公开(公告)号：US11556060B2

公开(公告)日：2023-01-17

申请号：US16556637

申请日：2019-08-30

Applicant: ASML Netherlands B.V.

Inventor： Seyed Iman Mossavat ,  Bastiaan Onne Fagginger Auer ,  Remco Dirks ,  Alexandru Onose ,  Hugo Augustinus Joseph Cramer

IPC: G03F7/20 ,  G05B13/02 ,  H01L21/66

Abstract: Methods for calibrating metrology apparatuses and determining a parameter of interest are disclosed. In one arrangement, training data is provided that comprises detected representations of scattered radiation detected by each of plural metrology apparatuses. An encoder encodes each detected representation to provide an encoded representation, and a decoder generates a synthetic detected representation from the respective encoded representation. A classifier estimates from which metrology apparatus originates each encoded representation or each synthetic detected representation. The training data is used to simultaneously perform, in an adversarial relationship relative to each other, a first machine learning process involving the encoder or decoder and a second machine learning process involving the classifier.

公开(公告)号：US20190258177A1

公开(公告)日：2019-08-22

申请号：US16264755

申请日：2019-02-01

Applicant: ASML Netherlands B.V.

Inventor： Hugo Augustinus Joseph CRAMER ,  Seyed Iman Mossavat ,  Paul Christiaan Hinnen

IPC: G03F7/20

Abstract: Disclosed is method of optimizing bandwidth of measurement illumination for a measurement application, and an associated metrology apparatus. The method comprises performing a reference measurement with reference measurement illumination having a reference bandwidth and performing one or more optimization measurements, each of said one or more optimization measurements being performed with measurement illumination having a varied candidate bandwidth. The one or more optimization measurements are compared with the reference measurement; and an optimal bandwidth for the measurement application is selected based on the comparison.

公开(公告)号：US10151985B2

公开(公告)日：2018-12-11

申请号：US15377979

申请日：2016-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Remco Dirks ,  Seyed Iman Mossavat ,  Hugo Augustinus Joseph Cramer

IPC: G03F7/20 ,  G06F17/50

Abstract: A method including determining one or more statistical features from data obtained from a lithography process, a lithography apparatus, a substrate processed by the lithography process or the lithography apparatus, wherein determining the one or more statistical features does not include reconstructing a characteristic of the lithography process, of the lithography apparatus, or of the substrate.

公开(公告)号：US10901323B2

公开(公告)日：2021-01-26

申请号：US16903893

申请日：2020-06-17

Applicant: ASML Netherlands B.V.

Inventor： Hugo Augustinus Joseph Cramer ,  Seyed Iman Mossavat ,  Paul Christiaan Hinnen

IPC: G03F7/20 ,  G02B21/10 ,  G02B21/36 ,  G01N21/27

Abstract: Disclosed is method of optimizing bandwidth of measurement illumination for a measurement application, and an associated metrology apparatus. The method comprises performing a reference measurement with reference measurement illumination having a reference bandwidth and performing one or more optimization measurements, each of said one or more optimization measurements being performed with measurement illumination having a varied candidate bandwidth. The one or more optimization measurements are compared with the reference measurement; and an optimal bandwidth for the measurement application is selected based on the comparison.

公开(公告)号：US10429746B2

公开(公告)日：2019-10-01

申请号：US16163751

申请日：2018-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexandru Onose ,  Seyed Iman Mossavat ,  Thomas Theeuwes

IPC: G03F7/20

Abstract: Methods and apparatus for estimating an unknown value of at least one of a plurality of sets of data, each set of data including a plurality of values indicative of radiation diffracted and/or reflected and/or scattered by one or more features fabricated in or on a substrate, wherein the plurality of sets of data include at least one known value, and wherein at least one of the plurality of sets of data includes an unknown value, the apparatus including a processor to estimate the unknown value of the at least one set of data based on: the known values of the plurality of sets of data, a first condition between two or more values within a set of data of the plurality of sets of data, and a second condition between two or more values being part of different sets of data of the plurality of the sets of data.

公开(公告)号：US10156797B2

公开(公告)日：2018-12-18

申请号：US15114368

申请日：2015-01-22

Applicant: ASML Netherlands B.V.

Inventor： Seyed Iman Mossavat ,  Hugo Augustinus Joseph Cramer ,  Maurits Van Der Schaar

IPC: G03F7/20 ,  G01B11/27

Abstract: A method of determining edge placement error within a structure produced using a lithographic process, the method including: receiving a substrate having a first structure produced using the lithographic process, the first structure having first and second layers, each of the layers having first areas of electrically conducting material and second areas of non-electrically conducting material; receiving a target signal indicative of a first target relative position which is indicative of target position of edges between the first areas and the second areas of the first layer relative to edges between the first areas and second areas of the second layer in the first structure during the lithographic process; detecting scattered radiation while illuminating the first structure with optical radiation to obtain a first signal; and ascertaining an edge placement error parameter on the basis of first signal and the first target relative position.

公开(公告)号：US12204298B2

公开(公告)日：2025-01-21

申请号：US17801980

申请日：2021-02-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Carlo Lancia ,  Anjan Prasad Gantapara ,  Dirk-Jan Kernkamp ,  Seyed Iman Mossavat ,  Alexander Ypma

IPC: G05B13/04

Abstract: A method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method includes obtaining a function including at least a first function of first prediction model parameters associated with the at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.

公开(公告)号：US10996568B2

公开(公告)日：2021-05-04

申请号：US16720411

申请日：2019-12-19

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus Smorenburg ,  Seyed Iman Mossavat ,  Teis Johan Coenen

IPC: G03F7/20 ,  G01N23/201

Abstract: Methods and apparatus for directing onto a substrate a radiation beam emitted as a result of high harmonic generation (HHG). Exemplary apparatus comprising: a drive radiation source; an interaction region configured to receive a medium and positioned such that a drive radiation beam from the drive radiation source interacts with the medium during use to generate the emitted radiation beam by HHG, wherein the emitted radiation beam comprises a plurality of wavelengths and wherein an emission divergence angle of the emitted radiation is wavelength dependent; an optical system downstream of the interaction region and configured to focus the emitted radiation beam, wherein the plurality of wavelengths of the emitted radiation beam are focused at a plurality of focal planes in dependence on the associated emission divergence angle; and a substrate support for holding the substrate at one of a plurality of axial positions relative to the plurality of focal planes, wherein one or more of the drive radiation source, the interaction region, the optical system and the substrate support is configurable to control a relative position of at least one of the focal planes with respect to the substrate.

公开(公告)号：US20170176869A1

公开(公告)日：2017-06-22

申请号：US15377979

申请日：2016-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Remco Dirks ,  Seyed Iman Mossavat ,  Hugo Augustinus Joseph Cramer

IPC: G03F7/20 ,  G06F17/50

CPC classification number: G03F7/70508 ,  G03F7/70533 ,  G03F7/70633 ,  G03F7/70641 ,  G06F17/5081

Abstract: A method including determining one or more statistical features from data obtained from a lithography process, a lithography apparatus, a substrate processed by the lithography process or the lithography apparatus, wherein determining the one or more statistical features does not include reconstructing a characteristic of the lithography process, of the lithography apparatus, or of the substrate.

公开(公告)号：US10732514B2

公开(公告)日：2020-08-04

申请号：US16264755

申请日：2019-02-01

Applicant: ASML Netherlands B.V.

Inventor： Hugo Augustinus Joseph Cramer ,  Seyed Iman Mossavat ,  Paul Christiaan Hinnen

IPC: G03F7/20 ,  G02B21/10 ,  G01N21/27 ,  G02B21/36

Abstract: Disclosed is method of optimizing bandwidth of measurement illumination for a measurement application, and an associated metrology apparatus. The method comprises performing a reference measurement with reference measurement illumination having a reference bandwidth and performing one or more optimization measurements, each of said one or more optimization measurements being performed with measurement illumination having a varied candidate bandwidth. The one or more optimization measurements are compared with the reference measurement; and an optimal bandwidth for the measurement application is selected based on the comparison.