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公开(公告)号：US11320740B2
公开(公告)日：2022-05-03
申请号：US17228000
申请日：2021-04-12
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Yutaka Shiraishi , Toshihiro Nishisaka , Hiroshi Someya , Yukio Watanabe
IPC: G03F7/20 , H05G2/00 , H01L21/027
Abstract: A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.
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公开(公告)号：US08811438B2
公开(公告)日：2014-08-19
申请号：US13936734
申请日：2013-07-08
Applicant: Gigaphoton Inc.
Inventor： Yukio Watanabe , Hideyuki Hayashi , Kouji Kakizaki , Michio Shinozaki , Hideo Hoshino
CPC classification number: H01S3/0407 , F25B2400/06 , F25D17/02 , H01S3/03 , H01S3/041 , H01S3/22
Abstract: A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
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公开(公告)号：US08787413B2
公开(公告)日：2014-07-22
申请号：US13936819
申请日：2013-07-08
Applicant: Gigaphoton Inc.
Inventor： Yukio Watanabe , Hideyuki Hayashi , Kouji Kakizaki , Michio Shinozaki , Hideo Hoshino
IPC: H01S3/04
CPC classification number: H01S3/0407 , F25B2400/06 , F25D17/02 , H01S3/03 , H01S3/041 , H01S3/22
Abstract: A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
Abstract translation: 一种用于气体激光器的温度控制器，其控制多个温度控制装置的温度，包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分 与第一温度控制部分相比，第一温度控制部分与低温或高温的温度控制相比，包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂 温度控制部分，产生冷却剂的第二温度控制部分或用于调节每个第二温度控制部分的温度的加热剂，将第一温度控制部分和第一温度控制部分并联连接的第一管道系统， 以及连接第二回火的第二管道系统 所述控制部分和每个第二温度控制部分并联。
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公开(公告)号：US08779402B2
公开(公告)日：2014-07-15
申请号：US13675790
申请日：2012-11-13
Applicant: Gigaphoton Inc.
Inventor： Takayuki Yabu , Yukio Watanabe , Toshihiro Nishisaka , Hiroshi Someya , Osamu Wakabayashi
IPC: G21K5/00
CPC classification number: B05B17/0607 , B05B12/082
Abstract: A target supply device includes a target supply device body including a nozzle having a through-hole through which a target material is discharged, a piezoelectric member having first and second surfaces and connected to the target supply device body at the first surface, the piezoelectric member being configured such that a distance between the first and second surfaces changes in according with an externally supplied electric signal, an elastic member having first and second ends and connected to the second surface of the piezoelectric member at the first end, the elastic member being configured such that a distance between the first and second ends extends or contract in accordance with an externally applied force, and a regulating member configured to regulate a distance between the second end of the elastic member and the target supply device body.
Abstract translation: 目标供给装置包括目标供给装置主体，具有喷嘴，喷嘴具有目标材料排出的通孔，具有第一表面和第二表面并在第一表面连接到目标供给装置主体的压电部件，压电部件 被构造为使得第一和第二表面之间的距离根据外部供应的电信号而变化，弹性构件具有第一端和第二端并且在第一端处连接到压电构件的第二表面，弹性构件被构造成 使得第一和第二端之间的距离根据外部施加的力而延伸或收缩;以及调节构件，其构造成调节弹性构件的第二端和目标供给装置主体之间的距离。
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公开(公告)号：US09332625B2
公开(公告)日：2016-05-03
申请号：US14707990
申请日：2015-05-08
Applicant: GIGAPHOTON INC.
Inventor： Toshihiro Nishisaka , Yukio Watanabe , Osamu Wakabayashi , Kouji Kakizaki , Michio Shinozaki
CPC classification number: G03F7/70033 , G03F7/70975 , H05G2/00 , H05G2/003 , H05G2/008
Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
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Patent Agency Ranking
公开(公告)号：US09198273B2
公开(公告)日：2015-11-24
申请号：US14339172
申请日：2014-07-23
Applicant: GIGAPHOTON INC.
Inventor： Miwa Igarashi , Yukio Watanabe , Kouji Ashikawa , Norio Iwai , Osamu Wakabayashi
Abstract: An apparatus for generating extreme ultraviolet light may include a reference member, a chamber fixed to the reference member, the chamber including at least one window, a laser beam introduction optical system configured to introduce an externally supplied laser beam into the chamber through the at least one window, and a positioning mechanism configured to position the laser beam introduction optical system to the reference member.
Abstract translation: 用于产生极紫外光的装置可以包括参考构件，固定到参考构件的腔室，所述腔室包括至少一个窗口，激光束引入光学系统，其配置成通过至少一个外部供应的激光束 一个窗口，以及配置成将激光束引入光学系统定位到参考构件的定位机构。
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公开(公告)号：US11428892B2
公开(公告)日：2022-08-30
申请号：US17003284
申请日：2020-08-26
Applicant: Gigaphoton Inc.
Inventor： Hiroshi Someya , Yukio Watanabe
Abstract: An optical apparatus may include a housing having an opened front face, an optical unit freely movable into and out of an internal space of the housing through the front face, and a positioning portion disposed on a back side of the optical unit in the internal space. A base plate of the optical unit may include first and second convex portions disposed on a base end face of the base plate. The second convex portion may be disposed at a position different from the first convex portion in a width direction of the base plate. The positioning portion may include a V block having a V groove shape at a part contacting the first convex portion, and a flat block having a flat surface shape at a part contacting the second convex portion. The optical unit may be positioned in the internal space through the contact.
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公开(公告)号：US09882334B2
公开(公告)日：2018-01-30
申请号：US15201769
申请日：2016-07-05
Applicant: Gigaphoton Inc.
Inventor： Toru Suzuki , Yukio Watanabe , Miwa Igarashi , Osamu Wakabayashi
IPC: H01S3/00 , G02B7/182 , H05G2/00 , H01S3/10 , G02B7/18 , G02B27/14 , G02B26/06 , H01S3/223 , H01S3/23
CPC classification number: H01S3/0071 , G02B7/1815 , G02B7/182 , G02B26/06 , G02B27/144 , H01S3/005 , H01S3/1003 , H01S3/2232 , H01S3/2316 , H05G2/003 , H05G2/008
Abstract: A mirror device may include: an optical element configured to reflect part of a laser beam and transmit the other part of the laser beam therethrough; and a holder in surface contact with the optical element to hold the optical element. A flatness of a contact surface of the holder in contact with the optical element may be equal to or smaller than a flatness of the optical element.
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公开(公告)号：US10481354B2
公开(公告)日：2019-11-19
申请号：US16055243
申请日：2018-08-06
Applicant: Gigaphoton Inc.
Inventor： Yukio Watanabe , Hiroshi Someya , Yuki Kawashima , Yuto Tanaka
Abstract: An optical unit and an optical path tube are easily connected. A structure of connection between a side surface (1a) of the optical unit and the optical path tube includes: an extensible tube (72) constituting at least a part of the optical path tube, the extensible tube being extensible in a tube axis direction; a flange (26) attached to one end of the optical path tube; a flange receiving part (20) provided on the optical unit, the flange receiving part (20) receiving a front surface (26a) of the flange (26), the front surface (26a) of the flange (26) being an end surface on an open side; and a biasing part (23, 72) configured to bias at least a part of the optical path tube in a direction in which the extensible tube (72) extends.
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公开(公告)号：US09894743B2
公开(公告)日：2018-02-13
申请号：US14984458
申请日：2015-12-30
Applicant: GIGAPHOTON INC.
Inventor： Yukio Watanabe , Miwa Igarashi , Masato Moriya , Hiroaki Nakarai
CPC classification number: H05G2/008 , G03F7/70033 , H05G2/003
Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.
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