公开(公告)号：US10663408B2

公开(公告)日：2020-05-26

申请号：US16524296

申请日：2019-07-29

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Dror Shafir ,  Yanir Hainick ,  Shahar Gov

IPC: G01N21/956 ,  G03F7/20 ,  G01N21/95

Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

公开(公告)号：US10365231B2

公开(公告)日：2019-07-30

申请号：US15866768

申请日：2018-01-10

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Dror Shafir ,  Yanir Hainick ,  Shahar Gov

IPC: G01N21/956 ,  G03F7/20 ,  G01N21/95

Abstract: A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

公开(公告)号：US10054423B2

公开(公告)日：2018-08-21

申请号：US14655791

申请日：2013-12-26

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Dror Shafir ,  Gilad Barak ,  Shay Wolfling

IPC: G01B11/02 ,  G01N21/47 ,  G01N21/956 ,  G02B21/36

CPC classification number: G01B11/02 ,  G01B2210/56 ,  G01N21/4738 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/12 ,  G02B21/365

Abstract: Method and system for measuring one or more parameters of a patterned structure, using light source producing an input beam of at least partially coherent light in spatial and temporal domains, a detection system comprising a position sensitive detector for receiving light and generating measured data indicative thereof, an optical system configured for focusing the input light beam onto a diffraction limited spot on a sample's surface, collecting an output light returned from the illuminated spot, and imaging the collected output light onto a light sensitive surface of the position sensitive detector, where an image being indicative of coherent summation of output light portions propagating from the structure in different directions.

公开(公告)号：US10739277B2

公开(公告)日：2020-08-11

申请号：US16094547

申请日：2016-04-21

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Yoav Berlatzky ,  Valery Deich ,  Dror Shafir ,  Danny Grossman

IPC: G01N21/956 ,  G01N21/88 ,  G01N21/95 ,  G01B9/02

Abstract: A measurement system is presented for use in metrology measurements on patterned samples. The system comprises: at least one light source device configured to generate broadband light, at least one detection device configured to provide spectral information of detected light, and an optical system. The optical system comprises at least an oblique channel system for directing incident light generated by the light source(s) along an oblique illumination channel onto a measurement plane, on which a sample is to be located, and directing broadband light specularly reflected from the sample along a collection channel to the detection device(s). The optical system further comprises an interferometric unit comprising a beam splitting/combining device and a reference reflector device. The beam splitting/combining device is accommodated in the illumination and collection channels and divides light propagating in the illumination channel into sample and reference light beams propagating in sample and reference paths, and combines reflected reference and sample paths into the collection channel to thereby create a spectral interference pattern on a detection plane.

公开(公告)号：US10365163B2

公开(公告)日：2019-07-30

申请号：US16053210

申请日：2018-08-02

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Dror Shafir ,  Danny Grossman

IPC: G01J9/00 ,  G01J9/02 ,  G01B11/02 ,  G01N21/956 ,  G01N21/95 ,  G01N21/21

Abstract: A metrology system is presented for measuring parameters of a structure. The system comprises: an optical system and a control unit. The optical system is configured for detecting light reflection of incident radiation from the structure and generating measured data indicative of angular phase of the detected light components corresponding to reflections of illuminating light components having different angles of incidence. The control unit is configured for receiving and processing the measured data and generating a corresponding phase map indicative of the phase variation along at least two dimensions, and analyzing the phase map using modeled data for determining one or more parameters of the structure.

公开(公告)号：US10161885B2

公开(公告)日：2018-12-25

申请号：US15300768

申请日：2015-04-12

Applicant: Nova Measuring Instruments Ltd.

Inventor： Gilad Barak ,  Danny Grossman ,  Dror Shafir ,  Yoav Berlatzky ,  Yanir Hainick

IPC: G01N21/956 ,  G01N9/02 ,  G01B11/06 ,  G01N21/88 ,  G01B9/02

Abstract: A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

公开(公告)号：US10041838B2

公开(公告)日：2018-08-07

申请号：US15120847

申请日：2015-02-23

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Dror Shafir ,  Danny Grossman

IPC: G01J4/00 ,  G01J9/00 ,  G01J9/02 ,  G01B11/02 ,  G01N21/956 ,  G01N21/95 ,  G01N21/21

Abstract: A metrology system is presented for measuring parameters of a structure. The system comprises: an optical system and a control unit. The optical system is configured for detecting light reflection of incident radiation from the structure and generating measured data indicative of angular phase of the detected light components corresponding to reflections of illuminating light components having different angles of incidence. The control unit is configured for receiving and processing the measured data and generating a corresponding phase map indicative of the phase variation along at least two dimensions, and analyzing the phase map using modeled data for determining one or more parameters of the structure.

公开(公告)号：US11029258B2

公开(公告)日：2021-06-08

申请号：US16231718

申请日：2018-12-24

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Danny Grossman ,  Dror Shafir ,  Yoav Berlatzky ,  Yanir Hainick

IPC: G01N21/956 ,  G01B9/02 ,  G01B11/06 ,  G01N21/88

Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

公开(公告)号：US10311198B2

公开(公告)日：2019-06-04

申请号：US15119306

申请日：2015-02-16

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Tal Verdene ,  Michal Yachini ,  Dror Shafir ,  Changman Moon ,  Shay Wolfling

IPC: G06F17/50 ,  G03F7/20 ,  H01L21/027 ,  H01L21/67 ,  H01L29/66

Abstract: A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range.

公开(公告)号：US10073045B2

公开(公告)日：2018-09-11

申请号：US14416723

申请日：2013-07-24

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Yanir Hainick ,  Dror Shafir

IPC: G01N21/894 ,  G01N21/95 ,  G02B21/00 ,  G02B27/46 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N2021/8848 ,  G01N2201/061 ,  G01N2201/0683 ,  G01N2201/12 ,  G02B21/0016 ,  G02B21/002 ,  G02B21/0092 ,  G02B27/46

Abstract: An optical method and system are presented for use in measurement of isolated features of a structure. According to this technique, Back Focal Plane Microscopy (BFM) measurements are applied to a structure and measured data indicative thereof is obtained, wherein the BFM measurements utilize dark-field detection mode while applying pinhole masking to incident light propagating through an illumination channel towards the structure, the measured data being thereby indicative of a scattering matrix characterizing scattering properties of the structure, enabling identification of one or more isolated features of the structure.