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    Laser apparatus and extreme ultraviolet light generation system
    13.
    发明授权
    Laser apparatus and extreme ultraviolet light generation system 有权

    公开(公告)号：US10461494B2

    公开(公告)日：2019-10-29

    申请号：US16055656

    申请日：2018-08-06

    Applicant: GIGAPHOTON INC.

    Inventor： Yoshiaki Kurosawa ,  Takashi Suganuma

    IPC: H01S3/134 ,  H01S3/036 ,  G01N33/00 ,  G03F7/20 ,  H01S3/034 ,  H01S3/13 ,  H01S3/23 ,  H01S3/00 ,  G01N21/59 ,  H01S3/223

    Abstract: A laser apparatus according to one aspect of the present disclosure includes a master oscillator configured to output laser light, a plurality of amplifiers each configured to include carbon dioxide as a laser medium and amplify the laser light, a first optical path pipe configured to cover a laser optical path between the amplifiers, a gas supply port configured to supply, into the first optical path pipe, gas having lower carbon dioxide concentration than that of the air, a first carbon dioxide densitometer configured to measure carbon dioxide concentration in the first optical path pipe, and an alarm device configured to issue an alarm when the carbon dioxide concentration measured by the first carbon dioxide densitometer exceeds a preset prescribed value.

    Beam dump apparatus, laser apparatus equipped with the beam dump apparatus, and extreme ultraviolet light generating apparatus
    14.
    发明授权
    Beam dump apparatus, laser apparatus equipped with the beam dump apparatus, and extreme ultraviolet light generating apparatus 有权

    公开(公告)号：US10401615B2

    公开(公告)日：2019-09-03

    申请号：US15642745

    申请日：2017-07-06

    Applicant: Gigaphoton Inc.

    Inventor： Yoshiaki Kurosawa ,  Takashi Suganuma

    IPC: G02B26/02 ,  H05G2/00 ,  G02B27/14 ,  G21K1/06 ,  H01S3/23 ,  H01S3/10 ,  H01S3/00

    Abstract: A beam dump apparatus may include: an attenuator module; a beam dump module; and a control unit. The attenuator module includes: a first beam splitter provided inclined with respect to the optical axis of a laser beam at a first angle; a second beam splitter provided inclined with respect to the optical axis at a second angle; a first beam dumper provided such that the laser beam from the first beam splitter enters thereinto; a second beam dumper provided such that the laser beam from the second beam splitter enters thereinto; and a first stage that causes the beam splitters to advance into and retreat from the optical path. The beam dump module includes: a mirror; a third beam dumper provided such that the laser beam from the mirror enters thereinto; and a second stage that causes the mirror to advance into and retreat from the optical path.

    Optical device, laser apparatus, and extreme ultraviolet light generation system
    15.
    发明授权
    Optical device, laser apparatus, and extreme ultraviolet light generation system 有权
    光学装置，激光装置和极紫外光发生系统

    公开(公告)号：US09362703B2

    公开(公告)日：2016-06-07

    申请号：US14485355

    申请日：2014-09-12

    Applicant: GIGAPHOTON INC.

    Inventor： Hakaru Mizoguchi ,  Takashi Suganuma ,  Hideo Hoshino ,  Osamu Wakabayashi

    IPC: G01C1/00 ,  H01S3/00 ,  H05G2/00 ,  H01S3/10 ,  H01S3/13

    CPC classification number: H01S3/0071 ,  H01S3/0014 ,  H01S3/10061 ,  H01S3/1305 ,  H05G2/008

    Abstract: An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.

    Abstract translation: 光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 设置在所述光束传送路径中用于调节所述激光束的光束传送路径的光束调节单元; 设置在所述光束传送路径中用于检测所述光束传送路径的测量单元; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。

    Laser apparatus and extreme ultraviolet light generation system
    16.
    发明授权
    Laser apparatus and extreme ultraviolet light generation system 有权
    激光设备和极紫外光发生系统

    公开(公告)号：US09184551B2

    公开(公告)日：2015-11-10

    申请号：US14454494

    申请日：2014-08-07

    Applicant: GIGAPHOTON INC.

    Inventor： Takashi Suganuma ,  Hidenobu Kameda ,  Masato Moriya ,  Osamu Wakabayashi

    IPC: H01S3/10 ,  H01S3/104 ,  H01S3/13 ,  H01S3/134 ,  H01S3/23 ,  H05G2/00 ,  H01S3/0971 ,  H01S3/00

    CPC classification number: H01S3/10 ,  H01S3/005 ,  H01S3/0971 ,  H01S3/10007 ,  H01S3/10023 ,  H01S3/1003 ,  H01S3/104 ,  H01S3/13 ,  H01S3/1301 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/2308 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2391 ,  H05G2/008

    Abstract: A laser apparatus may include a master oscillator, an optical unit provided in a beam path of a laser beam from the master oscillator, a beam adjusting unit provided upstream from the optical unit in a beam path of the laser beam and configured for adjusting at least one of a beam path and a wavefront of the laser beam, a first detection unit provided between the beam adjusting unit and the optical unit in a beam path of the laser beam and configured for detecting the laser beam, a second detection unit provided downstream from the optical unit in a beam path of the laser beam and configured for detecting the laser beam, and a controller configured for controlling the beam adjusting unit based on outputs from the first and second detection units.

    Abstract translation: 激光装置可以包括主振荡器，设置在来自主振荡器的激光束的光束路径中的光学单元，光束调节单元，其设置在激光束的光束路径中的光学单元的上游，并被配置为至少调节 激光束的光束路径和波前的一个;第一检测单元，设置在激光束的光束路径中的光束调整单元和光学单元之间，并且被配置为检测激光束;第二检测单元， 激光束的光束路径中的光学单元，被配置为检测激光束;以及控制器，被配置为基于来自第一和第二检测单元的输出来控制光束调整单元。

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