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公开(公告)号：US10739276B2
公开(公告)日：2020-08-11
申请号：US15828938
申请日：2017-12-01
Applicant: KLA-Tencor Corporation
Inventor： Donald Pettibone , Daniel Ivanov Kavaldjiev , Chuanyong Huang , Qing Li , Frank Li , Zhiwei Xu
Abstract: Stray and air scattered light can be reduced by configuring a size of the collection area of a sensor, which reduces a source of sensitivity-limiting noise in the system. By adjusting a size of the collection area, stray deep ultraviolet light and air-scattered deep ultraviolet light can be reduced. A servo can control a position of an illumination spot that is collected by the time delay and integration sensor.
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公开(公告)号：US20140268118A1
公开(公告)日：2014-09-18
申请号：US13834662
申请日：2013-03-15
Applicant: KLA-TENCOR CORPORATION
Inventor： Zhiwei Xu , Christian Wolters , Juergen Reich , Bret Whiteside , Guoheng Zhao , Jijen Vazhaeparambil , Stephen Biellak , Sam Shamouilian , Mehdi Vaez-Iravani
IPC: G01N21/95
CPC classification number: G01N21/9501 , G01N21/956
Abstract: The disclosure is directed to a system and method for inspecting a spinning sample by substantially simultaneously scanning multiple spots on a surface of the sample utilizing a plurality of illumination beams. Portions of illumination reflected, scattered, or radiated from respective spots on the surface of the sample are collected by at least one detector array. Information associated with at least one defect of the sample is determined by at least one computing system in communication with the detector array. According to various embodiments, at least one of scan pitch, spot size, spot separation, and spin rate is controlled to compensate pitch error due to tangential spot separation.
Abstract translation: 本公开涉及一种用于通过基本上同时使用多个照明光束扫描样品表面上的多个点来检查纺丝样品的系统和方法。 通过至少一个检测器阵列收集从样品表面上的各个点反射，散射或辐射的照射部分。 与样品的至少一个缺陷相关联的信息由与检测器阵列通信的至少一个计算系统确定。 根据各种实施例，控制扫描间距，光斑尺寸，光点分离和旋转速率中的至少一个以补偿由于切点分离引起的俯仰误差。
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公开(公告)号：US11016024B2
公开(公告)日：2021-05-25
申请号：US16279395
申请日：2019-02-19
Applicant: KLA-Tencor Corporation
Abstract: An inspection system utilizing an air scatter standard includes one or more illumination sources to generate a beam of illumination, illumination optics configured to focus the beam of illumination into a volume of air contained within a chamber of an inspection chamber, one or more collection optics configured to collect a portion of illumination scattered from the volume of air, a detector configured to receive the collected portion of illumination from the one or more collection optics, a controller including one or more processors, communicatively coupled to the detector, configured to execute a set of program instructions to receive one or more signals from the detector and determine a state of the beam of illumination at one or more times based on a comparison between at least one of the intensity or polarization of the illumination scattered from the volume of air and a predetermine air scatter standard.
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公开(公告)号：US20190137411A1
公开(公告)日：2019-05-09
申请号：US15828938
申请日：2017-12-01
Applicant: KLA-Tencor Corporation
Inventor： Donald Pettibone , Daniel Ivanov Kavaldjiev , Chuanyong Huang , Qing Li , Frank Li , Zhiwei Xu
Abstract: Stray and air scattered light can be reduced by configuring a size of the collection area of a sensor, which reduces a source of sensitivity-limiting noise in the system. By adjusting a size of the collection area, stray deep ultraviolet light and air-scattered deep ultraviolet light can be reduced. A servo can control a position of an illumination spot that is collected by the time delay and integration sensor.
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公开(公告)号：US09182358B2
公开(公告)日：2015-11-10
申请号：US13834662
申请日：2013-03-15
Applicant: KLA-Tencor Corporation
Inventor： Zhiwei Xu , Christian Wolters , Juergen Reich , Bret Whiteside , Guoheng Zhao , Jijen Vazhaeparambil , Stephen Biellak , Sam Shamouilian , Mehdi Vaez-Iravani
IPC: G01N21/00 , G01N21/95 , G01N21/956
CPC classification number: G01N21/9501 , G01N21/956
Abstract: The disclosure is directed to a system and method for inspecting a spinning sample by substantially simultaneously scanning multiple spots on a surface of the sample utilizing a plurality of illumination beams. Portions of illumination reflected, scattered, or radiated from respective spots on the surface of the sample are collected by at least one detector array. Information associated with at least one defect of the sample is determined by at least one computing system in communication with the detector array. According to various embodiments, at least one of scan pitch, spot size, spot separation, and spin rate is controlled to compensate pitch error due to tangential spot separation.
Abstract translation: 本公开涉及一种用于通过基本上同时使用多个照明光束扫描样品表面上的多个点来检查纺丝样品的系统和方法。 通过至少一个检测器阵列收集从样品表面上的各个点反射，散射或辐射的照射部分。 与样品的至少一个缺陷相关联的信息由与检测器阵列通信的至少一个计算系统确定。 根据各种实施例，控制扫描间距，光斑尺寸，光点分离和旋转速率中的至少一个以补偿由于切点分离引起的俯仰误差。
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Patent Agency Ranking
公开(公告)号：US20140118729A1
公开(公告)日：2014-05-01
申请号：US13662626
申请日：2012-10-29
Applicant: KLA-Tencor Corporation
Inventor： Christian Wolters , Aleksey Petrenko , Kurt L. Haller , Juergen Reich , Zhiwei Xu , Stephen Biellak , George J. Kren
IPC: G01N21/95
CPC classification number: G01N21/8806 , F21V23/003 , G01N21/9501 , G01N2021/8835
Abstract: The disclosure is directed to a system and method of managing illumination energy applied to illuminated portions of a scanned wafer to mitigate illumination-induced damage without unnecessarily compromising SNR of an inspection system. The wafer may be rotated at a selected spin frequency for scanning wafer defects utilizing the inspection system. Illumination energy may be varied over at least one scanned region of the wafer as a function of radial distance of an illuminated portion from the center of the wafer and the selected spin frequency of the wafer. Illumination energy may be further applied constantly over one or more scanned regions of the wafer beyond a selected distance from the center of the wafer.
Abstract translation: 本公开涉及一种管理照射能量的系统和方法，所述照明能量施加到被扫描的晶片的照明部分，以减轻照射诱发的损伤，而不会不必要地损害检查系统的信噪比。 可以以选定的旋转频率旋转晶片，以利用检查系统扫描晶片缺陷。 照射能量可以在晶片的至少一个扫描区域上作为照射部分离晶片中心的径向距离和晶片的选定旋转频率的函数而变化。 照明能量可以进一步在晶片的一个或多个扫描区域上恒定地超过距离晶片中心的选定距离。
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公开(公告)号：US10732424B2
公开(公告)日：2020-08-04
申请号：US16258543
申请日：2019-01-26
Applicant: KLA-Tencor Corporation
Inventor： Zhiwei Xu , Chunsheng Huang , Qing Li
Abstract: A beam shaper for an optical inspection tool includes a focal lens to focus an optical beam onto a target at an oblique angle of incidence and a phase modulator to substantially flatten a top of the optical beam in the plane of the target when the optical beam is focused onto the target at the oblique angle of incidence.
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公开(公告)号：US20190250414A1
公开(公告)日：2019-08-15
申请号：US16258543
申请日：2019-01-26
Applicant: KLA-Tencor Corporation
Inventor： Zhiwei Xu , Chunsheng Huang , Qing Li
Abstract: A beam shaper for an optical inspection tool includes a focal lens to focus an optical beam onto a target at an oblique angle of incidence and a phase modulator to substantially flatten a top of the optical beam in the plane of the target when the optical beam is focused onto the target at the oblique angle of incidence.
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公开(公告)号：US08786850B2
公开(公告)日：2014-07-22
申请号：US13662626
申请日：2012-10-29
Applicant: KLA-Tencor Corporation
Inventor： Christian Wolters , Aleksey Petrenko , Kurt L. Haller , Juergen Reich , Zhiwei Xu , Stephen Biellak , George Kren
CPC classification number: G01N21/8806 , F21V23/003 , G01N21/9501 , G01N2021/8835
Abstract: The disclosure is directed to a system and method of managing illumination energy applied to illuminated portions of a scanned wafer to mitigate illumination-induced damage without unnecessarily compromising SNR of an inspection system. The wafer may be rotated at a selected spin frequency for scanning wafer defects utilizing the inspection system. Illumination energy may be varied over at least one scanned region of the wafer as a function of radial distance of an illuminated portion from the center of the wafer and the selected spin frequency of the wafer. Illumination energy may be further applied constantly over one or more scanned regions of the wafer beyond a selected distance from the center of the wafer.
Abstract translation: 本公开涉及一种管理照射能量的系统和方法，所述照明能量施加到被扫描的晶片的照明部分，以减轻照射诱发的损伤，而不会不必要地损害检查系统的信噪比。 可以以选定的旋转频率旋转晶片，以利用检查系统扫描晶片缺陷。 照射能量可以在晶片的至少一个扫描区域上作为照射部分离晶片中心的径向距离和晶片的选定旋转频率的函数而变化。 照明能量可以进一步在晶片的一个或多个扫描区域上恒定地超过距离晶片中心的选定距离。
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公开(公告)号：US20200264099A1
公开(公告)日：2020-08-20
申请号：US16279395
申请日：2019-02-19
Applicant: KLA-Tencor Corporation
Abstract: An inspection system utilizing an air scatter standard includes one or more illumination sources to generate a beam of illumination, illumination optics configured to focus the beam of illumination into a volume of air contained within a chamber of an inspection chamber, one or more collection optics configured to collect a portion of illumination scattered from the volume of air, a detector configured to receive the collected portion of illumination from the one or more collection optics, a controller including one or more processors, communicatively coupled to the detector, configured to execute a set of program instructions to receive one or more signals from the detector and determine a state of the beam of illumination at one or more times based on a comparison between at least one of the intensity or polarization of the illumination scattered from the volume of air and a predetermine air scatter standard.
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