公开(公告)号：US11328918B2

公开(公告)日：2022-05-10

申请号：US16826243

申请日：2020-03-22

Applicant: SPECS Surface Nano Analysis GmbH

Inventor： Gerd Schoenhense ,  Thorsten Kampen ,  Sven Maehl ,  Oliver Schaff

IPC: H01J49/00 ,  H01J49/06 ,  H01J49/46 ,  H01J37/05 ,  H01J37/04 ,  H01J37/147 ,  H01J37/09 ,  H01J37/10

Abstract: An electron imaging apparatus 100 is disclosed, which is configured for an electron transfer along an electron-optical axis OA of an electron 2 emitting sample 1 to an energy analyzer apparatus 200, and comprises a sample-side first lens group 10, an analyzer-side second lens group 30 and a deflector device 20, configured to deflect the electrons 2 in an exit plane of the electron imaging apparatus 100 in a deflection direction perpendicular to the electron-optical axis OA. An electron spectrometer apparatus, an electron transfer method and an electron spectrometry method are also described.

公开(公告)号：US20220128509A1

公开(公告)日：2022-04-28

申请号：US17570581

申请日：2022-01-07

Applicant: Micromass UK Limited

Inventor： Kevin Giles ,  Steven Derek Pringle ,  Jason Lee Wildgoose

IPC: G01N27/622 ,  H01J49/00 ,  G01N30/72 ,  G01N27/624 ,  H01J49/42 ,  H01J49/28 ,  H01J49/26 ,  H01J37/05 ,  H01J49/02 ,  H01J49/06 ,  H01J49/40

Abstract: An analytical device for analysing ions is provided comprising a separator 2 for separating ions according to a physico-chemical property and an interface 3 comprising one or more ion guides. A quadrupole rod set mass filter 4 is arranged downstream of the interface 3. A control system is arranged and adapted: (i) to transmit a first group of ions which emerges from the separator 2 through the interface 3 with a first transit time t1 and (ii) to transmit a second group of ions which subsequently emerges from the separator 2 through the interface 3with a second different transit time t2.

公开(公告)号：US11255817B2

公开(公告)日：2022-02-22

申请号：US16909796

申请日：2020-06-23

Applicant: Micromass UK Limited

Inventor： Kevin Giles ,  Steven Derek Pringle ,  Jason Lee Wildgoose

IPC: G01N27/622 ,  H01J49/00 ,  G01N30/72 ,  G01N27/624 ,  H01J49/42 ,  H01J49/28 ,  H01J49/26 ,  H01J37/05 ,  H01J49/02 ,  H01J49/06 ,  H01J49/40 ,  G01N15/10 ,  G01N15/00

Abstract: An analytical device for analysing ions is provided comprising a separator 2 for separating ions according to a physico-chemical property and an interface 3 comprising one or more ion guides. A quadrupole rod set mass filter 4 is arranged downstream of the interface 3. A control system is arranged and adapted: (i) to transmit a first group of ions which emerges from the separator 2 through the interface 3 with a first transit time t1; and (ii) to transmit a second group of ions which subsequently emerges from the separator 2 through the interface 3 with a second different transit time t2.

公开(公告)号：US20220037114A1

公开(公告)日：2022-02-03

申请号：US17351842

申请日：2021-06-18

Applicant: Applied Materials, Inc.

Inventor： Thomas Stacy ,  Jay T. Scheuer ,  Eric D. Hermanson ,  Bon-Woong Koo ,  Tseh-Jen Hsieh

IPC: H01J37/301 ,  H01J37/317 ,  H01J37/05

Abstract: A beamline ion implanter and a method of operating a beamline ion implanter. A method may include performing an ion implantation procedure during a first time period on a first set of substrates, in a process chamber of the ion implanter, and performing a first pressure-control routine during a second time period by: introducing a predetermined gas to reach a predetermined pressure into at least a downstream portion of the beam-line for a second time period. The method may include, after completion of the first pressure-control routine, performing the ion implantation procedure on a second set of substrates during a third time period.

公开(公告)号：US11189457B2

公开(公告)日：2021-11-30

申请号：US16646501

申请日：2017-09-29

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Hideo Morishita ,  Toshihide Agemura

IPC: H01J37/28 ,  H01J37/05 ,  H01J37/147 ,  H01J37/14 ,  H01J37/244 ,  H01J37/32

Abstract: Provided is a scanning electron microscope provided with an energy selection and detection function for a SE1 generated on a sample while suppressing the detection amount of a SE3 excited due to a BSE in the scanning electron microscope that does not apply a deceleration method. Provided are: an electron optical system that includes an electron source 21 generating an irradiation electron beam and an objective lens 12 focusing the irradiation electron beam on a sample; a detector 13 that is arranged outside an optical axis of the electron optical system and detects a signal electron generated when the sample is irradiated with the irradiation electron beam; a deflection electrode that forms a deflection field 26 to guide the signal electron to the detector; a disk-shaped electrode 23 that is arranged to be closer to the electron source than the deflection field and has an opening through which the irradiation electron beam passes; and a control electrode arranged along the optical axis to be closer to the sample than the deflection field. The sample and the objective lens are set to a reference potential. A potential lower than the reference potential is applied to the disk-shaped electrode, and a potential higher than the reference potential is applied to the control electrode.

公开(公告)号：US11183358B2

公开(公告)日：2021-11-23

申请号：US17036966

申请日：2020-09-29

Applicant: mi2-factory GmbH

Inventor： Florian Krippendorf ,  Constantin Csato

IPC: H01J37/05 ,  H01J37/317 ,  G21K1/10 ,  G21K1/04 ,  H01J37/147

Abstract: The invention relates to an implantation device, an implantation system and a method. The implantation device includes a filter frame and a filter held by the filter frame, and a collimator structure. The filter is designed to be irradiated by an ion beam passing through the filter. The collimator structure is arranged on the filter, in the transmitted beam downstream of the filter, or on the target substrate.

公开(公告)号：US20210313137A1

公开(公告)日：2021-10-07

申请号：US17353333

申请日：2021-06-21

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert

IPC: H01J37/10 ,  H01J37/244 ,  H01J37/28 ,  H01J37/29 ,  H01J37/05

Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.

公开(公告)号：US20210280387A1

公开(公告)日：2021-09-09

申请号：US17314023

申请日：2021-05-06

Applicant: EL-MULTECHNOLOGIES LTD

Inventor： Dmitry SHUR ,  Eli CHEIFETZ ,  Armin SCHON

IPC: H01J37/244 ,  G02B27/10 ,  H01J37/22 ,  H01J37/05

Abstract: A scintillator assembly including an entrance surface for receiving charged particles into the scintillator assembly, the charged particles including first charged particles at a first energy level and second charged particles at a second energy level. A first scintillator structure configured for receiving the first charged particles and generating a corresponding first signal formed of first photons with a first wavelength of λ1, a second scintillator structure configured for receiving the second charged particles and generating a corresponding second signal of second photons with a second wavelength of λ2, and an emitting surface for egress of a combined signal from the scintillator assembly, the combined signal including the first and second photons, and at least one beam splitter for receiving the combined signal and separating the combined signal to first and second photons.

公开(公告)号：US11101100B2

公开(公告)日：2021-08-24

申请号：US16645511

申请日：2018-08-24

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Toshiyuki Yokosuka ,  Hajime Kawano ,  Kouichi Kurosawa ,  Hideyuki Kazumi ,  Chahn Lee

IPC: H01J37/05 ,  H01J37/28 ,  H01J37/22 ,  H01J37/244

Abstract: The purpose of the present invention is to provide a charged particle ray device which is capable of simply estimating the cross-sectional shape of a pattern. The charged particle ray device according to the present invention acquires a detection signal for each different discrimination condition of an energy discriminator, and estimates the cross-sectional shape of a sample by comparing the detection signal for each discrimination condition with a reference pattern (see FIG. 5).

公开(公告)号：US11094498B2

公开(公告)日：2021-08-17

申请号：US16910270

申请日：2020-06-24

Applicant: JEOL Ltd.

Inventor： Masaki Mukai

IPC: H01J37/05 ,  H01J37/28

Abstract: There is provided a monochromator capable of reducing angular dispersion in electron rays. In the monochromator, a first Wien filter and a second Wien filter are arranged symmetrically with respect to a first plane of symmetry. A third Wien filter and a fourth Wien filter are arranged symmetrically with respect to a second plane of symmetry. A pair of the first and second Wien filters and a pair of the third and fourth Wien filters are arranged symmetrically with respect to a third plane of symmetry. The first through fourth Wien filters produce their respective electromagnetic fields which are identical in sense and strength.