公开(公告)号：US09105440B2

公开(公告)日：2015-08-11

申请号：US14468674

申请日：2014-08-26

Applicant: Hermes-Microvision, Inc.

Inventor： Zhongwei Chen ,  Weiming Ren ,  Xuerang Hu ,  Xuedong Liu

IPC: H01J37/141 ,  H01J37/145 ,  H01J37/28

CPC classification number: H01J37/141 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/15 ,  H01J2237/281 ,  H01J2237/2817

Abstract: An apparatus of plural charged particle beams with multi-axis magnetic lens is provided to perform multi-functions of observing a specimen surface, such as high-throughput inspection and high-resolution review of interested features thereof and charge-up control for enhancing image contrast and image resolution. In the apparatus, two or more sub-columns are formed and each of the sub-columns performs one of the multi-functions. Basically the sub-columns take normal illumination to get high image resolutions, but one or more may take oblique illuminations to get high image contrasts.

Abstract translation: 提供具有多轴磁性透镜的多个带电粒子束的装置，以执行观察样品表面的多功能，例如高通量检测和其感兴趣特征的高分辨率检查以及用于增强图像对比度的充电控制 和图像分辨率。 在该装置中，形成两个或多个子列，并且每个子列执行多功能之一。 基本上，子列采取正常照明以获得高图像分辨率，但是一个或多个可能采取倾斜照明以获得高图像对比度。

公开(公告)号：US08835867B2

公开(公告)日：2014-09-16

申请号：US13741654

申请日：2013-01-15

Applicant: Hermes-Microvision, Inc.

Inventor： Zhongwei Chen ,  Weiming Ren ,  Xuedong Liu

IPC: H01J3/14 ,  H01J3/26 ,  H01J49/42

CPC classification number: H01J3/22 ,  B82Y10/00 ,  B82Y40/00 ,  H01F7/0205 ,  H01J3/20 ,  H01J37/14 ,  H01J37/3177 ,  H01J2237/1415 ,  H05K9/00

Abstract: A cellular-type PD unit is proposed and a plurality of the cellular-type PD units is used in pairs in a multi-axis magnetic lens for focusing a plurality of charged beams. First type PD units or second type PD units (called as hybrid PD unit as well) can be applied to cellular-type PD units to flexibly construct sub-lenses. Furthermore, magnetic shielding plates with a plurality of through openings can be placed above and/or below the multi-axis magnetic lens to make magnetic flux leaking out of the multi-axis magnetic lens vanish away rapidly outside the magnetic shielding plates.

Abstract translation: 提出了一种蜂窝型PD单元，并且多个蜂窝型PD单元成对地用于多轴磁性透镜中以聚焦多个带电波束。 可以将第一类PD单元或第二类PD单元（也称为混合PD单元）应用于蜂窝型PD单元以灵活地构建子透镜。 此外，具有多个通孔的磁屏蔽板可以放置在多轴磁性透镜的上方和/或下方，以使从多轴磁性透镜泄漏的磁通在磁屏蔽板之外快速消失。

公开(公告)号：US10276347B2

公开(公告)日：2019-04-30

申请号：US16167429

申请日：2018-10-22

Applicant: Hermes Microvision, Inc.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/12

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US20190057837A1

公开(公告)日：2019-02-21

申请号：US16167429

申请日：2018-10-22

Applicant: Hermes Microvision, Inc.

Inventor： Weiming REN ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/12

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US20190035595A1

公开(公告)日：2019-01-31

申请号：US16047987

申请日：2018-07-27

Applicant: Hermes Microvision, Inc.

Inventor： Weiming REN ,  Xuedong Liu ,  Xuerang Hu ,  Xinan Luo ,  Zhongwei Chen

IPC: H01J37/153 ,  H01J37/244 ,  H01J37/28 ,  H01J37/147 ,  H01J37/14

Abstract: Systems and methods are provided for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus. Embodiments of the present disclosure provide a dispersion device comprising an electrostatic deflector and a magnetic deflector configured to induce a beam dispersion set to cancel the dispersion generated by the beam separator. The combination of the electrostatic deflector and the magnetic deflector can be used to keep the deflection angle due to the dispersion device unchanged when the induced beam dispersion is changed to compensate for a change in the dispersion generated by the beam separator. In some embodiments, the deflection angle due to the dispersion device can be controlled to be zero and there is no change in primary beam axis due to the dispersion device.

公开(公告)号：US10062541B2

公开(公告)日：2018-08-28

申请号：US15417360

申请日：2017-01-27

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/06 ,  H01J37/147 ,  H01J37/28 ,  H01J37/22 ,  H01J37/145 ,  G01N23/2251

Abstract: A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.

公开(公告)号：US20160284505A1

公开(公告)日：2016-09-29

申请号：US15078369

申请日：2016-03-23

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen ,  Jack Jau

IPC: H01J37/147 ,  H01J37/22 ,  H01J37/06 ,  H01J37/20 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/2806 ,  H01J2237/2813

Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.

Abstract translation: 提出了一种用于以倾斜照明观察样品的多光束装置。 在该装置中，新的源转换单元将单个电子源改变为倾斜的虚拟多源阵列，初级投影成像系统投射该阵列以在倾斜照明下在样本上形成多个探测点，并且聚光透镜调整 多个探针点的电流。 在源转换单元中，图像形成装置不仅形成倾斜虚拟多源阵列，而且还补偿多个探测点的离轴像差。 该装置可以提供样品的暗场图像和/或亮场图像。

公开(公告)号：US09431209B2

公开(公告)日：2016-08-30

申请号：US14833583

申请日：2015-08-24

Applicant: Hermes-Microvision, Inc.

Inventor： Weiming Ren ,  Xuerang Hu ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/00 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/141 ,  H01J37/1475 ,  H01J37/28 ,  H01J2237/141 ,  H01J2237/1508 ,  H01J2237/1526 ,  H01J2237/28 ,  H01J2237/2817

Abstract: A new apparatus of plural charged particle beams with multi-axis magnetic lenses is provided, which comprises a plurality of sub-columns The apparatus employs two modified multi-axis magnetic lenses, and magnetic sub-lenses thereof therefore function as the objective lenses and the condenser lenses of all the sub-columns respectively. The plurality of sub-columns can perform the same function or different functions required for observing a surface of a specimen, such as high-throughput inspection and high-resolution review of interested features thereon. Accordingly, the apparatus can be used as a yield management tool in semiconductor manufacturing industry.

Abstract translation: 提供了具有多轴磁透镜的多个带电粒子束的新装置，其包括多个子列。该装置采用两个改进的多轴磁性透镜，并且其磁性子透镜因此用作物镜，并且 所有子列的聚光透镜分别。 多个子列可以执行用于观察样本表面所需的相同功能或不同的功能，例如高通量检测和对其感兴趣的特征的高分辨率检查。 因此，该装置可以用作半导体制造业的屈服管理工具。

公开(公告)号：US20150060662A1

公开(公告)日：2015-03-05

申请号：US14468674

申请日：2014-08-26

Applicant: Hermes-Microvision, Inc.

Inventor： Zhongwei Chen ,  Weiming Ren ,  Xuerang Hu ,  Xuedong Liu

IPC: H01J37/141 ,  H01J37/26 ,  H01J37/147 ,  H01J37/073 ,  H01J37/20

CPC classification number: H01J37/141 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/15 ,  H01J2237/281 ,  H01J2237/2817

Abstract: An apparatus of plural charged particle beams with multi-axis magnetic lens is provided to perform multi-functions of observing a specimen surface, such as high-throughput inspection and high-resolution review of interested features thereof and charge-up control for enhancing image contrast and image resolution. In the apparatus, two or more sub-columns are formed and each of the sub-columns performs one of the multi-functions. Basically the sub-columns take normal illumination to get high image resolutions, but one or more may take oblique illuminations to get high image contrasts.

Abstract translation: 提供具有多轴磁性透镜的多个带电粒子束的装置，以执行观察样品表面的多功能，例如高通量检测和其感兴趣特征的高分辨率检查以及用于增强图像对比度的充电控制 和图像分辨率。 在该装置中，形成两个或多个子列，并且每个子列执行多功能之一。 基本上，子列采取正常照明以获得高图像分辨率，但是一个或多个可能采取倾斜照明以获得高图像对比度。

公开(公告)号：US10141160B2

公开(公告)日：2018-11-27

申请号：US15365145

申请日：2016-11-30

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/14 ,  H01J37/153 ,  H01J37/20 ,  H01J37/244 ,  H01J37/141 ,  H01J37/29

Abstract: A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.