公开(公告)号：US20160245741A1

公开(公告)日：2016-08-25

申请号：US14833370

申请日：2015-08-24

Applicant: KLA-Tencor Corporation

Inventor： Shankar Krishnan ,  Guorong V. Zhuang ,  David Y. Wang ,  Xuefeng Liu

IPC: G01N21/25 ,  G01N21/95 ,  G01J3/02

CPC classification number: G01N21/255 ,  G01J3/0205 ,  G01J3/0208 ,  G01J3/18 ,  G01J3/2803 ,  G01J3/42 ,  G01J2003/425 ,  G01N21/211 ,  G01N21/55 ,  G01N21/9501 ,  G01N2021/213 ,  G01N2201/06113 ,  G01N2201/068

Abstract: Methods and systems for performing broadband spectroscopic metrology with reduced sensitivity to focus errors are presented herein. Significant reductions in sensitivity to focus position error are achieved by imaging the measurement spot onto the detector such that the direction aligned with the plane of incidence on the wafer surface is oriented perpendicular to the direction of wavelength dispersion on the detector surface. This reduction in focus error sensitivity enables reduced focus accuracy and repeatability requirements, faster focus times, and reduced sensitivity to wavelength errors without compromising measurement accuracy. In a further aspect, the dimension of illumination field projected on the wafer plane in the direction perpendicular to the plane of incidence is adjusted to optimize the resulting measurement accuracy and speed based on the nature of target under measurement.

Abstract translation: 本文介绍了对聚焦误差灵敏度降低的宽带光谱测量方法和系统。 通过将测量点成像到检测器上来实现对聚焦位置误差的敏感性的显着降低，使得与晶片表面上的入射平面对准的方向定向为垂直于检测器表面上的波长色散的方向。 聚焦误差灵敏度的降低可以降低聚焦精度和重复性要求，更快的聚焦时间，降低对波长误差的灵敏度，而不会影响测量精度。 在另一方面，调整在垂直于入射平面的方向上投射在晶片平面上的照明场的尺寸，以根据测量目标的性质优化所得到的测量精度和速度。

公开(公告)号：US09719932B1

公开(公告)日：2017-08-01

申请号：US14532971

申请日：2014-11-04

Applicant: KLA-Tencor Corporation

Inventor： Derrick Shaughnessy ,  Michael S. Bakeman ,  Guorong V. Zhuang ,  Andrei V. Shchegrov ,  Leonid Poslavsky

IPC: G01N21/00 ,  G01N21/67 ,  G01N21/95 ,  H01S3/0915

CPC classification number: G01N21/9501 ,  G01N2201/061 ,  G03F7/70616 ,  H01L22/12

Abstract: Methods and systems are described herein for producing high radiance illumination light for use in semiconductor metrology based on a confined, sustained plasma. One or more plasma confining circuits introduce an electric field, a magnetic field, or a combination thereof to spatially confine a sustained plasma. The confinement of the sustained plasma decreases the size of the induced plasma resulting in increased radiance. In addition, plasma confinement may be utilized to shape the plasma to improve light collection and imaging onto the specimen. The induced fields may be static or dynamic. In some embodiments, additional energy is coupled into the confined, sustained plasma to further increase radiance. In some embodiments, the pump energy source employed to sustained the plasma is modulated in combination with the plasma confining circuit to reduce plasma emission noise.

公开(公告)号：US08790603B2

公开(公告)日：2014-07-29

申请号：US13924859

申请日：2013-06-24

Applicant: KLA-Tencor Corporation

Inventor： Guorong V. Zhuang ,  Gildardo Delgado

IPC: B01D7/00 ,  B01D53/00 ,  B01D53/74 ,  F04B53/00 ,  G05D99/00

CPC classification number: B01J19/08 ,  C23C14/14 ,  C23C14/541 ,  F24F3/161 ,  F24F2003/1621

Abstract: An apparatus for purifying a controlled-pressure environment in a chamber, including: a piece of lithium-aluminum alloy located in the chamber; an activation element arranged to impart energy to the piece of lithium-aluminum alloy to sublimate lithium from the piece of lithium-aluminum alloy; a feedback control system including a sensor system arranged to measure a condition within the chamber, and a controller in communication with the sensor and configured to control operation of the activation element according to an evaluation of the condition; and a collection plate located in the chamber and arranged to form a layer of the sublimated lithium on a surface of the collection plate.

Abstract translation: 一种用于净化室内的受控压力环境的装置，包括：位于所述室中的一块锂铝合金; 激活元件，被布置成赋予所述锂铝合金片能量以从所述锂铝合金片升华锂; 反馈控制系统，包括布置成测量所述室内的状况的传感器系统，以及与所述传感器通信并被配置为根据所述条件的评估来控制所述启动元件的操作的控制器; 以及收集板，其位于所述室中并且布置成在所述收集板的表面上形成升华的锂层。

公开(公告)号：US09470639B1

公开(公告)日：2016-10-18

申请号：US15014987

申请日：2016-02-03

Applicant: KLA-Tencor Corporation

Inventor： Guorong V. Zhuang ,  Shankar Krishnan ,  Lanhua Wei ,  Walter Mieher ,  Paul Aoyagi

IPC: G01J4/00 ,  G01N21/95 ,  G01N21/21 ,  G01N21/25

CPC classification number: G01N21/9501 ,  G01B11/0625 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/255 ,  G01N2021/213 ,  G01N2201/06113 ,  G01N2201/0683 ,  G01N2201/12 ,  G03F7/70625

Abstract: Methods and systems for performing broadband spectroscopic metrology with reduced sensitivity to grating anomalies are presented herein. A reduction in sensitivity to grating anomalies is achieved by selecting a subset of available system parameter values for measurement analysis. The reduction in sensitivity to grating anomalies enables an optimization of any combination of precision, sensitivity, accuracy, system matching, and computational effort. These benefits are particularly evident in optical metrology systems having large ranges of available azimuth angle, angle of incidence, illumination wavelength, and illumination polarization. Predictions of grating anomalies are determined based on a measurement model that accurately represents the interaction between the measurement system and the periodic metrology target under measurement. A subset of available system parameter values is selected to reduce the impact of grating anomalies on measurement results. The selected subset of available system parameters is implemented on a configurable spectroscopic metrology system performing measurements.

Abstract translation: 本文介绍了对光栅异常灵敏度降低的宽带光谱测量方法和系统。 通过选择用于测量分析的可用系统参数值的子集来实现对光栅异常的灵敏度的降低。 对光栅异常的灵敏度的降低使得能够优化精度，灵敏度，精度，系统匹配和计算工作的任何组合。 在具有大范围的可用方位角，入射角，照明波长和照明偏振的光学测量系统中，这些益处特别明显。 基于精确表示测量系统和测量周期测量目标之间的相互作用的测量模型，确定光栅异常预测。 选择可用系统参数值的一个子集来减少光栅异常对测量结果的影响。 所选择的可用系统参数的子集在执行测量的可配置光谱计量系统上实现。

公开(公告)号：US09156068B2

公开(公告)日：2015-10-13

申请号：US14482510

申请日：2014-09-10

Applicant: KLA-Tencor Corporation ,  Sandia Corporation

Inventor： Leonard E. Klebanoff ,  Gildardo R. Delgado ,  Jeromy T. Hollenshead ,  Karl R. Umstadter ,  Elena Starodub ,  Guorong V. Zhuang

IPC: H01J49/14 ,  H01J49/24 ,  B08B7/00 ,  G03F7/20

CPC classification number: B08B7/0057 ,  G03F1/84 ,  G03F7/70925

Abstract: An optical instrument, including a chamber, an object exposed to an interior of the chamber, a source of low-pressure gas, the gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen and a low-pressure noble gas, the source of low pressure gas being fluidly coupled to the chamber, a low voltage source electrically coupled between the object and a remaining portion of the instrument that is exposed to the interior of the chamber so as to maintain the object at a low voltage relative to the remaining portion, and an EUV/VUV light source adapted to direct EUV/VUV light through the low pressure gas in the chamber onto the object. In such a system, when the EUV/VUV light source is activated ions of the low-pressure gas are formed and directed to the object. The ions may be ions of Hydrogen, Oxygen or a noble gas.

Abstract translation: 一种光学仪器，包括室，暴露于室内的物体，低压气体源，气体包括低压分子氢气，低压分子氧和低压中的至少一种 惰性气体，低压气体源流体耦合到腔室，低压源电耦合在物体与仪器的剩余部分之间，暴露于腔室的内部，以将物体保持在低位 相对于其余部分的电压以及EUV / VUV光源，其适于将EUV / VUV光通过室内的低压气体引导到物体上。 在这种系统中，当EUV / VUV光源被激活时，低压气体的离子被形成并被引导到物体。 离子可以是氢，氧或惰性气体的离子。

公开(公告)号：US20150110249A1

公开(公告)日：2015-04-23

申请号：US14515322

申请日：2014-10-15

Applicant: KLA-Tencor Corporation

Inventor： Michael S. Bakeman ,  Andrei V. Shchegrov ,  Ady Levy ,  Guorong V. Zhuang ,  John J. Hench

IPC: G01N23/201 ,  G01N33/00

CPC classification number: G01N23/201 ,  G01N2033/0095

Abstract: Disclosed are apparatus and methods for performing small angle x-ray scattering metrology. This system includes an x-ray source for generating x-rays and illumination optics for collecting and reflecting or refracting a portion of the generated x-rays towards a particular focus point on a semiconductor sample in the form of a plurality of incident beams at a plurality of different angles of incidence (AOIs). The system further includes a sensor for collecting output x-ray beams that are scattered from the sample in response to the incident beams on the sample at the different AOIs and a controller configured for controlling operation of the x-ray source and illumination optics and receiving the output x-rays beams and generating an image from such output x-rays.

Abstract translation: 公开了用于执行小角度X射线散射测量的装置和方法。 该系统包括用于产生X射线的X射线源和照明光学器件，用于收集并折射所产生的X射线的一部分朝着半导体样本上的特定聚焦点以多个入射光束的形式反射或折射 多个不同的入射角（AOI）。 该系统还包括传感器，用于响应于在不同AOI处的样品上的入射光束而从样品收集输出的X射线束，以及控制器，被配置为控制X射线源和照明光学器件的接收和接收 输出x射线束并从这样的输出x射线产生图像。

公开(公告)号：US20140374619A1

公开(公告)日：2014-12-25

申请号：US14482510

申请日：2014-09-10

Applicant: KLA-Tencor Corporation ,  Sandia Corporation

Inventor： Leonard E. Klebanoff ,  Gildardo R. Delgado ,  Jeromy T. Hollenshead ,  Karl R. Umstadter ,  Elena Starodub ,  Guorong V. Zhuang

IPC: B08B7/00

CPC classification number: B08B7/0057 ,  G03F1/84 ,  G03F7/70925

Abstract: An optical instrument, including a chamber, an object exposed to an interior of the chamber, a source of low-pressure gas, the gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen and a low-pressure noble gas, the source of low pressure gas being fluidly coupled to the chamber, a low voltage source electrically coupled between the object and a remaining portion of the instrument that is exposed to the interior of the chamber so as to maintain the object at a low voltage relative to the remaining portion, and an EUV/VUV light source adapted to direct EUV/VUV light through the low pressure gas in the chamber onto the object. In such a system, when the EUV/VUV light source is activated ions of the low-pressure gas are formed and directed to the object. The ions may be ions of Hydrogen, Oxygen or a noble gas.

Abstract translation: 一种光学仪器，包括室，暴露于室内的物体，低压气体源，气体包括低压分子氢气，低压分子氧和低压中的至少一种 惰性气体，低压气体源流体耦合到腔室，低压源电耦合在物体与仪器的剩余部分之间，暴露于腔室的内部，以将物体保持在低位 相对于其余部分的电压以及EUV / VUV光源，其适于将EUV / VUV光通过室内的低压气体引导到物体上。 在这种系统中，当EUV / VUV光源被激活时，低压气体的离子被形成并被引导到物体。 离子可以是氢，氧或惰性气体的离子。

公开(公告)号：US09693439B1

公开(公告)日：2017-06-27

申请号：US14304329

申请日：2014-06-13

Applicant: KLA-Tencor Corporation

Inventor： Guorong V. Zhuang ,  Michael S. Bakeman ,  Andrei V. Shchegrov ,  Jonathan M. Madsen

IPC: H05G2/00 ,  G01N23/201

CPC classification number: H05G2/005 ,  G01N23/201 ,  G21K1/06 ,  H01J35/08 ,  H01J35/14 ,  H01J2235/082 ,  H05G2/008

Abstract: Methods and systems for realizing a high brightness liquid metal droplet based x-ray source suitable for high throughput x-ray metrology are presented herein. A high power laser bombards a solid target material to generate liquid metal droplets. The laser generated liquid metal droplets are excited with a focused, high power excitation beam such as an electron or laser beam. The excitation beam is synchronized with the stream of liquid metal droplets stimulated by the high power laser to achieve a stable x-ray emission generated by the excited liquid metal droplets. In some embodiments, x-ray optics are designed to efficiently collect and focus radiation within a desired emission band onto a measurement target. Reliability is improved by shielding the excitation source and the x-ray optics from the region of interaction between the excitation beam and the liquid metal droplet anode by a localized curtain of shielding gas.

公开(公告)号：US20140004025A1

公开(公告)日：2014-01-02

申请号：US13924859

申请日：2013-06-24

Applicant: KLA-Tencor Corporation

Inventor： Guorong V. Zhuang ,  Gildardo Delgado

IPC: B01J19/08

CPC classification number: B01J19/08 ,  C23C14/14 ,  C23C14/541 ,  F24F3/161 ,  F24F2003/1621

Abstract: An apparatus for purifying a controlled-pressure environment in a chamber, including: a piece of lithium-aluminum alloy located in the chamber; an activation element arranged to impart energy to the piece of lithium-aluminum alloy to sublimate lithium from the piece of lithium-aluminum alloy; a feedback control system including a sensor system arranged to measure a condition within the chamber, and a controller in communication with the sensor and configured to control operation of the activation element according to an evaluation of the condition; and a collection plate located in the chamber and arranged to form a layer of the sublimated lithium on a surface of the collection plate.

Abstract translation: 一种用于净化室内的受控压力环境的装置，包括：位于所述室中的一块锂铝合金; 激活元件，被布置成赋予所述锂铝合金片能量以从所述锂铝合金片升华锂; 反馈控制系统，包括布置成测量所述室内的状况的传感器系统，以及与所述传感器通信并被配置为根据所述条件的评估来控制所述启动元件的操作的控制器; 以及收集板，其位于所述室中并且布置成在所述收集板的表面上形成升华的锂层。

公开(公告)号：US10006865B1

公开(公告)日：2018-06-26

申请号：US15640961

申请日：2017-07-03

Applicant: KLA-Tencor Corporation

Inventor： Derrick Shaughnessy ,  Michael S. Bakeman ,  Guorong V. Zhuang ,  Andrei V. Shchegrov ,  Leonid Poslavsky

IPC: G01N21/55 ,  G01N21/67 ,  H01S3/0915 ,  G01N21/95

CPC classification number: G01N21/9501 ,  G01N2201/061 ,  G03F7/70616 ,  H01L22/12

Abstract: Methods and systems are described herein for producing high radiance illumination light for use in semiconductor metrology based on a confined, sustained plasma. One or more plasma confining circuits introduce an electric field, a magnetic field, or a combination thereof to spatially confine a sustained plasma. The confinement of the sustained plasma decreases the size of the induced plasma resulting in increased radiance. In addition, plasma confinement may be utilized to shape the plasma to improve light collection and imaging onto the specimen. The induced fields may be static or dynamic. In some embodiments, additional energy is coupled into the confined, sustained plasma to further increase radiance. In some embodiments, the pump energy source employed to sustained the plasma is modulated in combination with the plasma confining circuit to reduce plasma emission noise.