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公开(公告)号：US11050213B2
公开(公告)日：2021-06-29
申请号：US16910846
申请日：2020-06-24
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
IPC分类号： G03F7/20 , H01S3/13 , H01S3/036 , H01S3/23 , H01S3/097 , H01S3/038 , H01S3/137 , G01J1/02 , H01S3/225 , H01S3/1055 , G01J1/42
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US09762023B2
公开(公告)日：2017-09-12
申请号：US14976829
申请日：2015-12-21
申请人： CYMER, LLC , ASML NETHERLANDS B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
CPC分类号： G01J11/00 , G01J1/0228 , G01J1/0448 , G01J1/4257 , G03F7/70041 , G03F7/70516 , G03F7/7055 , G03F7/70558 , G03F7/70575 , H01S3/0014 , H01S3/10046 , H01S3/10069
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US20200321746A1
公开(公告)日：2020-10-08
申请号：US16910846
申请日：2020-06-24
申请人： Cymer, LLC , ASML Netherlands B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US10727642B2
公开(公告)日：2020-07-28
申请号：US15700754
申请日：2017-09-11
申请人： Cymer, LLC , ASML NETHERLANDS B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
IPC分类号： G03F7/20 , H01S3/13 , H01S3/036 , H01S3/23 , H01S3/097 , H01S3/038 , H01S3/137 , G01J1/02 , H01S3/225 , H01S3/1055 , G01J1/42
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US20180006425A1
公开(公告)日：2018-01-04
申请号：US15700754
申请日：2017-09-11
申请人： Cymer, LLC , ASML NETHERLANDS B.V.
发明人： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
CPC分类号： H01S3/1305 , G01J1/0228 , G01J1/4257 , G03F7/70041 , G03F7/70516 , G03F7/7055 , G03F7/70558 , G03F7/70575 , H01S3/036 , H01S3/0385 , H01S3/09702 , H01S3/1055 , H01S3/137 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2308 , H01S3/2333
摘要： Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US20230040812A1
公开(公告)日：2023-02-09
申请号：US17971103
申请日：2022-10-21
申请人： Cymer, LLC
摘要： A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.
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公开(公告)号：US11526083B2
公开(公告)日：2022-12-13
申请号：US16980467
申请日：2019-03-01
申请人： Cymer, LLC
摘要： A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.
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公开(公告)号：US11768438B2
公开(公告)日：2023-09-26
申请号：US17971103
申请日：2022-10-21
申请人： Cymer, LLC
CPC分类号： G03F7/70041 , G03F7/70575 , H01S3/073 , H01S3/08009 , H01S3/11 , H01S3/1305 , H01S3/137 , H01S3/2308
摘要： A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.
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公开(公告)号：US20210018846A1
公开(公告)日：2021-01-21
申请号：US16980467
申请日：2019-03-01
申请人： Cymer, LLC
摘要： A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.
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