SEMICONDUCTOR AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20220359749A1

    公开(公告)日:2022-11-10

    申请号:US17564688

    申请日:2021-12-29

    Abstract: Provided is a semiconductor device. The semiconductor device includes a semiconductor substrate including monocrystalline silicon or polycrystalline silicon, a first insulating layer on the semiconductor substrate, the first insulating layer including a local region in which a portion of an upper surface of the first insulating layer is recessed, a channel layer provided in the local region of the first insulating layer, a silicide provided on one side surface of the channel layer, a control gate provided on the channel layer, a gate insulating film provided between the channel layer and the control gate, and a polarity control gate arranged so as to overlap an interface between the channel layer and the silicide, wherein the polarity control gate is spaced apart from the control gate, and the channel layer includes monocrystalline silicon.

    ELECTRO-ABSORPTION OPTICAL MODULATION DEVICE AND METHOD OF FABRICATING THE SAME
    14.
    发明申请
    ELECTRO-ABSORPTION OPTICAL MODULATION DEVICE AND METHOD OF FABRICATING THE SAME 有权
    电吸收光学调制装置及其制造方法

    公开(公告)号:US20160202504A1

    公开(公告)日:2016-07-14

    申请号:US14848077

    申请日:2015-09-08

    CPC classification number: G02F1/025 G02F2001/0155 G02F2001/0157

    Abstract: Provided is an optical modulator including an optical waveguide and an optical modulation part integrated on the optical waveguide that is clad in oxide silicon and has silicon as core by using a bulk silicon wafer in place of an silicon-on-insulator (SOI) used for a typical optical waveguide and optical modulator and using complementary metal oxide semiconductor (CMOS) and thermal oxide film formation processes, and a fabrication method thereof

    Abstract translation: 提供了一种光学调制器,其包括光波导和光调制部分,其集成在光波导上,其被包覆在氧化物硅中并且通过使用体硅晶片代替绝缘体上硅(SOI)而具有硅作为核, 典型的光波导和光学调制器,并使用互补金属氧化物半导体(CMOS)和热氧化膜形成工艺及其制造方法

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