Analyzing system and charged particle beam device
    91.
    发明申请
    Analyzing system and charged particle beam device 有权
    分析系统和带电粒子束装置

    公开(公告)号:US20060226361A1

    公开(公告)日:2006-10-12

    申请号:US11384044

    申请日:2006-03-17

    Abstract: The present invention relates to an analyzing system with improved detection scheme and a charged particle beam device comprising the same. The analyzing system for analyzing a beam of charged particles has a divider to divide the beam of charged particles according to their energies into a low energy beam and a high energy beam; a front detector for detecting the high energy beam; and at least one reverse detector for detecting the low energy beam. The divider is positioned between the front detector and the at least one reverse detector and the front detector and/or the at least one reverse detector are segmented.

    Abstract translation: 本发明涉及具有改进的检测方案的分析系统和包括该分析系统的带电粒子束装置。 用于分析带电粒子束的分析系统具有分隔器,用于将带电粒子束根据其能量分成低能量束和高能量束; 用于检测高能束的前检测器; 以及用于检测低能量束的至少一个反向检测器。 分隔器位于前检测器和至少一个反向检测器之间,并且前分辨器和/或至少一个反向检测器被分段。

    Electron beam apparatus having electron analyzer and method of controlling lenses
    92.
    发明授权
    Electron beam apparatus having electron analyzer and method of controlling lenses 有权
    具有电子分析仪的电子束装置和控制透镜的方法

    公开(公告)号:US07030389B2

    公开(公告)日:2006-04-18

    申请号:US10764136

    申请日:2004-01-23

    Abstract: An electron beam apparatus having an electron analyzer is achieved which can control the illumination lens system by feedback without adversely affecting the imaging action even if a specimen is positioned within the magnetic field of the objective lens. The apparatus has an energy shift control module for controlling energy shift. On receiving instructions about setting of energy shift from the CPU, the control module issues an instruction for shifting the accelerating voltage to a specified value to an accelerating-voltage control module. The control module also sends information about the energy shift to an energy shift feedback control module, which calculates the feedback value and supplies information about corrections of lenses and deflection coils to a TEM optics control module. The feedback value is multiplied by a corrective coefficient that can be calibrated.

    Abstract translation: 实现了具有电子分析器的电子束装置,其可以通过反馈来控制照明透镜系统,而不会对成像动作产生不利影响,即使样本位于物镜的磁场内。 该装置具有用于控制能量偏移的能量转换控制模块。 在接收到关于从CPU设置能量偏移的指令时,控制模块发出用于将加速电压移动到指定值的指令到加速电压控制模块。 控制模块还将能量偏移的信息发送到能量偏移反馈控制模块,该能量偏移反馈控制模块计算反馈值,并将关于透镜和偏转线圈校正的信息提供给TEM光学控制模块。 反馈值乘以可校准的校正系数。

    Apparatus and method for e-beam dark field imaging
    93.
    发明申请
    Apparatus and method for e-beam dark field imaging 有权
    用于电子束暗场成像的装置和方法

    公开(公告)号:US20060060780A1

    公开(公告)日:2006-03-23

    申请号:US10935834

    申请日:2004-09-07

    Abstract: One embodiment disclosed relates to a scanning electron beam apparatus including an objective lens, scan deflectors, de-scan deflectors, an energy-filter drift tube, and a segmented detector. The objective lens may be an immersion lens configured with a high extraction field so as to preserve azimuthal angle discrimination of the electrons scattered from the specimen surface. The de-scan deflectors may be used to compensate for the scanning of the incident electron beam. The energy-filter drift tube is configured to align the scattered electrons according to polar angles of trajectory from the specimen surface.

    Abstract translation: 公开的一个实施例涉及包括物镜,扫描偏转器,去扫描偏转器,能量滤波器漂移管和分段检测器的扫描电子束装置。 物镜可以是配置有高提取场的浸没透镜,以便保留从样本表面散射的电子的方位角鉴别。 去扫描偏转器可以用于补偿入射电子束的扫描。 能量滤波器漂移管被配置为根据来自样品表面的极化轨迹角对准散射电子。

    Dose cup located near bend in final energy filter of serial implanter for closed loop dose control
    94.
    发明申请
    Dose cup located near bend in final energy filter of serial implanter for closed loop dose control 有权
    剂量杯位于串联注射机的最终能量过滤器的弯曲处,用于闭环剂量控制

    公开(公告)号:US20050269526A1

    公开(公告)日:2005-12-08

    申请号:US10860451

    申请日:2004-06-03

    Inventor: Robert Rathmell

    CPC classification number: H01J37/05 H01J37/3171

    Abstract: An ion implantation system having a dose cup located near a final energy bend of a scanned or ribbon-like ion beam of a serial ion implanter for providing an accurate ion current measurement associated with the dose of a workpiece or wafer. The system comprises an ion implanter having an ion beam source for producing a ribbon-like ion beam. The system further comprises an AEF system configured to filter an energy of the ribbon-like ion beam by bending the beam at a final energy bend. The AEF system further comprises an AEF dose cup associated with the AEF system and configured to measure ion beam current, the cup located substantially immediately following the final energy bend. An end station downstream of the AEF system is defined by a chamber wherein a workpiece is secured in place for movement relative to the ribbon-like ion beam for implantation of ions therein. The AEF dose cup is beneficially located up stream of the end station near the final energy bend mitigating pressure variations due to outgassing from implantation operations at the workpiece. Thus, the system provides accurate ion current measurement before such gases can produce substantial quantities of neutral particles in the ion beam, generally without the need for pressure compensation. Such dosimetry measurements may also be used to affect scan velocity to ensure uniform closed loop dose control in the presence of beam current changes from the ion source and outgassing from the workpiece.

    Abstract translation: 离子注入系统,其具有位于串联离子注入机的扫描或带状离子束的最终能量弯曲附近的剂量杯,用于提供与工件或晶片的剂量相关联的准确的离子电流测量。 该系统包括具有用于产生带状离子束的离子束源的离子注入机。 该系统还包括被配置为通过在最终能量弯曲处弯曲光束来过滤带状离子束的能量的AEF系统。 AEF系统还包括与AEF系统相关联并被配置为测量离子束电流的AEF剂量杯,所述杯基本上紧接在最终能量弯曲之后。 AEF系统下游的终端站由一个室定义,其中工件被固定在适当位置以相对于带状离子束移动,用于在其中注入离子。 AEF剂量杯有利地位于终端站的上游,靠近最终能量弯曲,减轻了由于在工件处的植入操作而引起的放气的压力变化。 因此,该系统在这种气体可以在离子束中产生大量的中性粒子之前提供精确的离子电流测量,通常不需要压力补偿。 这样的剂量测量也可用于影响扫描速度,以确保在存在来自离子源的束电流变化和从工件脱气的情况下的均匀闭环剂量控制。

    Particle source with selectable beam current and energy spread
    97.
    发明申请
    Particle source with selectable beam current and energy spread 有权
    粒子源可选择束流和能量传播

    公开(公告)号:US20050178982A1

    公开(公告)日:2005-08-18

    申请号:US11058695

    申请日:2005-02-15

    CPC classification number: H01J37/05 H01J37/09 H01J37/153 H01J37/26

    Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 13 eccentrically through a lens 6. As a result of this, energy dispersion will occur in an image 15 formed by the lens 6. By projecting this image 15 onto a diaphragm 7, it is possible to only allow particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 16 will have a reduced energy spread. By adding a deflection unit 10, this particle beam 16 can be deflected toward the optical axis 2. One can also elect to deflect a beam 12 going through the middle of the lens 6—and having, for example, greater current—toward the optical axis.

    Abstract translation: 本发明描述了发生能量选择的粒子源。 通过透镜6偏心地发送带电粒子13的光束来进行能量选择。其结果是,由透镜6形成的图像15中会发生能量分散。通过将该图像15投影到膜片7上, 可能只允许能谱范围的有限部分的粒子通过。 因此,通过的光束16将具有减小的能量扩展。 通过添加偏转单元10,该粒子束16可以朝向光轴2偏转。还可以选择使穿过透镜6的中部的光束12偏转并具有例如更大的电流朝向光学 轴。

    Electron microscope
    98.
    发明申请
    Electron microscope 审中-公开
    电子显微镜

    公开(公告)号:US20050167589A1

    公开(公告)日:2005-08-04

    申请号:US11091660

    申请日:2005-03-28

    CPC classification number: H01J37/28 H01J37/05 H01J2237/2594

    Abstract: An electron microscope is provided, which enables an observation with high resolution. The electron microscope is able to detect the deviation of an electron beam relative to the opening of a slit quantitatively, thereby shifting the electron beam accurately to the center of the opening of slit so as to execute energy selection. The electron microscope has an energy filter control unit for adjusting a relative position between an electron beam and a slit by shifting the position of electron beam based on a signal delivered by an energy filter electron beam detector. Also a method for controlling an energy filter is provided, which includes the steps of shifting the position of an electron beam, determining the position of electron beam and letting the electron beam pass through the center of an opening of the slit by controlling the position of slit or position of electron beam.

    Abstract translation: 提供了一种能够以高分辨率观察的电子显微镜。 电子显微镜能够定量地检测电子束相对于狭缝的开口的偏离,从而将电子束精确地移动到狭缝的开口的中心,以执行能量选择。 电子显微镜具有能量过滤器控制单元,用于通过基于由能量过滤器电子束检测器传递的信号移位电子束的位置来调节电子束和狭缝之间的相对位置。 还提供了一种用于控制能量滤波器的方法,其包括以下步骤:移动电子束的位置,确定电子束的位置,并且通过控制电子束的位置使电子束通过狭缝的开口的中心 电子束的狭缝或位置。

    Electron beam apparatus
    100.
    发明申请
    Electron beam apparatus 失效
    电子束装置

    公开(公告)号:US20040227081A1

    公开(公告)日:2004-11-18

    申请号:US10875178

    申请日:2004-06-25

    Abstract: An electron beam (4) to be irradiated onto a sample (10) is two-dimensionally scanned by a scanning coil (9), and secondary electrons generated from the sample (10) by the scanning are detected by a secondary electron detector (13). A deflection coil (15) for image shifting is used for electrically deflecting the primary electron beam to shift a field of view for image shift in an arbitrary direction by an arbitrary amount. By the image shift, the primary electron beam (4) to be irradiated onto the sample is energy dispersed to degrade the resolution. However, an EnullB field producer (30) for dispersion control gives the primary electron beam energy dispersion in the opposite direction and having the equal magnitude. Therefore, the energy dispersion produced in the primary electron beam by the image shift is automatically corrected.

    Abstract translation: 通过扫描线圈(9)对被照射在样品(10)上的电子束(4)进行二维扫描,用二次电子检测器(13)检测从样品(10)通过扫描产生的二次电子 )。 用于图像偏移的偏转线圈(15)用于使一次电子束电偏转以使任意方向上的图像偏移的视场移动任意量。 通过图像偏移,待照射到样品上的一次电子束(4)能量分散以降低分辨率。 然而,用于色散控制的ExB场生成器(30)给出相反方向上的一次电子束能量色散并且具有相等的幅度。 因此,通过图像偏移在一次电子束中产生的能量色散被自动校正。

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