公开(公告)号：US09882343B2

公开(公告)日：2018-01-30

申请号：US15486323

申请日：2017-04-13

Applicant: Gigaphoton Inc.

Inventor： Masato Moriya ,  Takeshi Ohta ,  Keisuke Ishida ,  Takashi Kusama

IPC: H01S3/13 ,  H01S3/081 ,  H01S3/082 ,  H01S3/08 ,  H01S3/137 ,  G01J3/28 ,  H01S3/134 ,  H01S3/225

CPC classification number: H01S3/13 ,  G01J1/0425 ,  G01J1/0474 ,  G01J3/28 ,  G01J9/0246 ,  G01J2009/0257 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0811 ,  H01S3/0823 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/2251 ,  H01S3/2256

Abstract: A narrow band laser apparatus may include: a laser resonator; a pair of discharge electrodes; a power supply; a first wavelength measurement device configured to output a first measurement result; a second wavelength measurement device configured to output a second measurement result; and a control unit. The control unit calibrates the first measurement result, based on a difference between the second measurement result derived when the control unit controls the power supply to apply a pulsed voltage to the pair of discharge electrodes with a first repetition frequency and the second measurement result derived when the control unit controls the power supply to apply the pulsed voltage to the pair of discharge electrodes with a second repetition frequency, the second repetition frequency being higher than the first repetition frequency.

公开(公告)号：US11271361B2

公开(公告)日：2022-03-08

申请号：US16849618

申请日：2020-04-15

Applicant: Gigaphoton Inc.

Inventor： Keisuke Ishida ,  Satoshi Komuro ,  Hiroshi Furusato

IPC: G03F7/20 ,  H01S3/134 ,  H01S3/036 ,  H01S3/097 ,  H01S3/13 ,  H01S3/038 ,  H01S3/225

Abstract: An excimer laser apparatus according to the present disclosure includes a chamber configured to accommodate a laser gas and a pair of electrodes and generate pulse-oscillating laser light when the gas pressure of the laser gas is controlled in accordance with voltage applied between the pair of electrodes, a power supply configured to apply the voltage between the pair of electrodes, and a controller to which a target value of the spectral linewidth of the laser light is inputted, the controller configured to correct the voltage used to control the gas pressure, when the target value changes from a first target value to a second target value, based on a first function having the second target value as a parameter and control the gas pressure in accordance with the corrected voltage.

公开(公告)号：US10741991B2

公开(公告)日：2020-08-11

申请号：US15973896

申请日：2018-05-08

Applicant: Gigaphoton Inc.

Inventor： Takahito Kumazaki ,  Keisuke Ishida ,  Hiroshi Furusato

IPC: H01S3/137 ,  G01J3/28 ,  G03F7/20 ,  G01J3/02 ,  G01J3/26 ,  G01J3/10 ,  H01S3/034 ,  H01S3/08 ,  H01S3/10 ,  H01S3/23 ,  H01S3/225 ,  H01S3/00 ,  H01S3/106

Abstract: A narrowband laser apparatus may be provided with a laser resonator including optical elements for narrowing a spectral linewidth, a spectrometer configured to detect spectral intensity distributions of multiple pulses included in a pulsed laser beam output from the laser resonator, a spectral waveform producer configured to produce a spectral waveform by adding up the spectral intensity distributions of the multiple pulses, a device function storage configured to store a device function of the spectrometer, a wavelength frequency function generator configured to generate a wavelength frequency function which represents a frequency distribution of center wavelengths of the multiple pulses, and a deconvolution processor configured to perform deconvolution processing on the spectral waveform with the device function and the wavelength frequency function.

公开(公告)号：US11695248B2

公开(公告)日：2023-07-04

申请号：US17665087

申请日：2022-02-04

Applicant: Gigaphoton Inc.

Inventor： Keisuke Ishida

IPC: H01S3/134 ,  H01S3/102 ,  H01S3/094 ,  H01S3/10

CPC classification number: H01S3/1024 ,  H01S3/094076 ,  H01S3/10015

Abstract: A laser device may include a laser resonator; a chamber arranged on an optical path of the laser resonator; a pair of electrodes arranged in the chamber; a power source applying a voltage to the electrodes; a storage unit storing a voltage value; and a control unit configured to set an application voltage value of the voltage applied to the electrodes as setting the application voltage value for outputting a pulse whose pulse number is equal to or larger than 1 and smaller than i based on the voltage command value and the voltage value stored in the storage unit, and setting the application voltage for outputting a pulse whose pulse number is equal to or larger than i and smaller than j based on the voltage command value and an offset value corresponding to the voltage command value, where i>1 and j>i.

公开(公告)号：US11079686B2

公开(公告)日：2021-08-03

申请号：US16871758

申请日：2020-05-11

Applicant: Gigaphoton Inc.

Inventor： Keisuke Ishida ,  Masato Moriya ,  Natsuhiko Kouno ,  Takeshi Asayama ,  Takashi Kusama

IPC: G03F7/20 ,  G01J3/26 ,  H01S3/036 ,  H01S3/104 ,  H01S3/225

Abstract: An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.