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    LIQUID CRYSTAL SEALING APPARATUS
    17.
    发明申请
    LIQUID CRYSTAL SEALING APPARATUS 审中-公开
    液晶密封装置

    公开(公告)号：US20100033831A1

    公开(公告)日：2010-02-11

    申请号：US12493533

    申请日：2009-06-29

    申请人： Hidenori TAKAHASHI ,  Hideo KANDA

    发明人： Hidenori TAKAHASHI ,  Hideo KANDA

    IPC分类号： G02B27/30 ,  G02F1/1339

    CPC分类号： G02F1/1339

    摘要： A liquid crystal sealing apparatus that radiates light to a sealing layer for sealing liquid crystal between a pair of substrates to cure the sealing layer includes: a laser beam source that emits laser beams as the light; and an optical system V that shapes the laser beams such that regions irradiated with the laser beams emitted from the laser beam source are substantially identical to the shape of the sealing layer. According to the liquid crystal sealing apparatus, since laser beams are used as light, it is possible to substantially restrict the irradiation regions to the sealing layer. Therefore, a mask for covering a liquid crystal region is not needed, and it is possible to radiate light with sufficiently high intensity to the sealing layer. As a result, it is possible to reliably seal the liquid crystal.

    摘要翻译： 一种液晶密封装置，其将光照射到用于将液晶密封在一对基板之间以固化密封层的密封层包括：激光束源，其发射作为光的激光束; 以及光学系统V，其使激光束成形，使得从激光束源发射的激光束照射的区域与密封层的形状基本相同。 根据液晶密封装置，由于使用激光作为光，因此可以将照射区域基本上限制在密封层上。 因此，不需要用于覆盖液晶区域的掩模，并且可以向密封层辐射具有足够高强度的光。 结果，可以可靠地密封液晶。

    PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM
    18.
    发明申请
    PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM 有权
    图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物和耐腐蚀膜

    公开(公告)号：US20120219913A1

    公开(公告)日：2012-08-30

    申请号：US13406306

    申请日：2012-02-27

    申请人： Shohei KATAOKA ,  Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Shoichi SAITOH ,  Michihiro SHIRAKAWA ,  Fumihiro YOSHINO

    发明人： Shohei KATAOKA ,  Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Shoichi SAITOH ,  Michihiro SHIRAKAWA ,  Fumihiro YOSHINO

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/0397

    摘要： Provided is a pattern forming method that is excellent in roughness performance such as line width roughness and exposure latitude, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method.The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition containing a resin that includes 65 mol % or more of a repeating unit having a group which generates a polar group by being degraded by the action of an acid based on all repeating units in the resin and at least one kind of repeating unit represented by the following General Formula (I) or (II), (2) exposing the film, and (3) developing the exposed film using a developer that contains an organic solvent.

    摘要翻译： 提供了一种图案形成方法，其具有优异的粗糙度性能，例如线宽粗糙度和曝光宽容度，以及用于图案形成方法的光化学敏感或辐射敏感性树脂组合物和抗蚀剂膜。 图案形成方法包括：（1）使用含有树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜，所述树脂组合物包含65摩尔％以上的具有通过降解产生极性基团的基团的重复单元 基于树脂中所有重复单元的酸的作用和由以下通式（I）或（II）表示的至少一种重复单元，（2）使膜曝光，和（3）显影曝光膜 使用含有机溶剂的显影剂。

    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME
    19.
    发明申请
    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME 有权
    化学敏感性或辐射敏感性树脂组合物，耐腐蚀膜和使用其的图案形成方法

    公开(公告)号：US20100248143A1

    公开(公告)日：2010-09-30

    申请号：US12748728

    申请日：2010-03-29

    申请人： Takayuki ITO ,  Hidenori TAKAHASHI ,  Tomotaka TSUCHIMURA ,  Shohei KATAOKA ,  Takeshi INASAKI

    发明人： Takayuki ITO ,  Hidenori TAKAHASHI ,  Tomotaka TSUCHIMURA ,  Shohei KATAOKA ,  Takeshi INASAKI

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/0392 ,  G03F7/0397

    摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition, a resist film formed with the composition, and a pattern-forming method using the same. The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less, (A) a repeating unit containing a group capable of decomposing and forming an acid upon irradiation with an actinic ray or radiation, (B) a repeating unit containing a group capable of decomposing and forming a carboxylic acid by the action of an acid, and (C) a repeating unit containing a carbon-carbon unsaturated bond.

    摘要翻译： 提供了一种光化射线敏感或辐射敏感性树脂组合物，由该组合物形成的抗蚀剂膜和使用其的图案形成方法。 光化射线敏感性或辐射敏感性树脂组合物包含（P）含有以下重复单元（A），（B）和（C）的树脂; 和沸点为150℃以下的溶剂，（A）含有能够在光化射线或辐射照射时能够分解形成酸的基团的重复单元，（B）含有能够具有基团的重复单元 通过酸的作用分解和形成羧酸，和（C）含有碳 - 碳不饱和键的重复单元。

    INHIBITORS OF LEUKOTRIENE PRODUCTION
    20.
    发明申请
    INHIBITORS OF LEUKOTRIENE PRODUCTION 有权
    白藜芦素生产抑制剂

    公开(公告)号：US20150018333A1

    公开(公告)日：2015-01-15

    申请号：US14330297

    申请日：2014-07-14

    申请人： Asitha ABEYWARDANE ,  John BROADWATER ,  Hidenori TAKAHASHI

    发明人： Asitha ABEYWARDANE ,  John BROADWATER ,  Hidenori TAKAHASHI

    IPC分类号： C07D401/14 ,  A61K31/4709 ,  A61K31/496

    CPC分类号： C07D401/14 ,  A61K31/4709 ,  A61K31/496

    摘要： The present invention relates to compounds of formula (I): or a pharmaceutically acceptable salt thereof, wherein R1 is defined herein. The compounds of formula (I) are useful as inhibitors of leukotriene A4 hydrolase (LTA4H) and treating LTA4H related disorders. The present invention also relates to pharmaceutical compositions comprising the compounds of formula (I), methods of using these compounds in the treatment of various diseases and disorders, and processes for preparing these compounds.

    摘要翻译： 本发明涉及式（I）化合物或其药学上可接受的盐，其中R 1在本文中定义。 式（I）化合物可用作白三烯A4水解酶（LTA4H）的抑制剂和治疗LTA4H相关疾病。 本发明还涉及包含式（I）化合物的药物组合物，使用这些化合物治疗各种疾病和病症的方法，以及制备这些化合物的方法。