发明申请
US20100248143A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME
有权
化学敏感性或辐射敏感性树脂组合物，耐腐蚀膜和使用其的图案形成方法
- 专利标题： ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME
- 专利标题（中）： 化学敏感性或辐射敏感性树脂组合物，耐腐蚀膜和使用其的图案形成方法
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申请号： US12748728申请日： 2010-03-29
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公开(公告)号： US20100248143A1公开(公告)日： 2010-09-30
- 发明人: Takayuki ITO , Hidenori TAKAHASHI , Tomotaka TSUCHIMURA , Shohei KATAOKA , Takeshi INASAKI
- 申请人： Takayuki ITO , Hidenori TAKAHASHI , Tomotaka TSUCHIMURA , Shohei KATAOKA , Takeshi INASAKI
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM CORPORATION
- 当前专利权人： FUJIFILM CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2009-083708 20090330; JP2010-013681 20100125
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/20
摘要：
Provided is an actinic ray-sensitive or radiation-sensitive resin composition, a resist film formed with the composition, and a pattern-forming method using the same. The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less, (A) a repeating unit containing a group capable of decomposing and forming an acid upon irradiation with an actinic ray or radiation, (B) a repeating unit containing a group capable of decomposing and forming a carboxylic acid by the action of an acid, and (C) a repeating unit containing a carbon-carbon unsaturated bond.
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