Invention Publication
- Patent Title: Layout pattern of static random access memory
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Application No.: US17583225Application Date: 2022-01-25
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Publication No.: US20230207648A1Publication Date: 2023-06-29
- Inventor: Chun-Hsien Huang , Yu-Tse Kuo , Shu-Ru Wang , Chien-Hung Chen , Li-Ping Huang , Chun-Yen Tseng
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu City
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu City
- Priority: CN 2111588319.7 2021.12.23
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L27/11 ; G11C11/412 ; G11C5/06 ; H01L29/78

Abstract:
The present invention provides a layout pattern of static random access memory, comprising a PU1 (first pull-up transistor), a PU2 (second pull-up transistor), a PD1A (first pull-down transistor), a PD1B (second pull-down transistor), a PD2A (third pull-down transistor), a PD2B (fourth pull-down transistor), a PG1A (first access transistor), a PG1B (second access transistor), a PG2A (third access transistor) and a PG2B (fourth access transistor) located on the substrate. The PD1A and the PD1B are connected in parallel with each other, the PD2A and the PD2B are connected in parallel with each other, wherein the gate structures include a first J-shaped gate structure, and the first J-shaped gate structure is an integrally formed structure.
Public/Granted literature
- US12148809B2 Layout pattern of static random access memory Public/Granted day:2024-11-19
Information query
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