要： Provided is a charged particle beam device for which deterioration in throughput in the event of abnormality of multiple beams can be prevented. The charged particle beam device includes: a stage 11 on which a sample is mounted; a charged particle optical system configured to irradiate the sample with multiple beams including multiple primary beams; a detector 15 configured to detect secondary beams generated by interactions between the primary beams and the sample and output detection signals; and a control unit 17 configured to control the stage and the charged particle optical system to generate image data based on the detection signals from the detector obtained by scanning the sample with the multiple beams using a first scanning method. The control unit changes, when the abnormality of the multiple beams is detected based on the image data, the multiple beams to scan the sample using a second scanning method, and a scanning width of the multiple beams for scanning the sample is greater in the second scanning method than in the first scanning method.
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公开(公告)号：US11967482B2
公开(公告)日：2024-04-23
申请号：US17435118
申请日：2019-03-08
发明人： Wen Li , Hajime Kawano , Momoyo Enyama , Makoto Sakakibara
IPC分类号： H01J37/153 , H01J37/147 , H01J37/20
CPC分类号： H01J37/153 , H01J37/1475 , H01J37/20
摘要： Deflection of a secondary beam, and astigmatism correction of a primary beam or of the secondary beam are carried out using a multi-pole electromagnetic deflector which deflects the path of the secondary beam toward a detector.
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公开(公告)号：US11508544B2
公开(公告)日：2022-11-22
申请号：US17278848
申请日：2018-09-25
发明人： Soichiro Matsunaga , Souichi Katagiri , Keigo Kasuya , Aki Takei , Hajime Kawano , Takashi Doi
IPC分类号： H01J37/073 , H01J37/10
摘要： To stabilize an emitted electron beam, a thermoelectric field emission electron source includes: an electron source having a needle shape; a metal wire to which the electron source is fixed and configured to heat the electron source; a stem fixed to an insulator and configured to energize the metal wire; a first electrode having a first opening portion and arranged such that a tip of the electron source protrudes from the first opening portion; a second electrode having a second opening portion; and an insulating body configured to position the first electrode and the second electrode such that a central axis of the first opening portion and a central axis of the second opening portion coincide with each other, and to provide electrical insulation between the first and second electrodes, so as to provide a structure that reduces an amount of gas released when the first electrode is heated.
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公开(公告)号：US20220270847A1
公开(公告)日：2022-08-25
申请号：US17632837
申请日：2019-08-07
发明人： Kazuki Ikeda , Wen Li , Hajime Kawano
IPC分类号： H01J37/244 , H01J37/22 , H01J37/147
摘要： A multi-beam scanning electron microscope (charged particle beam device) 100 includes an electron gun (charged particle irradiation source) 101 configured to irradiate a sample 104 with an electron beam (charged particle beam) 103, a detector 106 having a detection region corresponding to the charged particle beam 103 and configured to output an electrical signal 107 corresponding to a reaching position when secondary particles 105 generated from the sample 104 by irradiating the sample 104 with the charged particle beam 103 reach the detection region, and a signal processing block 115 configured to perform measurement of a charge amount of the sample 104 by the charged particle beam 103 and generation of an inspection image of the sample 104 in parallel based on the electrical signal 107 output from the detector 106.
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15.发明授权公开(公告)号：US10984981B2
公开(公告)日：2021-04-20
申请号：US16118891
申请日：2018-08-31
发明人： Hideki Itai , Kumiko Shimizu , Wataru Mori , Hajime Kawano , Shahedul Hoque
IPC分类号： H01J37/147 , H01J37/28 , H01J37/22
摘要： A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle beam device includes a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m≥1), the number m of frames being smaller than the number n of frames.
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公开(公告)号：US20230411108A1
公开(公告)日：2023-12-21
申请号：US18319554
申请日：2023-05-18
CPC分类号： H01J37/026 , H01J37/28 , H01J2237/103 , H01J2237/2007
摘要： A charged particle beam device includes: a plasma generation device attached to a sample chamber through a connecting member; a guide including a hollow portion configured to guide a plasma generated by the plasma generation device in a direction toward a stage; a first voltage source configured to apply a voltage to the stage; and a second voltage source configured to adjust the plasma generation device and the guide to a predetermined potential, in which the guide is disposed to avoid an opening of an objective lens through which a charged particle beam passes and to position a tip of the guide between the objective lens and the stage.
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公开(公告)号：US20220359150A1
公开(公告)日：2022-11-10
申请号：US17623363
申请日：2019-07-08
发明人： Momoyo Enyama , Makoto Sakakibara , Hajime Kawano , Hiroya Ohta
IPC分类号： H01J37/147 , H01J37/244 , H01J37/28 , H01J37/26 , H01J37/153
摘要： The invention provides a charged particle beam device capable of reducing a positional shift between secondary beams generated in a beam separator. The charged particle beam device includes a charged particle beam source configured to irradiate a sample with a plurality of primary beams, a plurality of detectors configured to detect secondary beams emitted from the sample in correspondence to the primary beams, and a beam separator configured to deflect the secondary beams in a direction different from that of the primary beams. The charged particle beam device further includes a deflector provided between the beam separator and the detector to correct a positional shift between the secondary beams generated in the beam separator.
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公开(公告)号：US20220102105A1
公开(公告)日：2022-03-31
申请号：US17435118
申请日：2019-03-08
发明人： Wen Li , Hajime Kawano , Momoyo Enyama , Makoto Sakakibara
IPC分类号： H01J37/153 , H01J37/20 , H01J37/147
摘要： Deflection of a secondary beam, and astigmatism correction of a primary beam or of the secondary beam are carried out using a multi-pole electromagnetic deflector which deflects the path of the secondary beam toward a detector.
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公开(公告)号：US10903037B2
公开(公告)日：2021-01-26
申请号：US16572999
申请日：2019-09-17
发明人： Keigo Kasuya , Shuhei Ishikawa , Kenji Tanimoto , Hajime Kawano , Hideo Todokoro , Souichi Katagiri , Takashi Doi , Soichiro Matsunaga
IPC分类号： H01J37/075 , H01J37/28
摘要： An object of the invention is to stably supply an electron beam from an electron gun, that is, to prevent variation in intensity of the electron beam. The invention provides a charged particle beam device that includes an electron gun having an electron source, an extraction electrode to which a voltage used for extracting electrons from the electron source is applied, and an acceleration electrode to which a voltage used for accelerating the electrons extracted from the electron source is applied, a first heating unit that heats the extraction electrode, and a second heating unit that heats the acceleration electrode.
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