Metrology method and apparatus, computer program and lithographic system

    公开(公告)号:US10369752B2

    公开(公告)日:2019-08-06

    申请号:US15138903

    申请日:2016-04-26

    Abstract: Disclosed are a method, computer program and associated apparatuses for metrology. The method includes acquiring inspection data comprising a plurality of inspection data elements, each inspection data element having been obtained by inspection of a corresponding target structure formed using a lithographic process; and performing an unsupervised cluster analysis on said inspection data, thereby partitioning said inspection data into a plurality of clusters in accordance with a metric. In an embodiment, a cluster representative can be identified for each cluster. The cluster representative may be reconstructed and the reconstruction used to approximate the other members of the cluster.

    ESTIMATION OF DATA IN METROLOGY
    12.
    发明申请

    公开(公告)号:US20190129313A1

    公开(公告)日:2019-05-02

    申请号:US16163751

    申请日:2018-10-18

    Abstract: Methods and apparatus for estimating an unknown value of at least one of a plurality of sets of data, each set of data including a plurality of values indicative of radiation diffracted and/or reflected and/or scattered by one or more features fabricated in or on a substrate, wherein the plurality of sets of data include at least one known value, and wherein at least one of the plurality of sets of data includes an unknown value, the apparatus including a processor to estimate the unknown value of the at least one set of data based on: the known values of the plurality of sets of data, a first condition between two or more values within a set of data of the plurality of sets of data, and a second condition between two or more values being part of different sets of data of the plurality of the sets of data.

Patent Agency Ranking