知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

211 records (took 0.05 seconds)

    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS
    94.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 审中-公开
    极光紫外线发光装置

    公开(公告)号：US20160370706A1

    公开(公告)日：2016-12-22

    申请号：US15256762

    申请日：2016-09-06

    Applicant: GIGAPHOTON INC.

    Inventor： Naoyoshi IMACHI ,  Osamu WAKABAYASHI

    IPC: G03F7/20

    CPC classification number: G03F7/70033 ,  H05G2/006 ,  H05G2/008

    Abstract: An extreme ultraviolet light generation apparatus may include: a target supply device configured to supply targets from a nozzle; a first illumination device configured to output light having a first characteristic to illuminate targets outputted from the nozzle; a second illumination device configured to output light having a second characteristic different from the first characteristic to illuminate the targets outputted from the nozzle; a first imaging device configured to photograph light reflected off the targets illuminated with the light having the first characteristic; and a second imaging device configured to photograph light reflected off the targets illuminated with the light having the second characteristic.

    Abstract translation: 远紫外线发生装置可以包括：目标供给装置，其构造成从喷嘴供给目标物; 第一照明装置，被配置为输出具有第一特性的光，以照亮从喷嘴输出的目标; 第二照明装置，被配置为输出具有与所述第一特性不同的第二特性的光，以照射从所述喷嘴输出的目标; 第一成像装置，被配置为拍摄由具有第一特征的光照射的目标反射的光; 以及第二成像装置，被配置为拍摄由具有第二特征的光照射的目标反射的光。

    EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM
    95.
    发明申请
    EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM 有权
    EXCIMER激光设备和激光激光系统

    公开(公告)号：US20160322772A1

    公开(公告)日：2016-11-03

    申请号：US15208637

    申请日：2016-07-13

    Applicant: Gigaphoton Inc.

    Inventor： Tooru ABE ,  Takeshi OHTA ,  Hiroaki TSUSHIMA ,  Osamu WAKABAYASHI

    IPC: H01S3/036 ,  H01S3/225 ,  H01S3/134 ,  H01S3/097 ,  H01S3/13

    CPC classification number: H01S3/036 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/10046 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

    Abstract: Problem: to suppress the number of times complete gas replacement in a laser chamber.Solution: this excimer laser apparatus may include a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Then, gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.

    Abstract translation: 解决方案：该准分子激光装置可以包括气体供应单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 将第一激光气体和第二激光气体提供给激光室的内部。 然后，其中气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，并且气体供给单元提供气体供给单元 可以选择性地执行第一激光气体和到激光室内部的第二激光气体和排气单元部分地从激光室内部排出气体。

    EXTREME UV LIGHT GENERATION APPARATUS
    97.
    发明申请
    EXTREME UV LIGHT GENERATION APPARATUS 有权
    极光紫外线发生装置

    公开(公告)号：US20160037616A1

    公开(公告)日：2016-02-04

    申请号：US14879754

    申请日：2015-10-09

    Applicant: Gigaphoton Inc.

    Inventor： Takashi SAITO ,  Fumio IWAMOTO ,  Osamu WAKABAYASHI ,  Takayuki YABU

    IPC: H05G2/00

    CPC classification number: H05G2/008 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006

    Abstract: An extreme ultraviolet light generation apparatus includes a target supplier configured to output a target into a chamber as a droplet, the target generating extreme ultraviolet light when being irradiated with a laser beam in the chamber; a droplet measurement unit configured to measure a parameter for a state of the droplet outputted into the chamber; a pressure regulator configured to regulate a pressure in the target supplier in which the target is accommodated; and a target generation controller configured to control the pressure regulator, based on the parameter measured by the droplet measurement unit.

    Abstract translation: 一种极紫外光发生装置，具备将目标物作为液滴输出到室内的目标供给装置，在所述室内照射激光时产生极紫外光; 液滴测量单元，被配置为测量输出到所述室中的液滴的状态的参数; 压力调节器，被配置为调节所述目标供应器中容纳所述目标的压力; 以及目标产生控制器，其被配置为基于由所述液滴测量单元测量的参数来控制所述压力调节器。

    SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS
    98.
    发明申请
    SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS 审中-公开
    用于产生极光紫外线灯和激光装置的系统和方法

    公开(公告)号：US20150351210A1

    公开(公告)日：2015-12-03

    申请号：US14821442

    申请日：2015-08-07

    Applicant: GIGAPHOTON, INC.

    Inventor： Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

    IPC: H05G2/00 ,  H01S3/10

    CPC classification number: H01S3/10061 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/2308 ,  H01S3/2383 ,  H01S2301/20 ,  H05G2/003 ,  H05G2/008

    Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

    Abstract translation: 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 房间 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。

    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND CONTROL METHOD FOR LASER APPARATUS IN EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    99.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND CONTROL METHOD FOR LASER APPARATUS IN EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 审中-公开
    极光紫外线发光装置的极光紫外线发光装置和激光装置的控制方法

    公开(公告)号：US20150342015A1

    公开(公告)日：2015-11-26

    申请号：US14814983

    申请日：2015-07-31

    Applicant: GIGAPHOTON INC.

    Inventor： Hideyuki HAYASHI ,  Kazuhiro SUZUKI ,  Osamu WAKABAYASHI

    IPC: H05G2/00 ,  H01S3/00

    CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/10015 ,  H01S3/10038 ,  H01S3/2316 ,  H05G2/006

    Abstract: An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range.

    Abstract translation: 极紫外线发生装置可以包括：包含由来自激光装置的脉冲激光束照射的等离子体产生区域的室，被配置为连续地向室内的等离子体产生区域供给多个目标的目标供给装置，目标检测 被配置为检测从目标供给装置输出的目标的单元，以及被配置为控制所述激光装置的激光控制器; 所述激光控制器生成指示所述激光装置所具备的激光装置发射脉冲激光束的发光触发器，并且根据来自所述目标检测部的检测信号将所生成的发光触发信号输出到所述激光装置; 并且所述激光控制器调整所述发光触发器的产生，连续输出到所述激光装置，使得所述发光触发的时间间隔在预定范围内。

    METHOD OF CONTROLLING WAVELENGTH OF LASER BEAM AND LASER APPARATUS
    100.
    发明申请
    METHOD OF CONTROLLING WAVELENGTH OF LASER BEAM AND LASER APPARATUS 有权
    控制激光束和激光装置的波长的方法

    公开(公告)号：US20150340837A1

    公开(公告)日：2015-11-26

    申请号：US14818939

    申请日：2015-08-05

    Applicant: Gigaphoton Inc.

    Inventor： Takashi MATSUNAGA ,  Takahito KUMAZAKI ,  Osamu WAKABAYASHI

    IPC: H01S3/137 ,  H01S3/13

    CPC classification number: H01S3/08004 ,  H01S3/1305 ,  H01S3/137 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2366

    Abstract: There is provided a method of controlling the wavelength of a laser beam. The method includes measuring an absolute wavelength of the laser beam; calculating a difference between a reference wavelength and the absolute wavelength of the laser beam; and adjusting the reference wavelength of the laser beam based on the difference between the reference wavelength and the absolute wavelength of the laser beam, at an interval shorter than an interval for which the absolute wavelength of the laser beam is measured.

    Abstract translation: 提供了一种控制激光束波长的方法。 该方法包括测量激光束的绝对波长; 计算参考波长和激光束的绝对波长之间的差; 并且以比测量激光束的绝对波长的间隔短的间隔，基于激光束的参考波长和绝对波长之间的差来调整激光束的参考波长。

Patent Agency Ranking