公开(公告)号：US11337292B1

公开(公告)日：2022-05-17

申请号：US17458148

申请日：2021-08-26

Applicant: Gigaphoton Inc.

Inventor： Gouta Niimi ,  Georg Soumagne

IPC: H05G2/00 ,  G03F7/20

Abstract: A tin trap device may include a housing including a gas inlet port into which gas containing tin flows from a chamber device, an internal space which communicates with the gas inlet port, and a gas exhaust port which exhausts the gas while communicating with the internal space; a multiple tube including a plurality of tube members, arranged on a flow path of the gas traveling to the gas exhaust port from the gas inlet port through the internal space, and having a temperature at which the tin deposited from the gas adheres to the tube member; and a gas travel direction changing member configured to change a travel direction of at least fastest gas of the gas traveling from the gas inlet port to the multiple tube.

公开(公告)号：US11789374B2

公开(公告)日：2023-10-17

申请号：US17397554

申请日：2021-08-09

Applicant: Gigaphoton Inc.

Inventor： Yusuke Hoshino ,  Yukio Watanabe ,  Toshihiro Nishisaka ,  Atsushi Ueda ,  Koichiro Koge ,  Takayuki Osanai ,  Gouta Niimi

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70916 ,  G03F7/70033 ,  H05G2/006 ,  H05G2/008

Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a first partition wall covering a plasma generation region in the chamber and having a first opening, an EUV light concentrating mirror located in a first space inside the chamber and outside the first partition wall and configured to concentrate extreme ultraviolet light generated in the plasma generation region and having passed through the first opening, a first gas supply port formed at the chamber and configured to supply gas to the first space, and a gas exhaust port formed in the first partition wall and configured to exhaust gas in a second space inside the first partition wall to outside of both the first partition wall and the chamber.