Thin film transistor, array substrate and manufacturing method thereof, and display device

    公开(公告)号:US10204922B2

    公开(公告)日:2019-02-12

    申请号:US15303357

    申请日:2016-01-13

    Abstract: A metal oxide thin film transistor and a manufacturing method thereof, an array substrate and a manufacturing method thereof, and a display device are provided. The manufacturing method of the metal oxide thin film transistor includes forming a gate electrode (141), a gate insulating layer (130), an active layer (113) and source and drain electrodes (121, 122) of a thin film transistor on a base substrate. The active layer is prepared by using a metal oxide thin film, and an electrochemical oxidation process is performed on the metal oxide thin film during preparing the active layer, and the metal oxide thin film after the electrochemical oxidation process is patterned to form the active layer of the thin film transistor. By using the manufacturing method of the embodiment, oxygen vacancies of the metal oxide thin film can be reduced, a concentration of free carriers thereof can be controlled, the prepared thin film transistor has good stability, and it is not necessary to add additional photolithography process, slightly affecting the cost.

    Antenna apparatus and preparation method thereof

    公开(公告)号:US11621474B2

    公开(公告)日:2023-04-04

    申请号:US16466358

    申请日:2019-01-18

    Abstract: The present disclosure relates to an antenna apparatus. The antenna apparatus may include a first substrate; a second substrate opposite the first substrate; a first antenna layer; an insulating layer; and a conductive layer. The first antenna layer may comprise a plurality of antenna units, each of the plurality of antenna units may comprise a radiation patch and is configured to receive the signals in one of the different frequency ranges. The insulating layer may comprise a plurality of sub-insulating layers; the conductive layer may comprise a plurality of conductive electrodes; and the plurality of the sub-insulating layers, the plurality of the conductive electrodes, and the plurality of the antenna units may be in one-to-one correspondence. The radiation patch, at least one of the plurality of conductive electrodes, and at least one of the plurality of sub-insulating layers may constitute a rectifier diode structure.

    THIN FILM TRANSISTOR AND PREPARATION METHOD THEREOF, ARRAY SUBSTRATE, AND DISPLAY PANEL

    公开(公告)号:US20170154905A1

    公开(公告)日:2017-06-01

    申请号:US15122155

    申请日:2015-10-09

    Abstract: This disclosure provides a thin film transistor and the preparation method thereof, an array substrate, and a display panel, so as to solve the problem that the active layer is prone to be corroded when a metal oxide thin film transistor is produced by a back channel etching process. The preparation method comprises: forming a gate electrode metal thin film on a base substrate, and allowing the gate electrode metal thin film to form a gate electrode metal layer comprising a gate electrode by a patterning process; forming a gate electrode insulating layer on the gate electrode metal layer; forming an active layer on the gate electrode insulating layer; preparing a metal nanoparticle layer on the active layer, said metal nanoparticle layer being used as an etching protection layer; forming a source and drain electrode metal thin film on the base substrate on which the above processes are finished, and allowing the source and drain electrode metal thin film to form a source and drain electrode metal layer comprising a source electrode and a drain electrode by a patterning process, wherein the source electrode and the drain electrode cover a part of the metal nanoparticle layer; removing or oxidizing the part of the metal nanoparticle layer which is not covered by the source electrode and the drain electrode in an oxygen-containing atmosphere; and forming a passivation layer on the source and drain electrode metal layer.

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