CONNECTOR DISENGAGEMENT APPARATUS AND INSPECTION SYSTEM FOR LIQUID CRYSTAL DISPLAY MODULE
    14.
    发明申请
    CONNECTOR DISENGAGEMENT APPARATUS AND INSPECTION SYSTEM FOR LIQUID CRYSTAL DISPLAY MODULE 有权
    液晶显示模块连接器分离装置和检测系统

    公开(公告)号:US20150323592A1

    公开(公告)日:2015-11-12

    申请号:US14497861

    申请日:2014-09-26

    CPC classification number: G02F1/1309 G01R31/2889 H01R13/635

    Abstract: The present disclosure provides a connector disengagement apparatus and an inspection system for a liquid crystal display module. The connector disengagement apparatus comprises a first member, a second member, a third member, a rotation axle and a stiffener carrying a part of a connector, one end of the first member being connected to one end of the second member, the other end of the first member being arranged towards the stiffener, the other end of the second member being connected to the third member, wherein the second member is rotatable about the rotation axle. The connector disengagement apparatus acts on the stiffener in a down-to-up direction to lift the stiffener to interrupt efficiently the connection of the connector. In the disengagement process, the pins of the connector will not be damaged as the force of the disengagement apparatus is not directly applied onto the connector.

    Abstract translation: 本公开提供了一种用于液晶显示模块的连接器分离装置和检查系统。 连接器分离装置包括第一构件,第二构件,第三构件,旋转轴和承载连接器的一部分的加强件,第一构件的一端连接到第二构件的一端,另一端 所述第一构件朝向所述加强件布置,所述第二构件的另一端连接到所述第三构件,其中所述第二构件可绕所述旋转轴旋转。 连接器分离装置在向下 - 向上的方向上作用在加强件上以提升加强件以有效地中断连接器的连接。 在分离过程中,由于分离装置的力不直接施加到连接器上,连接器的销不会被损坏。

    PREPARATION METHOD OF DISPLAY PANEL, DISPLAY PANEL AND DISPLAYING DEVICE

    公开(公告)号:US20220059631A1

    公开(公告)日:2022-02-24

    申请号:US17416417

    申请日:2020-11-11

    Abstract: Disclosed are a preparation method of a display panel, a display panel and a displaying device. The display panel comprises a plurality of first-color subpixels, and each first-color subpixel comprises a base, the base comprising a first driving electrode and a second driving electrode; a flat layer disposed on the side, near the first driving electrode and the second driving electrode, of the base; a patterned passivation layer and at least one first electrode disposed on the side, away from the base, of the flat layer, the first electrode being connected with the first driving electrode through via holes penetrating the flat layer; and at least one second electrode disposed on the side, away from the base, of the passivation layer, the second electrode being connected with the second driving electrode through via holes penetrating the passivation layer and the flat layer.

    Array substrate, display panel, display apparatus and preparation method therefor

    公开(公告)号:US11239292B2

    公开(公告)日:2022-02-01

    申请号:US16476578

    申请日:2018-08-27

    Abstract: Provided are an array substrate, a display panel, a display apparatus and a preparation method therefor. The array substrate comprises: a base substrate; and multiple pixel units arranged on one side of the base substrate, each of the pixel units comprising: a thin-film transistor and an electroluminescent structure, and a shading structure located between the thin-film transistor and the base substrate, wherein the thin-film transistor comprises: an active layer located on one side, away from the base substrate, of the shading structure; the electroluminescent structure comprises: first electrodes for driving the pixel units; and one of the shading structure and the active layer is a same-layer structure fabricated by the same mask plate as the first electrodes so as to reduce the number of mask procedures required in preparation of an array substrate.

    Dry etching method
    18.
    发明授权

    公开(公告)号:US10468271B2

    公开(公告)日:2019-11-05

    申请号:US16108185

    申请日:2018-08-22

    Abstract: A dry etching method, including: etching a silicon-containing thin film with a first gas by a first preset thickness; etching the silicon-containing thin film with a second gas by a second preset thickness, to remove etching residues generated after etching the silicon-containing thin film by the first preset thickness; after the etching residues are removed, etching the silicon-containing thin film with the first gas by a third preset thickness, which is less than the first preset thickness; wherein the first gas includes chlorine gas, and the second gas includes fluoride gas.

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