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    METHOD FOR PREPARING SAMPLES FOR IMAGING
    11.
    发明申请
    METHOD FOR PREPARING SAMPLES FOR IMAGING 审中-公开
    制备图像样本的方法

    公开(公告)号：US20150330877A1

    公开(公告)日：2015-11-19

    申请号：US14758150

    申请日：2013-12-30

    Applicant: FEI COMPANY

    Inventor： Michael Schmidt ,  Jeffrey Blackwood ,  Stacey Stone ,  Sang Hoon Lee ,  Ronald Kelley ,  Trevan Landin

    IPC: G01N1/32 ,  H01L21/3065

    CPC classification number: G01N1/32 ,  G01N1/28 ,  H01L21/30655

    Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. An ion beam mills exposes a cross section of the work piece using a bulk mill process. A deposition precursor gas is directed to the sample surface while a small amount of material is removed from the exposed cross section face, the deposition precursor producing a more uniform cross section. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

    Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 离子束研磨机使用大量研磨工艺暴露工件的横截面。 沉积前体气体被引导到样品表面，同时少量的材料从暴露的横截面去除，沉积前体产生更均匀的横截面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。

    Fiducial Design for Tilted or Glancing Mill Operations with a Charged Particle Beam
    16.
    发明申请
    Fiducial Design for Tilted or Glancing Mill Operations with a Charged Particle Beam 审中-公开
    带有带电粒子束的倾斜或碾磨机操作的基准设计

    公开(公告)号：US20150357159A1

    公开(公告)日：2015-12-10

    申请号：US14758466

    申请日：2013-12-30

    Applicant: FEI COMPANY

    Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

    IPC: H01J37/317

    CPC classification number: H01J37/317 ,  H01J37/3056 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2814 ,  H01J2237/31745

    Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

    Abstract translation: 一种用于分析具有带电粒子束的样品的方法，包括将束朝向样品表面引导; 铣削表面以暴露样品中的第二表面，其中远离离子源的第二表面的端部相对于参考深度比距离离子源的第一表面的端部更深的深度; 将带电粒子束引向第二表面以形成第二表面的一个或多个图像; 通过检测电子束与第二表面的相互作用形成感兴趣的多个相邻特征的横截面的图像; 将横截面的图像组装成感兴趣的一个或多个特征的三维模型。 提出了一种用于形成改进的基准并确定纳米尺度三维结构中暴露特征的深度的方法。

    High Aspect Ratio Structure Analysis
    17.
    发明申请
    High Aspect Ratio Structure Analysis 审中-公开
    高宽比结构分析

    公开(公告)号：US20150243478A1

    公开(公告)日：2015-08-27

    申请号：US14433354

    申请日：2013-10-04

    Applicant: FEI COMPANY

    Inventor： Sang Hoon Lee ,  Stacey Stone ,  Jeffrey Blackwood ,  Michael Schmidt

    IPC: H01J37/305 ,  C23C14/46

    CPC classification number: H01J37/3053 ,  C23C14/46 ,  G01N1/32 ,  H01J37/28 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/3174 ,  H01J2237/31745 ,  H01J2237/31749

    Abstract: Curtaining artifacts on high aspect ratio features are reduced by reducing the distance between a protective layer and feature of interest. For example, the ion beam can mill at an angle to the work piece surface to create a sloped surface. A protective layer is deposited onto the sloped surface, and the ion beam mills through the protective layer to expose the feature of interest for analysis. The sloped mill positions the protective layer close to the feature of interest to reduce curtaining.

    Abstract translation: 通过减小保护层和感兴趣的特征之间的距离来减少高纵横比特征上的赝像。 例如，离子束可以与工件表面成一定角度磨，以产生倾斜的表面。 保护层沉积在倾斜表面上，并且离子束通过保护层研磨以暴露感兴趣的特征以进行分析。 倾斜的磨机使保护层位于感兴趣的特征附近以减少绘制。

    Multiple sample attachment to nano manipulator for high throughput sample preparation
    19.
    发明授权
    Multiple sample attachment to nano manipulator for high throughput sample preparation 有权
    多个样品附着到纳米操纵器，用于高通量样品制备

    公开(公告)号：US08729469B1

    公开(公告)日：2014-05-20

    申请号：US13935720

    申请日：2013-07-05

    Applicant: FEI Company

    Inventor： Michael Schmidt ,  Stacey Stone ,  Corey Senowitz

    IPC: H01J37/20

    CPC classification number: H01J37/3023 ,  G01N1/286 ,  H01J2237/201 ,  H01J2237/208 ,  H01J2237/31745

    Abstract: An improved method for extracting and handling multiple samples for S/TEM analysis is disclosed. Preferred embodiments of the present invention make use of a micromanipulator that attaches multiple samples at one time in a stacked formation and a method of placing each of the samples onto a TEM grid. By using a method that allows for the processing of multiple samples, the throughput of sample prep in increased significantly.

    Abstract translation: 公开了一种用于提取和处理多个样品进行S / TEM分析的改进方法。 本发明的优选实施例利用将叠层结构中的多个样品一次附着在一起的显微操纵器和将每个样品放置在TEM网格上的方法。 通过使用允许多个样品处理的方法，样品制备的生产量显着增加。

    Fiducial design for tilted or glancing mill operations with a charged particle beam
    20.
    发明授权
    Fiducial design for tilted or glancing mill operations with a charged particle beam 有权

    公开(公告)号：US11315756B2

    公开(公告)日：2022-04-26

    申请号：US16012888

    申请日：2018-06-20

    Applicant: FEI Company

    Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

    IPC: H01J37/317 ,  H01J37/305

    Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

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