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11.发明公开公开(公告)号：US20240176255A1
公开(公告)日：2024-05-30
申请号：US18284608
申请日：2022-03-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Remco VAN DE MEERENDONK , Daniel Jozef, Maria DIRECKS , Günes NAKÍBOGLU , Nicholas Peter WATERSON , Joost André KLUGKIST , Sven PEKELDER , Antonius Johannus VAN DER NET , Johannes Henricus Wilhelmus JACOBS , Jaap OUDES , Gerardus Arnoldus Hendricus, Franciscus JANSSEN , Jeroen, Peterus Johannes VAN LIPZIG , Johannes, Franciscus Martinus VAN SANTVOORT
IPC: G03F7/00
CPC classification number: G03F7/70891
Abstract: A temperature conditioning system using conditioning liquid to condition a temperature of an object, the system including a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber, wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.
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公开(公告)号：US20180164704A1
公开(公告)日：2018-06-14
申请号：US15856153
申请日：2017-12-28
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70875 , G03F7/707 , G03F7/70716 , G03F7/70783 , G03F7/70816 , G03F7/70891 , G03F7/7095 , H01L21/67103
Abstract: A thermal conditioning unit to thermally condition a substrate in a lithographic apparatus, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member.
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公开(公告)号：US20160109812A1
公开(公告)日：2016-04-21
申请号：US14965467
申请日：2015-12-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Engelbertus Antonius Fransiscus VAN DER PASCH , Joost Jeroen OTTENS , Emiel Jozef Melanie EUSSEN , Johannes Henricus Wilhelmus JACOBS , William Peter VAN DRENT , Frank STAALS , Lukasz Jerzy MACHT , Erik Willem BOGAART
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
Abstract translation: 一种光刻设备，包括基板台位置测量系统和用于分别测量基板台和投影系统的位置的投影系统位置测量系统。 衬底台位置测量系统包括安装在衬底台上的衬底台参考元件和第一传感器头。 衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。 保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。 投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。 传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。
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14.发明申请公开(公告)号：US20160048085A1
公开(公告)日：2016-02-18
申请号：US14882241
申请日：2015-10-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VERMEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPA Y , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
Abstract translation: 描述了一种光刻设备，其具有液体供应系统，其被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件和加热器。
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Patent Agency Ranking
公开(公告)号：US20250021026A1
公开(公告)日：2025-01-16
申请号：US18711842
申请日：2022-11-18
Applicant: ASML Netherlands B.V.
Inventor： William Peter VAN DRENT , Jan Steven Christiaan WESTERLAKEN , Daniel Jozef Maria DIRECKS , Johannes Henricus Wilhelmus JACOBS , Maurice Wilhelmus Leonardus Hendricus FEIJTS , Edwin Johan BUIS , Bart Leonardus KNAPEN , Nicolaas Johannes Wilhelmus REUVERS , Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN
Abstract: The present invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising a first reservoir, a pressurizing system configured to pressurize a hydraulic fluid, and a separating device configured to separate the hydraulic fluid from the liquid target material in the first reservoir and to transfer a pressure from the hydraulic fluid to the liquid target material. The invention also relates to an associated method of supplying liquid target material to a radiation source.
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公开(公告)号：US20210063898A1
公开(公告)日：2021-03-04
申请号：US17098073
申请日：2020-11-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VAN MEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN
IPC: G03F7/20
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
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公开(公告)号：US20190235397A1
公开(公告)日：2019-08-01
申请号：US16376535
申请日：2019-04-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VAN MEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
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公开(公告)号：US20170363964A1
公开(公告)日：2017-12-21
申请号：US15694519
申请日：2017-09-01
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu LAURENT , Johannes Henricus Wilhelmus JACOBS , Haico Victor KOK , Yuri Johannes Gabriël VAN DE VIJVER , Johannes Antonius Maria VAN DE WAL , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Robbert-Jan VOOGD , Jan Steven Christiaan WESTERLAKEN , Johannes Hubertus Antonius VAN DE RIJDT , Allard Eelco KOOIKER , Wilhelmina Margareta Jozef HURKENS-MERTENS , Yohann Bruno Yvon TEILLET
IPC: G03F7/20
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
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公开(公告)号：US20170139333A1
公开(公告)日：2017-05-18
申请号：US15417005
申请日：2017-01-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Johannes Henricus Wilhelmus JACOBS , Hans JANSEN , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Marco Koert STAVENGA , Bob STREEFKERK , Martinus Cornelis Maria VERHAGEN , Lejla SEUNTIENS-GRUDA
CPC classification number: G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
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