公开(公告)号：US09429847B2

公开(公告)日：2016-08-30

申请号：US15064019

申请日：2016-03-08

Applicant: Gigaphoton Inc.

Inventor： Toshihiro Nishisaka ,  Yukio Watanabe ,  Osamu Wakabayashi ,  Kouji Kakizaki ,  Michio Shinozaki

IPC: H05G2/00 ,  G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/70975 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.

公开(公告)号：US09179534B2

公开(公告)日：2015-11-03

申请号：US14158710

申请日：2014-01-17

Applicant: GIGAPHOTON INC.

Inventor： Yukio Watanabe ,  Osamu Wakabayashi ,  Miwa Igarashi

IPC: H05G2/00 ,  G03F7/20 ,  G21K1/04

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/04 ,  H05G2/003 ,  H05G2/005

Abstract: An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.

Abstract translation: 一种用于向处理单元提供极紫外光的极紫外光源装置，用于通过使用极紫外光进行处理。 所述极紫外光源装置具有：向所述处理单元供给所述极紫外光的室， 收集器反射镜，用于收集在室中产生的极紫外光，以将极紫外光输出到处理单元; 以及光路连接模块，其用于限定所述室与所述处理单元之间的所述极紫外光的路线，并将所述极紫外光的路径与外部隔离。

公开(公告)号：US11789374B2

公开(公告)日：2023-10-17

申请号：US17397554

申请日：2021-08-09

Applicant: Gigaphoton Inc.

Inventor： Yusuke Hoshino ,  Yukio Watanabe ,  Toshihiro Nishisaka ,  Atsushi Ueda ,  Koichiro Koge ,  Takayuki Osanai ,  Gouta Niimi

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70916 ,  G03F7/70033 ,  H05G2/006 ,  H05G2/008

Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a first partition wall covering a plasma generation region in the chamber and having a first opening, an EUV light concentrating mirror located in a first space inside the chamber and outside the first partition wall and configured to concentrate extreme ultraviolet light generated in the plasma generation region and having passed through the first opening, a first gas supply port formed at the chamber and configured to supply gas to the first space, and a gas exhaust port formed in the first partition wall and configured to exhaust gas in a second space inside the first partition wall to outside of both the first partition wall and the chamber.

公开(公告)号：US09229192B2

公开(公告)日：2016-01-05

申请号：US14697260

申请日：2015-04-27

Applicant: GIGAPHOTON INC.

Inventor： Hiroshi Someya ,  Yukio Watanabe ,  Katsuhiko Wakana ,  Osamu Wakabayashi

IPC: G02B7/182 ,  G02B7/18 ,  G02B5/08 ,  G02B5/10

CPC classification number: G02B7/181 ,  G02B5/0891 ,  G02B5/10 ,  G03F7/70033 ,  G03F7/70175

Abstract: A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.