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    MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM
    111.
    发明申请
    MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
    多束光束粒子光学系统

    公开(公告)号：US20110068276A1

    公开(公告)日：2011-03-24

    申请号：US12885380

    申请日：2010-09-17

    Applicant: Pieter Kruit ,  Aernout Christiaan Zonnevylle

    Inventor： Pieter Kruit ,  Aernout Christiaan Zonnevylle

    IPC: G21K1/08

    CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/1477 ,  H01J2237/0435 ,  H01J2237/04924 ,  H01J2237/1205

    Abstract: The invention relates to a multiple beam charged particle optical system comprising: a charged particle source for generating a plurality of charged particle beamlets, and charged particle optics for directing the charged particle beamlets from the charged particle source towards a target, wherein each charged particle beamlet defines a beamlet centre line, said charged particle optics comprising one or more electrostatic lens arrays, each comprising two or more array electrodes for generating a plurality of electrostatic lenslets, wherein each lenslet is arranged for focusing a corresponding charged particle beamlet, and wherein each lenslet defines a lenslet optical axis, wherein at least one of said one or more electrostatic lens arrays comprises one or more off-axis electrostatic lenslets, wherein the beamlet centre line of the corresponding charged particle beamlet passes through said off-axis electrostatic lenslet at a distance from its lenslet optical axis.

    Abstract translation: 本发明涉及一种多光束带电粒子光学系统，包括：用于产生多个带电粒子子束的带电粒子源和用于将带电粒子子束从带电粒子源引向靶的带电粒子光学器件，其中每个带电粒子子束 定义了子束中心线，所述带电粒子光学器件包括一个或多个静电透镜阵列，每个静电透镜阵列包括用于产生多个静电小透镜的两个或更多个阵列电极，其中每个小透镜被布置用于聚焦相应的带电粒子子束，并且其中每个小透镜 限定了小透镜光轴，其中所述一个或多个静电透镜阵列中的至少一个包括一个或多个离轴静电小透镜，其中相应带电粒子子束的子束中心线以一定距离穿过离轴静电透镜 从其小透镜光轴。

    ELECTRON EMITTER HAVING NANO-STRUCTURE TIP AND ELECTRON COLUMN USING THE SAME
    112.
    发明申请
    ELECTRON EMITTER HAVING NANO-STRUCTURE TIP AND ELECTRON COLUMN USING THE SAME 审中-公开
    具有纳米结构提示的电子发射器和使用其的电子柱

    公开(公告)号：US20100200766A1

    公开(公告)日：2010-08-12

    申请号：US12670703

    申请日：2008-07-28

    Applicant: Ho Seob Kim

    Inventor： Ho Seob Kim

    IPC: H01J31/00 ,  H01J3/14 ,  H01J3/26 ,  H01J1/02

    CPC classification number: H01J37/065 ,  H01J37/073 ,  H01J2237/0492 ,  H01J2237/06341 ,  H01J2237/1205 ,  H01J2237/28 ,  H01J2237/3175

    Abstract: The present invention relates to an electron emitter having a nanostructure tip and an electron column using the same, and, more particularly, to an electron emitter which includes a nanostructure tip which can easily emit electrons, composed of carbon nanotube (CNT), zinc oxide nanotube (ZnO nanotube), zinc oxide nanorod, zinc oxide nanopillar, zinc oxide nanowire, zinc oxide nanoparticle or the like, and an electron column using the same.

    Abstract translation: 本发明涉及一种具有纳米结构的电子发射体和使用该电子发射体的电子发射体，更具体地说，涉及包含能够容易地发射电子的纳米结构尖端的电子发射体，其由碳纳米管（CNT），氧化锌 纳米管（ZnO纳米管），氧化锌纳米棒，氧化锌纳米柱，氧化锌纳米线，氧化锌纳米颗粒等，以及使用该纳米管的电子柱。

    Apparatus for generating a plurality of beamlets
    113.
    发明授权
    Apparatus for generating a plurality of beamlets 有权
    用于产生多个子束的装置

    公开(公告)号：US07569833B2

    公开(公告)日：2009-08-04

    申请号：US11545976

    申请日：2006-10-10

    Applicant: Pieter Kruit

    Inventor： Pieter Kruit

    IPC: H01J37/147

    CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.

    Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

    MULTI-BEAM SOURCE
    114.
    发明申请
    MULTI-BEAM SOURCE 有权
    多波束源

    公开(公告)号：US20090026389A1

    公开(公告)日：2009-01-29

    申请号：US12178153

    申请日：2008-07-23

    Applicant: Elmar Platzgummer

    Inventor： Elmar Platzgummer

    IPC: A61N5/00

    CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/3045

    Abstract: A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illumination system as seen in the direction of the beam, adapted to form a plurality of telecentric or homocentric beamlets out of the illuminating beam. The beam forming system includes a beam-splitter and an electrical zone device, the electrical zone having a composite electrode composed of a plurality of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.

    Abstract translation: 一种用于产生能量带电粒子的多个子束的多光束源。 多光束源包括产生带电粒子的照明光束的照明系统，以及沿着光束的方向被布置在照明系统之后的束形成系统，适于在多个远心或同心圆的子束之外形成 照明光束。 光束形成系统包括分光器和电区设备，电区具有由多个基本上平面的部分电极组成的复合电极，其适于施加不同的静电电势并因此影响子束。

    CHARGED PARTICLE BEAM APPARATUS
    117.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 审中-公开
    充电颗粒光束装置

    公开(公告)号：US20080067376A1

    公开(公告)日：2008-03-20

    申请号：US11751094

    申请日：2007-05-21

    Applicant: Sayaka Tanimoto ,  Osamu Kamimura ,  Yasunari Sohda ,  Hiroya Ohta

    Inventor： Sayaka Tanimoto ,  Osamu Kamimura ,  Yasunari Sohda ,  Hiroya Ohta

    IPC: G21K7/00

    CPC classification number: H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/24592 ,  H02N13/00

    Abstract: This invention provides a charged particle beam apparatus that can makes reduction in off axis aberration and separate detection of secondary beams to be compatible. The charged particle beam apparatus has: an electron optics that forms a plurality of primary charged particle beams, projects them on a specimen, and makes them scan the specimen with a first deflector; a plurality of detectors that individually detect a plurality of secondary charged particle beams produced from the plurality of locations of the specimen by irradiation of the plurality of primary charged particle beams; and a voltage source for applying a voltage to the specimen. The charged particle beam apparatus further has: a Wien filter for separating paths of the primary charged particle beams and paths of the secondary charged particle beams; a second deflector for deflecting the secondary charged particle beams separated by the Wien filter; and control means for controlling the first deflector and the second deflector in synchronization, wherein the plurality of detectors detect the plurality of secondary charged particle beams separated by the Wien filter individually.

    Abstract translation: 本发明提供了一种带电粒子束装置，其可以减少离轴像差和将次级束的分离检测兼容。 带电粒子束装置具有：形成多个初级带电粒子束的电子光学器件，将它们投射在样本上，并使它们用第一偏转器扫描样本; 多个检测器，通过多个初级带电粒子束的照射，分别检测从样本的多个位置产生的多个次级带电粒子束; 以及用于向样本施加电压的电压源。 带电粒子束装置还具有：维纳滤波器，用于分离初级带电粒子束的路径和二次带电粒子束的路径; 用于偏转由维恩滤波器分离的二次带电粒子束的第二偏转器; 以及用于同步地控制第一偏转器和第二偏转器的控制装置，其中多个检测器分别检测由维恩过滤器分离的多个次级带电粒子束。

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