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    Route creation device
    1.
    发明授权
    Route creation device 有权
    路由创建设备

    公开(公告)号：US09417083B2

    公开(公告)日：2016-08-16

    申请号：US14410213

    申请日：2012-07-17

    申请人： Shuhei Yamaguchi

    发明人： Shuhei Yamaguchi

    IPC分类号： G01C21/36

    CPC分类号： G01C21/3605 ,  G01C21/3614 ,  G01C21/3664

    摘要： It is an object to provide a technique capable of searching for a route as close to a route intended by a user as possible. A route creation device includes an input unit that accepts a line drawn on a map displayed based on map data, and a link retrieval unit that retrieves corresponding road links that correspond to the line accepted by the input unit from the map data. The route creation device further includes a route searching unit that searches for a route including at least one road link satisfying a predetermined condition among the road links retrieved by the link retrieval unit.

    摘要翻译： 本发明的目的是提供一种能够将路由搜索尽可能靠近用户所希望的路由的技术。 路径创建装置包括：接收基于地图数据显示的地图上绘制的线的输入单元;以及链接检索单元，其从地图数据中检索与输入单元接受的线对应的对应的道路链路。 所述路径制作装置还包括路径搜索单元，所述路线搜索单元在由所述链接检索单元检索到的所述道路链路中搜索包括满足预定条件的至少一条道路链路的路线。

    Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film
    2.
    发明授权
    Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film 有权
    图案形成方法，光化射线敏感或辐射敏感树脂组合物和抗蚀剂膜

    公开(公告)号：US08940476B2

    公开(公告)日：2015-01-27

    申请号：US13397358

    申请日：2012-02-15

    申请人： Shuhei Yamaguchi

    发明人： Shuhei Yamaguchi

    IPC分类号： G03F7/30 ,  G03F7/038 ,  G03F7/32 ,  G03F7/004

    CPC分类号： G03F7/0382 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/325

    摘要： Provided is a pattern forming method that is excellent in resolving power such as pre-bridging dimension, a roughness performance such as line edge roughness, and development time dependency, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method.The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition that contains a resin (A) and a compound (B) which has a polymerizable group and generates an acid by being irradiated with actinic rays or radiations; (2) exposing the film; and (3) developing the exposed film using a developer that contains an organic solvent, wherein a pattern formed in this method is a negative pattern.

    摘要翻译： 提供了分辨能力优异的图案形成方法，例如预桥尺寸，粗糙度性能如线边缘粗糙度和显影时间依赖性，以及光化学敏感或辐射敏感性树脂组合物和抗蚀剂膜 用于图案形成方法。 图案形成方法包括：（1）使用含有树脂（A）和具有聚合性基团的化合物（B）的光化学敏感性或辐射敏感性树脂组合物形成膜，并通过照射产生酸 光化射线或辐射; （2）曝光胶片; 和（3）使用含有有机溶剂的显影剂显影曝光的薄膜，其中在该方法中形成的图案是负图案。

    PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM
    9.
    发明申请
    PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM 有权
    图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物和耐腐蚀膜

    公开(公告)号：US20120219913A1

    公开(公告)日：2012-08-30

    申请号：US13406306

    申请日：2012-02-27

    申请人： Shohei KATAOKA ,  Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Shoichi SAITOH ,  Michihiro SHIRAKAWA ,  Fumihiro YOSHINO

    发明人： Shohei KATAOKA ,  Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Shoichi SAITOH ,  Michihiro SHIRAKAWA ,  Fumihiro YOSHINO

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/0397

    摘要： Provided is a pattern forming method that is excellent in roughness performance such as line width roughness and exposure latitude, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method.The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition containing a resin that includes 65 mol % or more of a repeating unit having a group which generates a polar group by being degraded by the action of an acid based on all repeating units in the resin and at least one kind of repeating unit represented by the following General Formula (I) or (II), (2) exposing the film, and (3) developing the exposed film using a developer that contains an organic solvent.

    摘要翻译： 提供了一种图案形成方法，其具有优异的粗糙度性能，例如线宽粗糙度和曝光宽容度，以及用于图案形成方法的光化学敏感或辐射敏感性树脂组合物和抗蚀剂膜。 图案形成方法包括：（1）使用含有树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜，所述树脂组合物包含65摩尔％以上的具有通过降解产生极性基团的基团的重复单元 基于树脂中所有重复单元的酸的作用和由以下通式（I）或（II）表示的至少一种重复单元，（2）使膜曝光，和（3）显影曝光膜 使用含有机溶剂的显影剂。

    ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION
    10.
    发明申请
    ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION 审中-公开
    化学敏感性或辐射敏感性树脂组合物，以及使用其组合物的耐蚀膜和图案形成方法

    公开(公告)号：US20120207978A1

    公开(公告)日：2012-08-16

    申请号：US13369528

    申请日：2012-02-09

    申请人： Akinori SHIBUYA ,  Shuhei YAMAGUCHI ,  Kunihiko KODAMA ,  Kenji WADA ,  Tomoki MATSUDA

    发明人： Akinori SHIBUYA ,  Shuhei YAMAGUCHI ,  Kunihiko KODAMA ,  Kenji WADA ,  Tomoki MATSUDA

    IPC分类号： G03F7/20 ,  B32B3/30 ,  G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  Y10T428/24479

    摘要： An object of the present invention is to provide an actinic-ray-sensitive or radiation-sensitive resin composition which is significantly excellent in terms of exposure latitude, is capable of forming a favorable rectangular pattern profile, and exhibits low dissolution of the components into an immersion liquid when performing immersion exposure, and a resist film and a pattern forming method each using the same composition. The actinic-ray-sensitive or radiation-sensitive resin composition contains (A) a compound represented by formula (I) and capable of generating an acid upon irradiation of actinic-rays or radiations, and (B) a resin capable of increasing the solubility in an alkaline developer by the action of an acid.

    摘要翻译： 本发明的目的是提供一种在曝光宽容度上显着优异的光化学敏感或辐射敏感性树脂组合物，能够形成有利的矩形图案，并且显示出低成分溶解于 进行浸渍曝光时的浸渍液，以及使用相同组成的抗蚀剂膜和图案形成方法。 光化射线敏感性或辐射敏感性树脂组合物含有（A）由式（I）表示的化合物，并且能够在光化或辐射照射时产生酸，和（B）能够增加溶解度的树脂 在碱性显影剂中通过酸的作用。