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公开(公告)号:US20240344001A1
公开(公告)日:2024-10-17
申请号:US18617223
申请日:2024-03-26
申请人: Henkel AG & Co. KGaA
CPC分类号: C11D17/042 , C11D1/29 , C11D1/722 , C11D3/044 , C11D3/30 , C11D3/33 , C11D3/42 , C11D3/43 , C11D2111/12
摘要: The present disclosure provides a unit dose product comprising a pouch formed from a water-soluble film material; and a detergent composition comprising about 5 to about 20 wt % water, about 35 to about 65 wt % of at least one surfactant, at least one amino acid or a salt thereof, a base, and a non-aqueous solvent, wherein the detergent composition is disposed within the pouch. The composition can further comprise additional components, such as an anti-redeposition agent, an enzyme, a bleaching agent, a bleach activator, a chelating agent, an additional chlorine scavenger, a biocide, an optical brightener, a bitterant, a corrosion inhibitor, or a combination thereof. The detergent composition in the unit dose product can scavenge chlorine to a concentration of 0 ppm in less than about 60 sec after contact with a 1 L water sample comprising up to 4 ppm chlorine.
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公开(公告)号:US20240337948A1
公开(公告)日:2024-10-10
申请号:US18744751
申请日:2024-06-17
发明人: HYOJIN YUN , SEUNGWON KIM , TAEYOUNG KIM , WOOJUNG PARK , JINHYE BAE , HYUNSEOP SHIN , MINTAE LEE , HOON HAN , MOONYOUNG KIM , MOONCHANG KIM , CHEOLMO YANG , YUNSEOK CHOI
CPC分类号: G03F7/425 , B08B3/04 , C11D3/044 , H01L21/0206
摘要: A photoresist-removing composition includes a polar organic solvent, an alkyl ammonium hydroxide, an aliphatic amine not including a hydroxy group, and a monovalent alcohol. To manufacture a semiconductor device, a photoresist pattern may be formed on a substrate, and the photoresist-removing composition may then be applied to the photoresist pattern. To manufacture a semiconductor package, a photoresist pattern including a plurality of via holes may be formed on a substrate. A plurality of conductive posts including a metal may be formed inside the plurality of via holes, and the photoresist pattern may be removed by applying a photoresist-removing composition of the inventive concept to the photoresist pattern. A semiconductor chip may be adhered to the substrate between the respective conductive posts.
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公开(公告)号:US12110477B2
公开(公告)日:2024-10-08
申请号:US17278013
申请日:2019-09-20
申请人: MIX 14 LTD.
发明人: Gary Townley
IPC分类号: C11D1/00 , C11D1/72 , C11D3/04 , C11D3/18 , C11D3/20 , C11D3/26 , C11D3/30 , C11D3/382 , C11D3/43 , C11D3/50 , C11D17/04
CPC分类号: C11D3/044 , C11D1/721 , C11D3/185 , C11D3/2079 , C11D3/30 , C11D3/382 , C11D3/43 , C11D17/046 , C11D2111/12
摘要: A water-based stain removal formulation, comprising: a lye solution comprising an inorganic hydroxide base; an oil mixture comprising one or more surfactants, an orange extract and an organic base; and an acid mixture comprising acetic acid and a thickener. Methods of manufacture of a water-based stain removal formulation, use of a water-based stain removal formulation, and an applicator for a water-based stain removal formulation are also described.
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公开(公告)号:US12102095B2
公开(公告)日:2024-10-01
申请号:US18308295
申请日:2023-04-27
CPC分类号: A22B5/0082 , A01N43/66 , C11D1/04 , C11D3/044 , C11D3/323 , C11D3/48 , C11D2111/10
摘要: Compositions and methods for cleaning and decontaminating animal carcasses are disclosed. The compositions comprise a mud ball remover having a thioglycolate salt and a base and an antimicrobial agent effective to remove mud balls and reduce microbial contamination of a hide surface at ambient temperatures. The methods comprise cleaning and decontaminating an animal carcass by applying the disclosed compositions onto the surface of the animal carcass to soften and loosen foreign debris attached to the carcass followed by mechanically removing the foreign debris while preserving the integrity and quality of the hide byproduct and resulting leather articles.
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公开(公告)号:US20240309576A1
公开(公告)日:2024-09-19
申请号:US18677435
申请日:2024-05-29
申请人: Omni Solutions LLC
发明人: Andrew Rupnow
CPC分类号: D06F35/001 , C11D3/04 , C11D3/044 , C11D17/00 , D06F39/022 , C11D2111/12 , D06F33/37 , D06F2103/22
摘要: An ozone and/or hydroxyl laundry system that injects ozone and/or hydroxyls into the chemical injection system in order to allow the system to inject ozone and/or hydroxyls as other cleaning chemicals are injected into the washer. This allows ozone and/or hydroxyls to be injected through the wash cycle rather than just during the initial fill phase and additional avoids the expense and maintenance of adding ozone and/or hydroxyls recirculation plumping to an ozone and/or hydroxyls laundry system. Accordingly, ozone and/or hydroxyl levels may be maintained at superior levels throughout the wash cycle.
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公开(公告)号:US12065628B2
公开(公告)日:2024-08-20
申请号:US17338361
申请日:2021-06-03
发明人: Clay Purdy , Markus Weissenberger , Kyle G. Wynnyk
CPC分类号: C11D3/042 , C11D1/002 , C11D3/26 , C11D3/3902 , C11D3/3937 , C11D3/3947 , C11D11/0041
摘要: A modified aqueous acid composition comprising: nitric acid; sulfuric acid; a compound comprising an amine moiety and a sulfonic acid moiety; and a peroxide. Also disclosed are methods of using such composition.
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公开(公告)号:US12064711B2
公开(公告)日:2024-08-20
申请号:US17292576
申请日:2018-11-28
申请人: WACKER CHEMIE AG
CPC分类号: B01D19/0409 , B01D19/0418 , C11D3/042 , C11D3/373 , D21H21/12 , C08L83/14 , C08L83/00 , C08L83/00 , C08K3/36
摘要: Defoamer compositions which act rapidly and over an extended period of time employ organopolysiloxanes having alkylene linking groups bridging siloxy groups, a filler, a silicone resin, and phosphoric acid.
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公开(公告)号:US12031254B2
公开(公告)日:2024-07-09
申请号:US16823656
申请日:2020-03-19
发明人: Mark Robert Sivik , Sol Melissa Escobar , Sarah Ann Delaney , Frank William Denome , Mark William Hamersky
IPC分类号: C11D3/20 , C11D3/00 , C11D3/04 , C11D3/22 , C11D3/24 , C11D17/04 , C11D17/08 , D06B1/00 , D06L1/00
CPC分类号: D06B1/00 , C11D3/0068 , C11D3/042 , C11D3/2086 , C11D3/222 , C11D17/043 , C11D17/08 , D06L1/00
摘要: The present invention relates to a process for reducing malodors on fabrics using an acid delivery composition.
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公开(公告)号:US20240174948A1
公开(公告)日:2024-05-30
申请号:US18519165
申请日:2023-11-27
申请人: CORNING INCORPORATED
发明人: Yuhui Jin , Aize Li , Hamidreza Pirayesh
CPC分类号: C11D11/0035 , C11D1/62 , C11D3/046
摘要: According to embodiments of the present disclosure, an aqueous solution for cleaning glass articles may include, water; at least one of hydrochloric acid, nitric acid, phosphoric acid, an organic acid, and combinations thereof; and at least one of: a positively charged surfactant, and a metal salt. The aqueous solution may include from 0.01 wt. % to 1 wt. % of the positively charged surfactant, based on the total weight of the aqueous solution. A concentration of the metal salt in the aqueous solution may be from 0.1 M to 1 M. The aqueous solution may has a pH from 0 to 4.
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公开(公告)号:US11992574B2
公开(公告)日:2024-05-28
申请号:US17380468
申请日:2021-07-20
申请人: Kinnos Inc.
发明人: Jason Kang , Kevin Tyan , Katherine Jin
IPC分类号: A61L2/28 , A01N25/00 , A01N33/12 , A01N37/16 , A01N59/00 , A61L2/22 , C11D1/12 , C11D1/62 , C11D3/04 , C11D3/24 , C11D3/34 , C11D3/39 , C11D3/395 , C11D3/40 , C11D3/48 , C11D17/00 , C11D17/04
CPC分类号: A61L2/28 , A01N25/00 , A01N33/12 , A01N37/16 , A01N59/00 , A61L2/22 , C11D1/12 , C11D1/62 , C11D3/044 , C11D3/24 , C11D3/3418 , C11D3/3947 , C11D3/3951 , C11D3/3956 , C11D3/40 , C11D3/48 , C11D17/0043 , C11D17/045 , C11D2111/44
摘要: The invention provides to a powdered composition of additives and a method of use thereof for increasing the visibility, potency and coverage of disinfectant solutions, such as bleach.
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