摘要:
The present invention provides a method for integrating the fabrication of a sensor and a high voltage devices. The N conductive type sensor has a P conductive type doped region in the substrate of the sensor active region to effectively reduce the leakage at edges of the field oxide. Furthermore, there are the P conductive type field and the P conductive type well used as isolations for the sensor and these isolations can prevent blooming. Between these isolations, high voltage devices can be simultaneously formed thereon.
摘要:
A method for forming high voltage devices compatible with low voltage devices on a semiconductor substrate is provided. A substrate is provided. An oxide layer is formed on the substrate. An N well is formed in the substrate. A P well is formed opposite to the N well in the substrate. A plurality of N-field regions are formed as drift regions in the P well and as isolation regions in the N well. A plurality of P-field regions are formed as drift regions in the N well and as isolation regions in the P well region. A plurality of field oxide regions are formed on the N well and the P well in the substrate. N− type doped regions are formed in the P well through an N-grade implantation, prior to a gate oxide layer and a polysilicon layer formation. An N+ type doped region in the N−type doped region is formed as a source/drain region for an NMOS transistor in the P well. A P+ type doped region is formed as a source/drain region for a PMOS transistor in the N well. The polysilicon layer is formed and defined as a gate on the gate oxide layer across a channel for the NMOS/PMOS transistor and a portion of the field oxide region adjoining thereto.
摘要:
A system and method for detecting a falling state of an electronic device include setting a time interval to collect position information of the electronic device and one or more alarm means, activating a global position system to locate a position of the electronic device, and acquiring position information of the electronic device at each time interval. The system and method further include calculating an acceleration of the electronic device, and activating one or more of the alarm means if the calculated acceleration is larger or equal to the acceleration of gravity.
摘要:
A portable electronic device includes an image capturing unit, a processor unit connected to the image capturing unit, and an alarm unit connected to the processor unit. The image capturing unit captures outside images, the processor unit detects if there is any smoke near the portable electronic device according to the images and measuring relative parameters of detected smoke, and the alarm unit alarms when at least one parameter of detected smoke is out of predetermined acceptable ranges.
摘要:
A mobile phone for preventing a hidden device from secretly taking a photograph or video. The mobile phone includes a signal detecting unit, a processor, an alarm activating system, and an alarm unit. The alarm activating system is operable to output an alarm when a user of the mobile phone is in a danger state of being taken a photograph or video by a hidden device, by providing a parameter setting function, a signal detecting function, a data analyzing function, and an alarm sending function.
摘要:
A pivot structure is used to pivotally connect a first object to a second object includes a pivot hole and a pivot portion. The pivot hole is disposed at the second object, while the pivot portion is disposed at the first object. The pivot portion has a discontinuous ring with an outside diameter lager than an aperture of the pivot hole. The discontinuous ring can be squeezed to be deformed and be inserted into the pivot hole, such that the discontinuous ring tightly bears against the pivot hole to maintain an included angle between the first object and the second object at any time, thereby a user can steplessly adjust the included angle of the two objects.
摘要:
An antenna structure including a ground plate, a hollow bolt, and a conductive conical dome is provided. The hollow bolt passes through the ground plate, and a signal wire is laid in the hollow bolt. An insulator is disposed between the signal wire and the hollow bolt for providing electrical isolation therebetween. The conductive conical dome is connected with one end of the signal wire. The hollow bolt and a nut are provided to fix the antenna on a wall or a ceiling. Since the signal wire is laid in the hollow bolt, the signal wire can be connected to a signal source only by connecting a signal cable to the hollow bolt.
摘要:
A high-voltage semiconductor MOS process that is fully compatible with low-voltage MOS process is provided. The high-voltage N/P well are implanted into the substrate prior to the definition of active areas. The channel stop doping regions are formed after the formation of field oxide layers, thus avoiding lateral diffusion of the channel stop doping regions. In addition, the grade drive-in process used to activate the grade doping regions in the high-voltage device area and the gate oxide growth of the high-voltage devices are performed simultaneously.
摘要:
A method is provided to fabricate a LCOS back plane structure. The present invention utilized a HV device such as HV CMOS transistor (high voltage complementary metal oxide semiconductor transistor) and a HV capacitor layer are applied to the substrate. Furthermore, the HV capacitor layer has a higher dielectric layer and coupling ratio to sustain the higher operating voltage, such that the operating capacitance can be raised. Moreover, the HV CMOS transistor is combined with a mirror layer which has a higher reflective property, such that the LCOS back-plate structure has the better contrast and chrominance output in per area unit, when the operating voltage range is increased.
摘要:
A method for forming complementary metal-oxide semiconductor sensor is disclosed. The method includes the following steps. Firstly, a semiconductor substrate is provided. A first oxide layer is formed on the surface of the semiconductor substrate. A nitride layer is formed on the surface of the first oxide layer. Thus, p-type ions are first implanted into the semiconductor substrate to form a p-type well region. The p-type well region is annealed. The nitride layer is removed. The first oxide layer is removed. The second oxide layer is deposited on the surface of the semiconductor substrate. The p-type ions are secondly implanted into the second p-type well region to form a p-type field. The p-type field is annealed. The n-type ions are thirdly implanted into the semiconductor substrate as an n-type region abutting the oxide layer below. The n+-type ions are fourthly implanted into the n-type region as n+-type regions. The p+-type ions are fifthly implanted into the p-type field as a p+-type region. The n+-type region and the p+-type region are annealed to complete a semiconductor sensor device.