- 专利标题: Power semiconductor device
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申请号: US13846624申请日: 2013-03-18
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公开(公告)号: US09620631B2公开(公告)日: 2017-04-11
- 发明人: Tomoko Matsudai , Tsuneo Ogura , Yuichi Oshino , Hideaki Ninomiya , Kazutoshi Nakamura
- 申请人: KABUSHIKI KAISHA TOSHIBA
- 申请人地址: JP Tokyo
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Tokyo
- 代理机构: Holtz, Holtz & Volek PC
- 优先权: JP2012-200858 20120912
- 主分类号: H01L29/739
- IPC分类号: H01L29/739 ; H01L29/66 ; H01L29/02 ; H01L29/78 ; H01L29/40 ; H01L29/47 ; H01L29/08 ; H01L29/868 ; H01L29/06 ; H01L29/36
摘要:
A power semiconductor device includes a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type, a pair of conductive bodies, a third semiconductor layer of the second conductivity type, and a fourth semiconductor layer of the first conductivity type. The second semiconductor layer is provided on the first semiconductor layer on the first surface side. The pair of conductive bodies are provided via an insulating film in a pair of first trenches extending across the second semiconductor layer from a surface of the second semiconductor layer to the first semiconductor layer. The third semiconductor layer is selectively formed on the surface of the second semiconductor layer between the pair of conductive bodies and has a higher second conductivity type impurity concentration in a surface of the third semiconductor layer than the second semiconductor layer.
公开/授权文献
- US20140070266A1 POWER SEMICONDUCTOR DEVICE 公开/授权日:2014-03-13
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