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42 条记录 (耗时 0.033 秒)

    Embossing apparatus and method
    12.
    发明授权
    Embossing apparatus and method 失效
    压花装置及方法

    公开(公告)号：US07690913B2

    公开(公告)日：2010-04-06

    申请号：US11748542

    申请日：2007-05-15

    申请人： Hyoung-Kyu Son

    发明人： Hyoung-Kyu Son

    IPC分类号： A01J21/00

    CPC分类号： B44B5/00

    摘要： An apparatus is provided that forms embossed portions on a workpiece. The apparatus includes a melting chamber filled with melt, such as ceramic, nozzles provided at a lower portion of the melting chamber, and presses provided adjacent to each of the injection nozzles. The injection nozzles drop the melt on the workpiece and the presses press the dropped melt into a predetermined shape of the embossed portions in a state where the dropped melt is being solidified after being dropped on the workpiece.

    摘要翻译： 提供了一种在工件上形成压纹部分的装置。 该装置包括填充有诸如陶瓷的熔体的熔化室，设置在熔化室的下部的喷嘴和与每个喷嘴相邻设置的压力。 注射喷嘴将熔体下降到工件上，并且在落下的熔体在被落下到工件上之后凝固的状态下，压力机将熔融物压入预定形状的压花部分。

    Flat panel display manufacturing apparatus
    17.
    发明授权
    Flat panel display manufacturing apparatus 有权
    平板显示器制造装置

    公开(公告)号：US08273211B2

    公开(公告)日：2012-09-25

    申请号：US12246563

    申请日：2008-10-07

    申请人： Gwang Ho Hur ,  Jun Young Choi ,  Cheol Won Lee ,  Hyun Hwan Ahn ,  Young Joo Hwang ,  Chun Sik Kim

    发明人： Gwang Ho Hur ,  Jun Young Choi ,  Cheol Won Lee ,  Hyun Hwan Ahn ,  Young Joo Hwang ,  Chun Sik Kim

    IPC分类号： H01L21/3065

    CPC分类号： H01J37/3244

    摘要： Disclosed herein is a flat panel display manufacturing apparatus in a predetermined process is performed using plasma generated therein. In such a flat panel display manufacturing apparatus, a process gas is supplied into a chamber in an evenly diffused state to generate even plasma inside a symmetrical interior space of the chamber. Consequently, the flat panel display manufacturing apparatus can appropriately control flow rate of the plasma, thereby being capable of performing even processing on a large-scale substrate. In the flat panel display manufacturing apparatus, a substrate pedestal thereof is provided with a combination of vertical and horizontal shielding members, thereby being entirely protected from attack of the plasma, resulting in an increased life-span.

    摘要翻译： 这里公开了使用其中产生的等离子体进行预定处理的平板显示器制造装置。 在这种平板显示器制造装置中，处理气体以均匀扩散的状态供应到室中，以在室的对称内部空间内产生均匀的等离子体。 因此，平板显示器制造装置可以适当地控制等离子体的流量，从而能够对大规模基板进行均匀的处理。 在平板显示器制造装置中，其基板基座设置有垂直和水平屏蔽构件的组合，从而完全防止等离子体的侵蚀，从而延长使用寿命。

    Apparatus for attaching substrates
    18.
    发明授权
    Apparatus for attaching substrates 失效
    用于安装基板的装置

    公开(公告)号：US08205653B2

    公开(公告)日：2012-06-26

    申请号：US12260652

    申请日：2008-10-29

    申请人： Dong Gun Kim ,  Bong Hwan Choi

    发明人： Dong Gun Kim ,  Bong Hwan Choi

    IPC分类号： B29C65/00 ,  B29C65/08 ,  B32B37/00 ,  B32B38/04 ,  B32B41/00 ,  G05G15/00 ,  B65C9/40 ,  B23K37/00 ,  B30B5/02 ,  B30B5/04 ,  B30B15/34

    CPC分类号： G02F1/133 ,  G02F1/1303 ,  Y10T156/107 ,  Y10T156/1744

    摘要： A substrate bonding apparatus and method are provided. The substrate bonding apparatus may include a first support member that receives a first substrate, a second support member that receives a second substrate opposite the first support member, and a support pin located at the outside of the first substrate fixed to the first support member. The support pin may be connected to the first support member, and a distance adjustment device may move the support pin upward or downward to adjust the distance between the first support member and the second support member.

    摘要翻译： 提供了一种基板接合装置和方法。 基板接合装置可以包括接收第一基板的第一支撑构件，接收与第一支撑构件相对的第二基板的第二支撑构件和位于固定到第一支撑构件的第一基板的外侧的支撑销。 支撑销可以连接到第一支撑构件，并且距离调节装置可以将支撑销向上或向下移动以调节第一支撑构件和第二支撑构件之间的距离。

    Adhesive chuck, and apparatus and method for assembling substrates using the same
    19.
    发明授权
    Adhesive chuck, and apparatus and method for assembling substrates using the same 有权
    粘合剂卡盘，以及使用其组装基板的装置和方法

    公开(公告)号：US07921895B2

    公开(公告)日：2011-04-12

    申请号：US11802915

    申请日：2007-05-25

    申请人： Seok-Hee Shim

    发明人： Seok-Hee Shim

    IPC分类号： B29C65/18 ,  B32B37/14 ,  B23K37/04 ,  H05K3/36

    CPC分类号： H01L21/6831 ,  H01L21/67092 ,  H01L21/6875 ,  Y10S29/90 ,  Y10T29/49126 ,  Y10T29/49133 ,  Y10T29/53265 ,  Y10T279/34

    摘要： An adhesive chuck, and an apparatus and method for assembling substrates using the same are disclosed. The apparatus comprises a chamber, a first adhesive chuck inside the chamber and having a plurality of adhesive protrusions to adhere to a first substrate conveyed from an outside into the chamber via an intermolecular attractive force, and a driving unit to move the first substrate adhered to the first adhesive chuck and a second substrate toward each other to be compressed and assembled to each other. The apparatus can achieve adhesion and separation of a substrate with minimal power consumption, enhancing an operating efficiency. Additionally, the adhesive chuck can overcome a problem of spot generation on a display panel caused by remaining static electricity. Furthermore, since the adhesive chuck is almost free from a problem of electric instability, it can exhibit high stability and efficiency and can be fabricated at lower costs.

    摘要翻译： 公开了一种粘合卡盘，以及用于组装使用其的基板的装置和方法。 该装置包括腔室，腔室内的第一粘合卡盘，并且具有多个粘合突起，以通过分子间吸引力粘附到从外部输送到腔室中的第一基底;以及驱动单元，用于将第一基底粘附到 第一粘合剂卡盘和彼此朝向彼此压缩和组装的第二基板。 该设备可以以最小的功耗实现基板的粘合和分离，从而提高了操作效率。 此外，粘合卡盘可以克服由剩余静电引起的显示面板上的斑点产生的问题。 此外，由于粘合卡盘几乎没有电不稳定性的问题，因此可以表现出高的稳定性和效率，并且可以以较低的成本制造。

    Plasma processing apparatus
    20.
    发明授权
    Plasma processing apparatus 失效
    等离子体处理装置

    公开(公告)号：US07699957B2

    公开(公告)日：2010-04-20

    申请号：US11711612

    申请日：2007-02-28

    申请人： Seoung-Wook Lee ,  Young-Joo Hwang

    发明人： Seoung-Wook Lee ,  Young-Joo Hwang

    IPC分类号： C23F1/00 ,  C23C16/00

    CPC分类号： C23C16/54 ,  C23C16/5096 ,  H01J2237/0206 ,  Y10S156/914 ,  Y10S414/135

    摘要： Disclosed is a plasma processing apparatus, in which parasitic plasma is not generated in a transfer chamber. The plasma processing apparatus has a load lock chamber, a transfer chamber, a processing chamber, and gate valves installed between the chambers for transferring a substrate and opening and closing openings of the chambers. Each of the gate valves includes a valve housing provided between the chambers such that the valve housing contacts side surfaces of the chambers by interposing sealing members therebetween, and forming a designated closed space therein; a valve including a sealing plate contacting an inner surface of the valve housing on the side of the processing chamber, and a back plate contacting the inner surface of the valve housing on the side of the transfer chamber; a valve driving unit connected to the valve for moving the valve in the vertical direction; and a ground member formed on the surface of the valve for electrically connecting the valve and the valve housing when the valve contacts the inner surface of the valve housing.

    摘要翻译： 公开了一种等离子体处理装置，其中在传送室中不产生寄生等离子体。 等离子体处理装置具有装载锁定室，传送室，处理室和安装在用于传送基板的室之间的闸阀和打开和关闭室的开口的闸阀。 每个闸阀包括设置在室之间的阀壳体，使得阀壳体通过在其间插入密封构件而接触室的侧表面，并在其中形成指定的封闭空间; 阀，其包括与处理室侧面上的阀壳体的内表面接触的密封板和在传送室侧面与阀壳体的内表面接触的后板; 连接到阀的阀驱动单元，用于沿垂直方向移动阀; 以及形成在所述阀的表面上的接地构件，用于当所述阀接触所述阀壳体的内表面时电气连接所述阀和所述阀壳体。