公开(公告)号：US09921050B2

公开(公告)日：2018-03-20

申请号：US15098008

申请日：2016-04-13

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew V. Hill ,  Ohad Bachar ,  Avi Abramov ,  Daria Negri

IPC: G02B27/10 ,  G01B11/02 ,  G01N21/55 ,  G02B6/02 ,  G02B26/00 ,  G02B27/14 ,  G02B26/02 ,  F21V5/02 ,  F21V5/04 ,  F21V9/10 ,  F21V14/08 ,  G02B5/18 ,  G02B5/20 ,  F21V8/00 ,  G02B26/04 ,  G02B26/08 ,  G02B6/35 ,  G02B6/42

CPC classification number: G01B11/02 ,  F21V5/02 ,  F21V5/04 ,  F21V9/40 ,  F21V14/08 ,  G01N21/55 ,  G02B5/18 ,  G02B5/205 ,  G02B6/0005 ,  G02B6/02 ,  G02B6/3512 ,  G02B6/4215 ,  G02B26/008 ,  G02B26/023 ,  G02B26/04 ,  G02B26/0816 ,  G02B27/1026 ,  G02B27/141 ,  G02B27/146

Abstract: The disclosure is directed to a system and method of controlling spectral attributes of illumination. According to various embodiments, a portion of illumination including an excluded selection of illumination spectra is blocked, while another portion of the illumination including a transmitted selection of illumination spectra is directed along an illumination path. In some embodiments, optical metrology is performed utilizing the spectrally controlled illumination to enhance measurement capability. For instance, the spectral attributes of illumination utilized to analyze different portions of a sample, such as different semiconductor layers, may be selected according to certain measurement characteristics associated with the analyzed portions of the sample.

公开(公告)号：US20160305766A1

公开(公告)日：2016-10-20

申请号：US15098008

申请日：2016-04-13

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew V. Hill ,  Ohad Bachar ,  Avi Abramov ,  Daria Negri

IPC: G01B11/02 ,  F21V5/02 ,  F21V9/10 ,  F21V14/08 ,  F21V8/00 ,  G01N21/55 ,  G02B26/08 ,  G02B26/04 ,  G02B26/00 ,  G02B27/14 ,  G02B5/20 ,  F21V5/04 ,  G02B5/18

CPC classification number: G01B11/02 ,  F21V5/02 ,  F21V5/04 ,  F21V9/40 ,  F21V14/08 ,  G01N21/55 ,  G02B5/18 ,  G02B5/205 ,  G02B6/0005 ,  G02B6/02 ,  G02B6/3512 ,  G02B6/4215 ,  G02B26/008 ,  G02B26/023 ,  G02B26/04 ,  G02B26/0816 ,  G02B27/1026 ,  G02B27/141 ,  G02B27/146

Abstract: The disclosure is directed to a system and method of controlling spectral attributes of illumination. According to various embodiments, a portion of illumination including an excluded selection of illumination spectra is blocked, while another portion of the illumination including a transmitted selection of illumination spectra is directed along an illumination path. In some embodiments, optical metrology is performed utilizing the spectrally controlled illumination to enhance measurement capability. For instance, the spectral attributes of illumination utilized to analyze different portions of a sample, such as different semiconductor layers, may be selected according to certain measurement characteristics associated with the analyzed portions of the sample.

Abstract translation: 本公开涉及一种控制照明的光谱属性的系统和方法。 根据各种实施例，包括排除的照明光谱选择的照明部分被阻挡，而包括发射的照明光谱选择的照明的另一部分沿着照明路径被引导。 在一些实施例中，利用光谱控制的照明来执行光学测量以增强测量能力。 例如，可以根据与样本的分析部分相关联的某些测量特性来选择用于分析样本的不同部分（例如不同半导体层）的照明的光谱属性。

公开(公告)号：US20140168650A1

公开(公告)日：2014-06-19

申请号：US13945352

申请日：2013-07-18

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew V. Hill ,  Ohad Bachar ,  Avi Abramov ,  Daria Negri

IPC: F21V11/04 ,  F21V7/00 ,  F21V9/10 ,  F21V11/08 ,  G01N21/59 ,  F21V9/00 ,  G02B6/02 ,  G01N21/47 ,  G01N21/55 ,  F21V5/02 ,  G02B27/14

CPC classification number: G01B11/02 ,  F21V5/02 ,  F21V5/04 ,  F21V9/40 ,  F21V14/08 ,  G01N21/55 ,  G02B5/18 ,  G02B5/205 ,  G02B6/0005 ,  G02B6/02 ,  G02B6/3512 ,  G02B6/4215 ,  G02B26/008 ,  G02B26/023 ,  G02B26/04 ,  G02B26/0816 ,  G02B27/1026 ,  G02B27/141 ,  G02B27/146

Abstract: The disclosure is directed to a system and method of controlling spectral attributes of illumination. According to various embodiments, a portion of illumination including an excluded selection of illumination spectra is blocked, while another portion of the illumination including a transmitted selection of illumination spectra is directed along an illumination path. In some embodiments, optical metrology is performed utilizing the spectrally controlled illumination to enhance measurement capability. For instance, the spectral attributes of illumination utilized to analyze different portions of a sample, such as different semiconductor layers, may be selected according to certain measurement characteristics associated with the analyzed portions of the sample.

Abstract translation: 本公开涉及一种控制照明的光谱属性的系统和方法。 根据各种实施例，包括排除的照明光谱选择的照明部分被阻挡，而包括发射的照明光谱选择的照明的另一部分沿着照明路径被引导。 在一些实施例中，利用光谱控制的照明来执行光学测量以增强测量能力。 例如，可以根据与样本的分析部分相关联的某些测量特性来选择用于分析样本的不同部分（例如不同半导体层）的照明的光谱属性。

公开(公告)号：US20140111791A1

公开(公告)日：2014-04-24

申请号：US14057827

申请日：2013-10-18

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Ohad Bachar ,  Daria Negri ,  Boris Golovanevsky ,  Barak Bringoltz ,  Daniel Kandel ,  Yoel Feler ,  Noam Sapiens ,  Paykin Irina ,  Alexander Svizher ,  Meir Aloni ,  Guy Ben Dov ,  Hadar Shalmoni ,  Vladimir Levinski

IPC: G01B9/02

CPC classification number: G01B9/0209 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02087 ,  G01N21/45

Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.

Abstract translation: 提供了系统和方法，其从在目标光束和参考光束之间的多个相位差处拍摄的产生干涉测量图像的干涉测量图像中导出目标特征。 目标和参考物的照明具有小于30微米的相干长度，以使得能够通过照明的相干长度扫描相位。 在瞳孔平面和/或场平面中拍摄干涉测量图像，以组合表征和校正目标地形的角度和光谱散射数据，并增强计量系统的性能。

公开(公告)号：US20180292326A1

公开(公告)日：2018-10-11

申请号：US15608766

申请日：2017-05-30

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Daria Negri ,  Andrew V. Hill ,  Ohad Bachar ,  Vladimir Levinski ,  Yuri Paskover

IPC: G01N21/88 ,  G01B11/27 ,  G01N21/33 ,  G01N21/3563 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01B11/0633 ,  G01B11/272 ,  G01B2210/56 ,  G01N21/33 ,  G01N21/3563 ,  G01N21/8422 ,  G01N21/9505 ,  G01N21/956 ,  G01N2021/8438 ,  G01N2021/8845 ,  G01N2201/06113 ,  G03F7/70633

Abstract: A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumination device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers.

公开(公告)号：US20180157784A1

公开(公告)日：2018-06-07

申请号：US15502950

申请日：2016-11-04

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Levinski ,  Eitan Hajaj ,  Tal Itzkovich ,  Sharon Aharon ,  Michael E. Adel ,  Yuri Paskover ,  Daria Negri ,  Yuval Lubashevsky ,  Amnon Manassen ,  Myungjun Lee ,  Mark D. Smith

IPC: G06F17/50 ,  G03F7/20

Abstract: Metrology targets and target design methods are provided, in which target elements are defined by replacing elements from a periodic pattern having a pitch p, by assist elements having at least one geometric difference from the replaced elements, to form a composite periodic structure that maintains the pitch p as a single pitch. Constructing targets within the bounds of compatibility with advanced multiple patterning techniques improves the fidelity of the targets and fill factor modulation enables adjustment of the targets to produce sufficient metrology sensitivity for extracting the overlay while achieving process compatibility of the targets.

公开(公告)号：US20130229661A1

公开(公告)日：2013-09-05

申请号：US13865104

申请日：2013-04-17

Applicant: KLA-TENCOR CORPORATION

Inventor： Daniel Kandel ,  Vladimir Levinski ,  Alexander Svizher ,  Joel Seligson ,  Andrew Hill ,  Ohad Bachar ,  Amnon Manassen ,  Yung-Ho Alex Chuang ,  Ilan Sela ,  Moshe Markowitz ,  Daria Negri ,  Efraim Rotem

IPC: G01N21/47

CPC classification number: G01N21/47 ,  G01B11/02 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/4792 ,  G01N2201/06113 ,  G01N2201/105 ,  G03F7/70625 ,  G03F7/70633

Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.

公开(公告)号：US10579768B2

公开(公告)日：2020-03-03

申请号：US15502950

申请日：2016-11-04

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Levinski ,  Eitan Hajaj ,  Tal Itzkovich ,  Sharon Aharon ,  Michael E. Adel ,  Yuri Paskover ,  Daria Negri ,  Yuval Lubashevsky ,  Amnon Manassen ,  Myungjun Lee ,  Mark D. Smith

IPC: G06F17/50 ,  H01L21/027 ,  G03F7/20

Abstract: Metrology targets and target design methods are provided, in which target elements are defined by replacing elements from a periodic pattern having a pitch p, by assist elements having at least one geometric difference from the replaced elements, to form a composite periodic structure that maintains the pitch p as a single pitch. Constructing targets within the bounds of compatibility with advanced multiple patterning techniques improves the fidelity of the targets and fill factor modulation enables adjustment of the targets to produce sufficient metrology sensitivity for extracting the overlay while achieving process compatibility of the targets.

公开(公告)号：US10190979B2

公开(公告)日：2019-01-29

申请号：US14928514

申请日：2015-10-30

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Yuri Paskover ,  Barry Loevsky ,  Daria Negri

IPC: G01N21/47 ,  G03F7/20 ,  G06F17/50

Abstract: Metrology targets, design files, and design and production methods thereof are provided. Metrology targets comprising at least one reflection-symmetric pair of reflection-asymmetric structures are disclosed. The structures may or may not be periodic, may comprise a plurality of unevenly-spaced target elements, which may or may not be segmented. The asymmetry may be with respect to target element segmentation or structural dimensions. Also, target design files and metrology measurements of the various metrology targets are disclosed.

公开(公告)号：US09581430B2

公开(公告)日：2017-02-28

申请号：US14057827

申请日：2013-10-18

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Ohad Bachar ,  Daria Negri ,  Boris Golovanevsky ,  Barak Bringoltz ,  Daniel Kandel ,  Yoel Feler ,  Noam Sapiens ,  Paykin Irina ,  Alexander Svizher ,  Meir Aloni ,  Guy Ben Dov ,  Hadar Shalmoni ,  Vladimir Levinski

IPC: G01B9/02 ,  G01N21/45

CPC classification number: G01B9/0209 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02087 ,  G01N21/45

Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.

Abstract translation: 提供了系统和方法，其从在目标光束和参考光束之间的多个相位差处拍摄的产生干涉测量图像的干涉测量图像中导出目标特征。 目标和参考物的照明具有小于30微米的相干长度，以使得能够通过照明的相干长度扫描相位。 在瞳孔平面和/或场平面中拍摄干涉测量图像，以组合表征和校正目标地形的角度和光谱散射数据，并增强计量系统的性能。