公开(公告)号：US20190393014A1

公开(公告)日：2019-12-26

申请号：US16471291

申请日：2017-01-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta KAWAMOTO ,  Akira IKEGAMI ,  Yasushi EBIZUKA ,  Naoma BAN

IPC: H01J37/145 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28

Abstract: The objective of the present invention is to provide a charged-particle beam device capable of moving a field-of-view to an exact position even when moving the field-of-view above an actual sample. In order to attain this objective, a charged-particle beam device is proposed comprising an objective lens whereby a charged-particle beam is focused and irradiated onto a sample: a field-of-view moving deflector for deflecting the charged-particle beam; and a stage onto which the sample is placed. The charged-particle beam device is equipped with a control device which controls the lens conditions for the objective lens in such a manner that the charged-particle been focuses on the sample which is to be measured; moves the field-of-view via the field-of-view moving deflector while maintaining the lens conditions; acquires a plurality of images at each position among a reference pattern extending in a specified direction; and uses the plurality of acquired images to adjust the signal supplied to the field-of-view moving deflector.

公开(公告)号：US20180233320A1

公开(公告)日：2018-08-16

申请号：US15747847

申请日：2016-07-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Akira IKEGAMI ,  Yuta KAWAMOTO ,  Hideto DOHI ,  Manabu YANO ,  Yutaka TANDAI ,  Hideyuki KAZUMI

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/21

CPC classification number: H01J37/147 ,  H01J37/04 ,  H01J37/21 ,  H01J37/248 ,  H01J37/28 ,  H01J2237/0473

Abstract: A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.

公开(公告)号：US20160379795A1

公开(公告)日：2016-12-29

申请号：US15183952

申请日：2016-06-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Ryota WATANABE ,  Yuko SASAKI ,  Akira IKEGAMI

IPC: H01J37/21 ,  H01J37/28

CPC classification number: H01J37/21 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/24578 ,  H01J2237/281

Abstract: An object of the invention is to provide a charged particle beam apparatus which can perform optimized adjustment of a focusing condition of a charged particle beam focused on a sample and optimized adjustment of an orbit of a charged particle emitted from the sample. In order to achieve the above-described object, there is provided a charged particle beam apparatus including a passage restriction member that partially restricts passage of a charged particle emitted from a sample, a first lens that is arranged between the passage restriction member and the sample, and that controls an orbit of the charged particle emitted from the sample, and a second lens that is arranged between the passage restriction member and the charged particle source, and that changes a focusing condition of the charged particle beam in accordance with a control condition of the first lens.

Abstract translation: 本发明的目的是提供一种带电粒子束装置，其能够对聚焦在样品上的带电粒子束的聚焦条件进行优化调整，并优化对从样品发射的带电粒子轨道的调整。 为了实现上述目的，提供了一种带电粒子束装置，其包括：通道限制部件，其部分地限制从样品发射的带电粒子的通过;布置在通道限制部件和样品之间的第一透镜 并且控制从样品发射的带电粒子的轨道，以及布置在通道限制构件和带电粒子源之间的第二透镜，并且根据控制条件改变带电粒子束的聚焦条件 的第一个镜头。