公开(公告)号：US11789374B2

公开(公告)日：2023-10-17

申请号：US17397554

申请日：2021-08-09

Applicant: Gigaphoton Inc.

Inventor： Yusuke Hoshino ,  Yukio Watanabe ,  Toshihiro Nishisaka ,  Atsushi Ueda ,  Koichiro Koge ,  Takayuki Osanai ,  Gouta Niimi

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70916 ,  G03F7/70033 ,  H05G2/006 ,  H05G2/008

Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a first partition wall covering a plasma generation region in the chamber and having a first opening, an EUV light concentrating mirror located in a first space inside the chamber and outside the first partition wall and configured to concentrate extreme ultraviolet light generated in the plasma generation region and having passed through the first opening, a first gas supply port formed at the chamber and configured to supply gas to the first space, and a gas exhaust port formed in the first partition wall and configured to exhaust gas in a second space inside the first partition wall to outside of both the first partition wall and the chamber.

公开(公告)号：US11452196B2

公开(公告)日：2022-09-20

申请号：US16894504

申请日：2020-06-05

Applicant: Gigaphoton Inc.

Inventor： Kouichiro Kouge ,  Yusuke Hoshino ,  Toshihiro Nishisaka ,  Takashi Okada

IPC: H05G2/00 ,  G03F7/20

Abstract: An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber.