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公开(公告)号：US10422691B2
公开(公告)日：2019-09-24
申请号：US15549133
申请日：2016-02-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Vadim Yevgenyevich Banine , Willem Jakobus Cornelis Koppert , Han-Kwang Nienhuys , Ruud Martinus Van Der Horst
Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.
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公开(公告)号：US20150049323A1
公开(公告)日：2015-02-19
申请号：US14377954
申请日：2013-02-28
Applicant: ASML Netherlands B.V.
Inventor： Kursat Bal , Bernardus Antonius Johannes Luttikhuis , David Christopher Ockwell , Arnold Jan Van Putten , Han-Kwang Nienhuys , Maikel Bernardus Theodorus Leenders
IPC: G03F7/20
CPC classification number: G03F7/70691 , G03F7/20 , G03F7/70066 , G03F7/70866 , G03F7/70933
Abstract: A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.
Abstract translation: 光刻设备在标线片（MA）和标线片（REB-X，REB-Y）之间注入气体，以保护掩模版免受污染。 气体可以注入到分划板和最接近的一对标线片之间的空间中，或者注入在两对标线片之间限定的空间中。
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公开(公告)号：US12164125B2
公开(公告)日：2024-12-10
申请号：US17600420
申请日：2020-03-06
Applicant: ASML Netherlands B.V.
Inventor： Han-Kwang Nienhuys , Sietse Thijmen Van Der Post
IPC: G02B5/18
Abstract: A grating is provided on a mirror for specularly reflecting and diffracting a grazing-incidence beam of radiation and has a periodic structure with a grating period comprising first (ridge) and second (trench) substructures either side of a sidewall 806 facing the incident beam 800. The ridge is configured to specularly reflect the beam from the flat top 808 of the ridge into a specularly reflected beam 810 in a zeroth-order direction β′=β. The grating is configured with fixed or varying pitch to diffract the beam from the grating periods in one or more non-zero-diffraction-order direction β′≠β. The shape of the trench may be is described by structural parameters top width and depth that define the aspect ratio of the trench. The shape is determined such that any rays (and optionally diffraction) of the beam that reflect once from the trench floor in the zeroth-order direction are obscured by the sidewall.
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公开(公告)号：US11112618B2
公开(公告)日：2021-09-07
申请号：US15754480
申请日：2016-08-03
Applicant: ASML Netherlands B.V.
Inventor： Gosse Charles De Vries , Han-Kwang Nienhuys
Abstract: A beam-splitting apparatus arranged to receive an input radiation beam and split the input radiation beam into a plurality of output radiation beams. The beam-splitting apparatus comprising a plurality of reflective diffraction gratings arranged to receive a radiation beam and configured to form a diffraction pattern comprising a plurality of diffraction orders, at least some of the reflective diffraction gratings being arranged to receive a 0th diffraction order formed at another of the reflective diffraction gratings. The reflective diffraction gratings are arranged such that the optical path of each output radiation beam includes no more than one instance of a diffraction order which is not a 0th diffraction order.
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公开(公告)号：US20190353521A1
公开(公告)日：2019-11-21
申请号：US16525641
申请日：2019-07-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Vadim Yevgenyevich Banine , Gerrit Jacobus Hendrik Brussaard , Willem Jakobus Cornelis Koppert , Otger Jan Luiten , Han-Kwang Nienhuys , Job Beckers , Ruud Martinus Van Der Horst
Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.
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Patent Agency Ranking
公开(公告)号：US10216101B2
公开(公告)日：2019-02-26
申请号：US15525626
申请日：2015-11-04
Applicant: ASML Netherlands B.V.
Inventor： Han-Kwang Nienhuys , Sjoerd Nicolaas Lambertus Donders , Gosse Charles De Vries , Michael Jozef Mathijs Renkens , Erik Roelof Loopstra
Abstract: A reflector (2) comprising a plate (4) supported by a substrate (8), wherein the plate has a reflective surface (5) and is secured to the substrate by adhesive free bonding, and wherein a cooling channel array (10) is provided in the reflector. The channels (16) of the cooling channel array may be formed from open channels in a surface of the substrate, the open channels being closed by the plate to create the channels.
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公开(公告)号：US10168621B2
公开(公告)日：2019-01-01
申请号：US15523938
申请日：2015-11-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Dekkers , Han-Kwang Nienhuys , Michael Jozef Mathijs Renkens
Abstract: An adjustable diffraction grating includes: an optical element and a distortion mechanism. The optical element has an optical surface to receive an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism includes one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.
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公开(公告)号：US09823572B2
公开(公告)日：2017-11-21
申请号：US14900110
申请日：2014-06-17
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Olav Waldemar Vladimir Frijns , Gosse Charles De Vries , Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Rilpho Ludovicus Donker , Han-Kwang Nienhuys , Borgert Kruizinga , Wouter Joep Engelen , Otger Jan Luiten , Johannes Antonius Gerardus Akkermans , Leonardus Adrianus Gerardus Grimminck , Vladimir Litvinenko
IPC: G03B27/42 , G03B27/58 , G03F7/20 , H01S3/09 , G01J1/04 , G02B1/06 , G02B5/20 , G21K1/10 , G02B26/02 , G01J1/26 , G01J1/42 , H05H7/04 , H01S3/00
CPC classification number: G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.
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公开(公告)号：US20150192861A1
公开(公告)日：2015-07-09
申请号：US14419425
申请日：2013-07-30
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Arthur Winfried Eduardus Minnaert , Johannus Elisabeth Hubertus Muitjens , Andrei Mikhailovich Yakunin , Luigi Scaccabarozzi , Hans Joerg Mallmann , Kurstat Bal , Carlo Cornelis Maria Luijten , Han-Kwang Nienhuys , Alexander Marinus Arnoldus Huijberts , Paulus Albertus Maria Gasseling , Pedro Julian Rizo Diago , Maarten Van Kampen , Nicolaas Aldegonda Jan Maria Van Aerle
IPC: G03F7/20
CPC classification number: G03F7/70191 , G03F7/70308 , G03F7/70575 , G21K1/10
Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.
Abstract translation: 公开了一种设置有光谱纯度滤光器的光刻设备，其可以设置在以下一个或多个位置：（a）在照明系统中，（b）与图案形成装置相邻，辐射束中的静态位置或 固定用于与图案形成装置一起运动，（c）在投影系统中，和（d）邻近衬底台。 光谱纯度滤光片优选为由多晶硅，多层材料，碳纳米管材料或石墨烯形成的膜。 膜可以设置有保护性盖层和/或薄金属透明层。
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公开(公告)号：US11353796B2
公开(公告)日：2022-06-07
申请号：US16556603
申请日：2019-08-30
Applicant: ASML Netherlands B.V.
Inventor： Teis Johan Coenen , Han-Kwang Nienhuys , Sandy Claudia Scholz , Sander Bas Roobol
Abstract: Methods and apparatus for determining an intensity profile of a radiation beam. The method comprises providing a diffraction structure, causing a relative movement of the diffraction structure relative to the radiation beam from a first position, wherein the radiation beam does not irradiate the diffraction structure to a second position, wherein the radiation beam irradiates the diffraction structure, measuring, with a radiation detector, diffracted radiation signals produced from a diffraction of the radiation beam by the diffraction structure as the diffraction structure transitions from the first position to the second position or vice versa, and determining an intensity profile of the radiation beam based on the measured diffracted radiation signals.
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