公开(公告)号：US11452196B2

公开(公告)日：2022-09-20

申请号：US16894504

申请日：2020-06-05

Applicant: Gigaphoton Inc.

Inventor： Kouichiro Kouge ,  Yusuke Hoshino ,  Toshihiro Nishisaka ,  Takashi Okada

IPC: H05G2/00 ,  G03F7/20

Abstract: An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber.

公开(公告)号：US12284745B2

公开(公告)日：2025-04-22

申请号：US17823049

申请日：2022-08-29

Applicant: Gigaphoton Inc.

Inventor： Yoshiyuki Honda ,  Hirokazu Hosoda ,  Kouichiro Kouge

IPC: H05G2/00

Abstract: An extreme ultraviolet light generation method includes a target supply step of outputting a droplet target into a chamber, a prepulse laser light irradiation step of irradiating the droplet target with prepulse laser light to generate a diffusion target, and a main pulse laser light irradiation step of irradiating the diffusion target with main pulse laser light to generate extreme ultraviolet light. Here, the main pulse laser light includes first main pulse laser light and second main pulse laser light, and in the main pulse laser light irradiation step, the diffusion target is irradiated with the first main pulse laser light having higher energy density at a central portion than at an outer peripheral portion and the second main pulse laser light having higher energy density at the outer peripheral portion than at the central portion.